OCG Microelectronic Materials, Inc.

Patent Applications and Registrations

Patent applications and USPTO patent grants for OCG Microelectronic Materials, Inc..The latest application filed is for "photoresist stripping composition".

Company Profile

0.15.0

OCG Microelectronic Materials, Inc. - Norwalk CT
OCG Microelectronic Materials, Inc. - West Paterson NJ
OCG Microelectronic Materials, Inc. - Cheshire CT

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photoresist stripping composition Grant 5,648,324 - Honda , et al. July 15, 1	1997-07-15
Non-corrosive photoresist stripper composition Grant 5,597,678 - Honda , et al. January 28, 1	1997-01-28
Chelating reagent containing photoresist stripper composition Grant 5,561,105 - Honda October 1, 1	1996-10-01
Chemically amplified radiation-sensitive composition Grant 5,550,004 - Honda * August 27, 1	1996-08-27
Novolak containing photoresist stripper composition Grant 5,507,978 - Honda April 16, 1	1996-04-16
Method for removing metal impurities from resist components Grant 5,446,125 - Honda , et al. August 29, 1	1995-08-29
Coated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancers Grant 5,366,843 - Jeffries, III November 22, 1	1994-11-22
Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present Grant 5,322,757 - Ebersole June 21, 1	1994-06-21
Selected chelate resins and their use to remove multivalent metal impurities from resist components Grant 5,300,628 - Honda April 5, 1	1994-04-05
Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures Grant 5,283,374 - Jeffries, III February 1, 1	1994-02-01
Selected novolak resin planarization layer for lithographic applications Grant 5,276,126 - Rogler January 4, 1	1994-01-04
Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements Grant 5,215,856 - Jayaraman June 1, 1	1993-06-01
Photoresist developer containing fluorinated amphoteric surfactant Grant 5,164,286 - Blakeney , et al. November 17, 1	1992-11-17
Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin Grant 5,151,339 - Sarubbi September 29, 1	1992-09-29
Positive photoresist composition Grant 5,145,763 - Bassett , et al. September 8, 1	1992-09-08

Company Registrations

NCAGE Code	0ZR68	OCG MICROELECTRONIC MATERIALS INC
CAGE Code	0ZR68	OCG MICROELECTRONIC MATERIALS INC

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