loadpatents
name:-0.0030961036682129
name:-0.039592027664185
name:-0.00043106079101562
Ogawa; Kyosuke Patent Filings

Ogawa; Kyosuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ogawa; Kyosuke.The latest application filed is for "light source unit, projector, and method of assembling a light source unit".

Company Profile
0.35.4
  • Ogawa; Kyosuke - Tokyo JP
  • OGAWA; Kyosuke - Meguro-ku JP
  • Ogawa; Kyosuke - Kawasaki Kanagawa JP
  • Ogawa; Kyosuke - Kanagawa-ken JP
  • Ogawa; Kyosuke - Miye JP
  • Ogawa; Kyosuke - Nabari JP
  • Ogawa; Kyosuke - Sakurashin JP
  • Ogawa; Kyosuke - Sakorashimachi JP
  • Ogawa; Kyosuke - Shimomaruko Ohta-ku JP
  • Ogawa; Kyosuke - Sakurashinmachi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Light source unit, projector, and method of assembling a light source unit
Grant 10,247,405 - Fujikura , et al.
2019-04-02
Light Source Unit, Projector, And Method Of Assembling A Light Source Unit
App 20180231232 - FUJIKURA; Hirofumi ;   et al.
2018-08-16
Charge pump circuit and step-down regulator circuit
Grant 9,929,646 - Notoya , et al. March 27, 2
2018-03-27
Charge Pump Circuit And Step-down Regulator Circuit
App 20170179819 - NOTOYA; Koichi ;   et al.
2017-06-22
Projector, support plate and projection method of projector
Grant 9,513,538 - Ogawa December 6, 2
2016-12-06
Projector, Support Plate And Projection Method Of Projector
App 20140354964 - OGAWA; Kyosuke
2014-12-04
Photo-mask having phase and non-phase shifter parts for patterning an insulated gate transistor
Grant 7,867,671 - Douzaka , et al. January 11, 2
2011-01-11
Photomask, Multiphase Exposure Method, And Method Of Manufacturing Semiconductor Device Including Insulating Gate-type Transistors
App 20080107974 - DOUZAKA; Toshiaki ;   et al.
2008-05-08
Process for forming deposition film
Grant 5,910,342 - Hirooka , et al. June 8, 1
1999-06-08
Process for forming deposition film
Grant 4,835,005 - Hirooka , et al. May 30, 1
1989-05-30
Light receiving members with spherically dimpled support
Grant 4,808,504 - Honda , et al. * February 28, 1
1989-02-28
Light receiving members with spherically dimpled support
Grant 4,798,776 - Honda , et al. * January 17, 1
1989-01-17
Light receiving member having a-Si(GE,SN) photosensitive layer and multi-layered surface layer containing reflection preventive layer and abrasion resistant layer on a support having spherical dimples with inside faces having minute irregularities
Grant 4,797,336 - Honda , et al. January 10, 1
1989-01-10
Surface treated metal member, preparation method thereof and photoconductive member by use thereof
Grant 4,797,327 - Honda , et al. January 10, 1
1989-01-10
Light receiving member having a-Si (Ge,Sn) photosensitive layer and a-Si (O,C,N) surface layer on a support having spherical dimples with inside faces having minute irregularities
Grant 4,797,299 - Honda , et al. January 10, 1
1989-01-10
Amorphous silicon multilayered photosensitive element containing spherical-dimpled substrate surface
Grant 4,740,440 - Honda , et al. April 26, 1
1988-04-26
Surface treated metal member, preparation method thereof and photoconductive member by use thereof
Grant 4,735,883 - Honda , et al. April 5, 1
1988-04-05
Light receiving members
Grant 4,732,834 - Honda , et al. March 22, 1
1988-03-22
Silicon film deposition from mixture of silanes
Grant 4,721,664 - Shimizu , et al. January 26, 1
1988-01-26
Member with light receiving layer of A-SI(GE) and A-SI and having plurality of non-parallel interfaces
Grant 4,701,393 - Saitoh , et al. October 20, 1
1987-10-20
Member having light receiving layer with smoothly interconnecting nonparallel interfaces
Grant 4,696,882 - Saitoh , et al. September 29, 1
1987-09-29
Image holder member with overlayer of amorphous Si with H and C
Grant 4,687,722 - Ogawa August 18, 1
1987-08-18
Apparatus and process for mass production of film by vacuum deposition
Grant 4,666,734 - Kamiya , et al. May 19, 1
1987-05-19
Light receiving member having photosensitive layer with non-parallel interfaces
Grant 4,650,736 - Saitoh , et al. March 17, 1
1987-03-17
Photoconductive member having amorphous silicon matrix with oxygen and impurity containing regions
Grant 4,636,450 - Ogawa , et al. January 13, 1
1987-01-13
Photoconductive member comprising silicon and oxygen
Grant 4,547,448 - Shirai , et al. October 15, 1
1985-10-15
Photoconductive member having multiple amorphous layers
Grant 4,536,459 - Misumi , et al. August 20, 1
1985-08-20
Amorphous silicon photoconductive member with interface and rectifying layers
Grant 4,522,905 - Ogawa , et al. June 11, 1
1985-06-11
Photoconductive member having an amorphous silicon layer
Grant 4,501,807 - Shirai , et al. February 26, 1
1985-02-26
Photoconductive member comprising multiple amorphous layers
Grant 4,490,454 - Misumi , et al. December 25, 1
1984-12-25
Photoconductive member with doped and oxygen containing amorphous silicon layers
Grant 4,486,521 - Misumi , et al. December 4, 1
1984-12-04
Process for producing photoconductive member from gaseous silicon compounds
Grant 4,468,443 - Shimizu , et al. August 28, 1
1984-08-28
Photoconductive member with a -Si having two layer regions
Grant 4,465,750 - Ogawa , et al. August 14, 1
1984-08-14
Photoconductive member with .alpha.-Si and C, N or O and dopant
Grant 4,460,670 - Ogawa , et al. July 17, 1
1984-07-17
Photoconductive member with .alpha.-Si and C, U or D and dopant
Grant 4,460,669 - Ogawa , et al. July 17, 1
1984-07-17
Amorphous photoconductive member with .alpha.-Si interlayers
Grant 4,452,875 - Ogawa , et al. June 5, 1
1984-06-05
Photoconductive member with multiple amorphous Si layers
Grant 4,452,874 - Ogawa , et al. June 5, 1
1984-06-05
Process for forming amorphous silicon film
Grant 4,450,185 - Shimizu , et al. May 22, 1
1984-05-22
Process for producing photoconductive member
Grant 4,405,656 - Shimizu , et al. September 20, 1
1983-09-20

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