loadpatents
Patent applications and USPTO patent grants for Obsidian Advanced Manufacturing LLC.The latest application filed is for "gas phase integrated multimaterial printhead for additive manufacturing".
Patent | Date |
---|---|
Gas phase integrated multimaterial printhead for additive manufacturing Grant 10,800,098 - Mukhopadhyay October 13, 2 | 2020-10-13 |
Gas phase integrated multimaterial printhead for additive manufacturing Grant 10,596,758 - Mukhopadhyay | 2020-03-24 |
Gas Phase Integrated Multimaterial Printhead for Additive Manufacturing App 20190329492 - Mukhopadhyay; Shomeek | 2019-10-31 |
Gas phase integrated multimaterial printhead for additive manufacturing Grant 10,357,920 - Mukhopadhyay July 23, 2 | 2019-07-23 |
Gas Phase Integrated Multimaterial Printhead for Additive Manufacturing App 20180200954 - Mukhopadhyay; Shomeek | 2018-07-19 |
NCAGE Code | 7SLL0 | OBSIDIAN ADVANCED MANUFACTURING LLC |
CAGE Code | 7SLL0 | OBSIDIAN ADVANCED MANUFACTURING LLC |
S.A.M. Registration | 7SLL0 [80513145] | OBSIDIAN ADVANCED MANUFACTURING LLC |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.