Patent | Date |
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X-Y constraining unit, and stage apparatus and vacuum stage apparatus including the same Grant 8,992,086 - Akashi , et al. March 31, 2 | 2015-03-31 |
X-y Constraining Unit, And Stage Apparatus And Vacuum Stage Apparatus Including The Same App 20140064643 - AKASHI; Kouji ;   et al. | 2014-03-06 |
Stage device and stage cleaning method Grant 8,382,911 - Oae , et al. February 26, 2 | 2013-02-26 |
Stage device and stage cleaning method Grant 8,281,794 - Oae , et al. October 9, 2 | 2012-10-09 |
Stage Device And Stage Cleaning Method App 20120118325 - Oae; Yoshihisa ;   et al. | 2012-05-17 |
Stage device and stage cleaning method App 20100236576 - Oae; Yoshihisa ;   et al. | 2010-09-23 |
Charged particle beam exposure system and method Grant 6,646,275 - Oae , et al. November 11, 2 | 2003-11-11 |
Charged particle beam exposure system and method App 20030025088 - Oae, Yoshihisa ;   et al. | 2003-02-06 |
Charged particle beam exposure system and method Grant 6,486,479 - Oae , et al. November 26, 2 | 2002-11-26 |
Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements Grant 6,118,129 - Oae , et al. September 12, 2 | 2000-09-12 |
Charged-particle beam exposure system and method Grant 6,064,807 - Arai , et al. May 16, 2 | 2000-05-16 |
Charged particle beam exposure system and method Grant 5,977,548 - Oae , et al. November 2, 1 | 1999-11-02 |
Method of and system for exposing pattern on object by charged particle beam Grant 5,841,145 - Satoh , et al. November 24, 1 | 1998-11-24 |
Charged particle beam exposure system and method Grant 5,614,725 - Oae , et al. March 25, 1 | 1997-03-25 |
Block exposure pattern data extracting system and method for charged particle beam exposure Grant 5,590,048 - Abe , et al. December 31, 1 | 1996-12-31 |
Charged particle beam exposure system and method Grant 5,528,048 - Oae , et al. June 18, 1 | 1996-06-18 |
Electron beam exposure system capable of detecting failure of exposure Grant 5,449,915 - Yamada , et al. September 12, 1 | 1995-09-12 |
Blanking aperture array type charged particle beam exposure Grant 5,430,304 - Yasuda , et al. July 4, 1 | 1995-07-04 |
Charged particle beam exposure apparatus and method of cleaning the same Grant 5,401,974 - Oae , et al. March 28, 1 | 1995-03-28 |
Stencil mask and charge particle beam exposure method and apparatus using the stencil mask Grant 5,376,802 - Sakamoto , et al. December 27, 1 | 1994-12-27 |
Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput Grant 5,369,282 - Arai , et al. November 29, 1 | 1994-11-29 |
Method of exposing patttern of semiconductor devices and stencil mask for carrying out same Grant 5,364,718 - Oae , et al. November 15, 1 | 1994-11-15 |
Electron beam exposure system Grant 5,276,331 - Oae , et al. January 4, 1 | 1994-01-04 |
Charged particle beam exposure system and charged particle beam exposure method Grant 5,260,579 - Yasuda , et al. November 9, 1 | 1993-11-09 |
Electron beam exposure system having an electrostatic deflector wherein an electrostatic charge-up is eliminated Grant 5,245,194 - Oae , et al. September 14, 1 | 1993-09-14 |
Electron beam exposure system having an improved seal element for interfacing electric connections Grant 5,117,117 - Oae , et al. May 26, 1 | 1992-05-26 |
Deflection compensating device for converging lens Grant 5,041,731 - Oae , et al. August 20, 1 | 1991-08-20 |