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OGATA; Hiroto Patent Filings

OGATA; Hiroto

Patent Applications and Registrations

Patent applications and USPTO patent grants for OGATA; Hiroto.The latest application filed is for "resist underlayer film-forming composition".

Company Profile
14.11.24
  • OGATA; Hiroto - Toyama-shi JP
  • Ogata; Hiroto - Toyama JP
  • Ogata; Hiroto - Osaka JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Resist Underlayer Film-forming Composition
App 20220283501 - OGATA; Hiroto ;   et al.
2022-09-08
Resist Underlayer Film-forming Composition
App 20220229368 - OGATA; Hiroto ;   et al.
2022-07-21
Resist Underlayer Film-forming Composition
App 20220155686 - TOKUNAGA; Hikaru ;   et al.
2022-05-19
Resist Underlayer Film-forming Composition
App 20220146939 - OGATA; Hiroto ;   et al.
2022-05-12
Composition for forming a coating film for removing foreign matters
Grant 11,319,514 - Kishioka , et al. May 3, 2
2022-05-03
Resist underlayer film-forming composition
Grant 11,287,741 - Ogata , et al. March 29, 2
2022-03-29
Resist Underlayer Film-forming Composition
App 20210311396 - OGATA; Hiroto ;   et al.
2021-10-07
Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive
Grant 11,131,928 - Usui , et al. September 28, 2
2021-09-28
Protective film-forming composition
Grant 11,112,696 - Hashimoto , et al. September 7, 2
2021-09-07
Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method
Grant 11,003,078 - Ohashi , et al. May 11, 2
2021-05-11
Resist Underlayer Film-forming Composition Including Cyclic Carbonyl Compound
App 20210124268 - TOKUNAGA; Hikaru ;   et al.
2021-04-29
Resist Underlayer Film-forming Composition Using Carbon-oxygen Double Bond
App 20210116814 - TOKUNAGA; Hikaru ;   et al.
2021-04-22
Composition For Forming Resist Underlayer Film And Method For Forming Resist Pattern Using Same
App 20210024689 - OGATA; Hiroto ;   et al.
2021-01-28
Stepped Substrate Coating Composition Containing Compound Having Curable Functional Group
App 20210024773 - TOKUNAGA; Hikaru ;   et al.
2021-01-28
Composition for forming resist underlayer film and method for forming resist pattern using same
Grant 10,844,167 - Ogata , et al. November 24, 2
2020-11-24
Resist Underlying Film Forming Composition
App 20200209753 - TAMURA; Mamoru ;   et al.
2020-07-02
Resist Underlayer Film Forming Composition Containing Compound Having Hydantoin Ring
App 20200201183 - OGATA; Hiroto ;   et al.
2020-06-25
Resist Underlayer Film-forming Composition
App 20200201184 - OGATA; Hiroto ;   et al.
2020-06-25
Resist Underlayer Film-forming Composition
App 20200192224 - OGATA; Hiroto ;   et al.
2020-06-18
Protective Film-forming Composition
App 20200183282 - HASHIMOTO; Yuto ;   et al.
2020-06-11
Composition For Forming A Coating Film For Removing Foreign Matters
App 20200140792 - KISHIOKA; Takahiro ;   et al.
2020-05-07
Resist Underlying Film-forming Composition Containing An Amide Group-containing Polyester
App 20200041905 - TAMURA; Mamoru ;   et al.
2020-02-06
Cationically polymerizable resist underlayer film-forming composition
Grant 10,437,151 - Ogata , et al. O
2019-10-08
Composition For Forming Resist Underlayer Film And Method For Forming Resist Pattern Using Same
App 20190177475 - OGATA; Hiroto ;   et al.
2019-06-13
Composition For Forming Protective Film Including Specific Crosslinking Agent, And Pattern Formation Method In Which Same Is Use
App 20190163064 - OHASHI; Tomoya ;   et al.
2019-05-30
Resist Underlayer Film Forming Composition Which Contains Compound Having Glycoluril Skeleton As Additive
App 20190086806 - USUI; Yuki ;   et al.
2019-03-21
Cationically Polymerizable Resist Underlayer Film-forming Composition
App 20180081274 - OGATA; Hiroto ;   et al.
2018-03-22
Pattern forming method using resist underlayer film
Grant 9,793,131 - Ohashi , et al. October 17, 2
2017-10-17
Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
Grant 9,678,427 - Ogata , et al. June 13, 2
2017-06-13
Resist Underlayer Film-forming Composition Containing Copolymer That Has Triazine Ring And Sulfur Atom In Main Chain
App 20170038687 - OGATA; Hiroto ;   et al.
2017-02-09
Resist underlayer film-forming composition
Grant 9,534,140 - Ohashi , et al. January 3, 2
2017-01-03
Pattern Forming Method Using Resist Underlayer Film
App 20160218013 - OHASHI; Tomoya ;   et al.
2016-07-28
Resist Underlayer Film-forming Composition
App 20150337164 - OHASHI; Tomoya ;   et al.
2015-11-26
Chair and support mechanism unit thereof
Grant 7,293,833 - Takeuchi , et al. November 13, 2
2007-11-13
Chair and support mechanism unit thereof
App 20060181128 - Takeuchi; Hiroshi ;   et al.
2006-08-17

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