loadpatents
Patent applications and USPTO patent grants for OGASAWARA; Kosuke.The latest application filed is for "plasma processing method and plasma processing apparatus".
Patent | Date |
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Plasma Processing Method And Plasma Processing Apparatus App 20220301824 - OGASAWARA; Kosuke ;   et al. | 2022-09-22 |
Method of etching film and plasma processing apparatus Grant 11,404,282 - Ogasawara , et al. August 2, 2 | 2022-08-02 |
Reagent Management Method App 20220221478 - KAWABE; Toshiki ;   et al. | 2022-07-14 |
Piercing Condition Selection Method App 20220221479 - KAWABE; Toshiki ;   et al. | 2022-07-14 |
Plasma processing method and plasma processing apparatus Grant 11,367,590 - Ogasawara , et al. June 21, 2 | 2022-06-21 |
Processing Apparatus And Processing Method App 20220148890 - SAWACHI; Atsushi ;   et al. | 2022-05-12 |
Plasma Etching Method And Plasma Processing Apparatus App 20210313148 - OGASAWARA; Kosuke ;   et al. | 2021-10-07 |
Plasma Processing Method And Plasma Processing Apparatus App 20210020409 - OGASAWARA; Kosuke ;   et al. | 2021-01-21 |
Method Of Etching Film And Plasma Processing Apparatus App 20200303203 - Ogasawara; Kosuke ;   et al. | 2020-09-24 |
Plasma Etching Method And Plasma Processing Apparatus App 20190326092 - OGASAWARA; Kosuke ;   et al. | 2019-10-24 |
Method for controlling etching in pitch doubling Grant 9,564,342 - Ogasawara February 7, 2 | 2017-02-07 |
Method For Controlling Etching In Pitch Doubling App 20160093501 - Ogasawara; Kosuke | 2016-03-31 |
Particle beam irradiation system and operating method Grant 9,199,095 - Ogasawara , et al. December 1, 2 | 2015-12-01 |
Sidewall image transfer method for low aspect ratio patterns Grant 8,980,111 - Ko , et al. March 17, 2 | 2015-03-17 |
Particle Beam Irradiation System And Operating Method App 20150060703 - OGASAWARA; Kosuke ;   et al. | 2015-03-05 |
Sidewall Image Transfer Method For Low Aspect Ratio Patterns App 20130306598 - KO; AKITERU ;   et al. | 2013-11-21 |
Plasma processing apparatus for performing accurate end point detection Grant 8,580,077 - Ogasawara , et al. November 12, 2 | 2013-11-12 |
Substrate processing method Grant 8,232,207 - Ogasawara , et al. July 31, 2 | 2012-07-31 |
Etching method, etching apparatus and storage medium Grant 8,187,980 - Ogasawara May 29, 2 | 2012-05-29 |
Plasma processing method and post-processing method Grant 7,871,532 - Shimizu , et al. January 18, 2 | 2011-01-18 |
Substrate Processing Method App 20100167549 - OGASAWARA; Kosuke ;   et al. | 2010-07-01 |
Plasma Processing Apparatus For Performing Accurate End Point Detection App 20100089532 - OGASAWARA; Kosuke ;   et al. | 2010-04-15 |
Plasma processing method and plasma processing apparatus for performing accurate end point detection Grant 7,662,646 - Ogasawara , et al. February 16, 2 | 2010-02-16 |
Plasma Processing Apparatus, Cleaning Method Thereof, Control Program And Computer Storage Medium App 20080216957 - Ogasawara; Kosuke ;   et al. | 2008-09-11 |
Etching Method, Etching Apparatus And Storage Medium App 20080188086 - OGASAWARA; Kosuke | 2008-08-07 |
Plasma Processing Method And Plasma Processing Apparatus App 20080070327 - OGASAWARA; Kosuke ;   et al. | 2008-03-20 |
Method and apparatus for manufacturing a semiconductor device, control program and computer-readable storage medium App 20070102399 - Ogasawara; Kosuke | 2007-05-10 |
Plasma processing method and post-processing method App 20060191877 - Shimizu; Akitaka ;   et al. | 2006-08-31 |
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