loadpatents
Patent applications and USPTO patent grants for OGADHOH; Shem O..The latest application filed is for "fill pattern to enhance ebeam process margin".
Patent | Date |
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Fill Pattern To Enhance Ebeam Process Margin App 20210358713 - TANDON; Shakul ;   et al. | 2021-11-18 |
Fill pattern to enhance e-beam process margin Grant 11,107,658 - Tandon , et al. August 31, 2 | 2021-08-31 |
Interconnect Structures For Integrated Circuits App 20210125992 - LAJOIE; Travis ;   et al. | 2021-04-29 |
Integrated Circuit Structures Having Differentiated Interconnect Lines In A Same Dielectric Layer App 20210098373 - LAJOIE; Travis W. ;   et al. | 2021-04-01 |
Thin-film Transistor Structures With Gas Spacer App 20190305081 - LaJoie; Travis W. ;   et al. | 2019-10-03 |
Fill Pattern To Enhance Ebeam Process Margin App 20190164723 - TANDON; Shakul ;   et al. | 2019-05-30 |
Lithography mask having sub-resolution phased assist features Grant 9,046,761 - Ogadhoh , et al. June 2, 2 | 2015-06-02 |
Techniques for phase tuning for process optimization Grant 8,959,465 - Nyhus , et al. February 17, 2 | 2015-02-17 |
Techniques For Phase Tuning For Process Optimization App 20140053117 - Nyhus; Paul A. ;   et al. | 2014-02-20 |
Lithography Mask Having Sub-resolution Phased Assist Features App 20130216941 - Ogadhoh; Shem O. ;   et al. | 2013-08-22 |
Lithography mask having sub-resolution phased assist features Grant 8,399,157 - Ogadhoh March 19, 2 | 2013-03-19 |
Lithography Mask Having Sub-resolution Phased Assist Features App 20120164562 - Ogadhoh; Shem O. | 2012-06-28 |
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