Oda; Noriaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Oda; Noriaki.The latest application filed is for "semiconductor die including diffusion barrier layers embedding bonding pads and methods of forming the same".

Company Profile

0.39.28

Oda; Noriaki - Yokkaichi JP
Oda; Noriaki - Kanagawa JP
Oda; Noriaki - Ibaraki JP
Oda; Noriaki - Kawasaki JP
Oda, Noriaki - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor die including diffusion barrier layers embedding bonding pads and methods of forming the same Grant 11,450,624 - Oda , et al. September 20, 2	2022-09-20
Semiconductor die including diffusion barrier layers embedding bonding pads and methods of forming the same Grant 11,444,039 - Oda , et al. September 13, 2	2022-09-13
Semiconductor Die Including Diffusion Barrier Layers Embedding Bonding Pads And Methods Of Forming The Same App 20210375790 - ODA; Noriaki ; et al.	2021-12-02
Semiconductor Die Including Diffusion Barrier Layers Embedding Bonding Pads And Methods Of Forming The Same App 20210375791 - ODA; Noriaki ; et al.	2021-12-02
Positive Electrode For Secondary Battery, Secondary Battery, And Methods For Manufacturing The Same App 20150086865 - Oda; Noriaki	2015-03-26
Semiconductor device and method of manufacturing semiconductor device Grant 8,564,090 - Oda October 22, 2	2013-10-22
Semiconductor device and method for manufacturing the same Grant 8,330,276 - Oda , et al. December 11, 2	2012-12-11
Semiconductor device Grant 8,310,056 - Oda , et al. November 13, 2	2012-11-13
Method of designing a semiconductor device Grant 8,146,044 - Oda March 27, 2	2012-03-27
Semiconductor Device And Method Of Manufacturing Semiconductor Device App 20110140235 - ODA; Noriaki	2011-06-16
Semiconductor Device And Method For Manufacturing The Same App 20110049719 - Oda; Noriaki ; et al.	2011-03-03
Semiconductor device and method for manufacturing same App 20100314777 - Oda; Noriaki	2010-12-16
Semiconductor device and method for manufacturing same Grant 7,846,830 - Takewaki , et al. December 7, 2	2010-12-07
Semiconductor device App 20100301488 - Oda; Noriaki ; et al.	2010-12-02
Semiconductor device featuring large reinforcing elements in pad area Grant 7,763,968 - Kunishima , et al. July 27, 2	2010-07-27
Semiconductor device with bonding pad support structure Grant 7,714,449 - Oda May 11, 2	2010-05-11
Fuse and seal ring Grant 7,692,265 - Takewaki , et al. April 6, 2	2010-04-06
Semiconductor device and method of manufacturing the same Grant 7,508,082 - Takewaki , et al. March 24, 2	2009-03-24
Method Of Designing A Semiconductor Device App 20090007045 - ODA; Noriaki	2009-01-01
Semiconductor Device With Bonding Pad Support Structure App 20080290516 - ODA; Noriaki	2008-11-27
Semiconductor device Grant 7,432,545 - Ohkubo , et al. October 7, 2	2008-10-07
Semiconductor device with bonding pad support structure Grant 7,397,125 - Oda July 8, 2	2008-07-08
Semiconductor Device With Bonding Pad Support Structure App 20080088023 - ODA; Noriaki	2008-04-17
Semiconductor device and method for manufacturing same App 20080044997 - Takewaki; Toshiyuki ; et al.	2008-02-21
Semiconductor device and method of manufacturing the same Grant 7,327,031 - Takewaki , et al. February 5, 2	2008-02-05
Semiconductor Device And Method Of Manufacturing The Same App 20080017993 - TAKEWAKI; Toshiyuki ; et al.	2008-01-24
Semiconductor device having an anti-oxidizing layer that inhibits corrosion of an interconnect layer Grant 7,312,535 - Takewaki , et al. December 25, 2	2007-12-25
Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same Grant 7,230,337 - Usami , et al. June 12, 2	2007-06-12
Semiconductor device featuring large reinforcing elements in pad area, and pattern design apparatus therefor App 20070069388 - Kunishima; Hiroyuki ; et al.	2007-03-29
Semiconductor device and method for manufacturing same App 20060276029 - Usami; Tatsuya ; et al.	2006-12-07
Semiconductor device App 20060076596 - Ohkubo; Hiroaki ; et al.	2006-04-13
Semiconductor device and method for manufacturing the same App 20050218477 - Takewaki, Toshiyuki ; et al.	2005-10-06
Semiconductor device and method of manufacturing the same App 20050067700 - Takewaki, Toshiyuki ; et al.	2005-03-31
Semiconductor device and manufacturing method the same App 20040251552 - Takewaki, Toshiyuki ; et al.	2004-12-16
Semiconductor device and method of manufacturing the same App 20040245643 - Takewaki, Toshiyuki ; et al.	2004-12-09
Photo mask for fabricating semiconductor device having dual damascene structure Grant 6,821,687 - Hamanaka , et al. November 23, 2	2004-11-23
Semiconductor device and method for manufacturing same App 20040188851 - Takewaki, Toshiyuki ; et al.	2004-09-30
Semiconductor device and method for manufacturing same App 20040173910 - Usami, Tatsuya ; et al.	2004-09-09
Multi-layer interconnection structure in semiconductor device and method for fabricating same Grant 6,777,324 - Oda August 17, 2	2004-08-17
Semiconductor device and method of fabrication same App 20040150112 - Oda, Noriaki	2004-08-05
Semiconductor device and method of manufacturing the same Grant 6,756,676 - Oda , et al. June 29, 2	2004-06-29
Semiconductor device and method for manufacturing the semiconductor device Grant 6,633,082 - Oda , et al. October 14, 2	2003-10-14
Multi-layer interconnection structure in semiconductor device and method for fabricating same App 20030085468 - Oda, Noriaki	2003-05-08
Semiconductor device and method of manufacturing the same App 20030067078 - Oda, Noriaki	2003-04-10
Semiconductor device and method for manufacturing the same Grant 6,503,826 - Oda January 7, 2	2003-01-07
Photo mask for fabricating semiconductor device having dual damascene structure App 20020142235 - Hamanaka, Nobuaki ; et al.	2002-10-03
Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device Grant 6,372,628 - Matsubara , et al. April 16, 2	2002-04-16
Semiconductor device and method of manufacturing the same App 20020011675 - Oda, Noriaki ; et al.	2002-01-31
Semiconductor device having a silicide layer with silicon-rich region and method for making the same App 20010049194 - Oda, Noriaki	2001-12-06
Semiconductor device with multilayer interconnection having HSQ film with implanted fluorine and fluorine preventing liner Grant 6,316,833 - Oda November 13, 2	2001-11-13
Method for producing semiconductor device Grant 6,313,036 - Oda November 6, 2	2001-11-06
Semiconductor device having silicide layer with siliconrich region and method for making the same Grant 6,288,430 - Oda September 11, 2	2001-09-11
Semiconductor device with copper-based wiring lines and method of fabricating the same App 20010017422 - Oda, Noriaki	2001-08-30
Semiconductor device with low permittivity interlayer insulating film and method of manufacturing the same Grant 6,187,662 - Usami , et al. February 13, 2	2001-02-13
Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film Grant 6,091,081 - Matsubara , et al. July 18, 2	2000-07-18
Semiconductor device having a gate electrode film containing nitrogen Grant 5,994,749 - Oda November 30, 1	1999-11-30
Manufacturing method of semiconductor device Grant 5,985,750 - Oda November 16, 1	1999-11-16
Method of fabricating semiconductor device Grant 5,976,962 - Oda November 2, 1	1999-11-02
Method of fabricating semiconductor device Grant 5,955,384 - Oda September 21, 1	1999-09-21
Method for fabricating multilevel interconnection structure for semiconductor devices Grant 5,930,667 - Oda July 27, 1	1999-07-27
Semiconductor device having a critical path wiring Grant 5,883,433 - Oda March 16, 1	1999-03-16
Method of fabricating semiconductor device Grant 5,750,437 - Oda May 12, 1	1998-05-12
Semiconductor device with wiring layer Grant 5,502,335 - Oda March 26, 1	1996-03-26
Semiconductor device with conductor clad insulator wiring Grant 5,479,053 - Oda December 26, 1	1995-12-26
Method for fabricating an insulating gate field effect transistor Grant 5,472,890 - Oda December 5, 1	1995-12-05
Semiconductor device having gold wiring layer provided with a barrier metal layer Grant 5,416,359 - Oda May 16, 1	1995-05-16

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