| Patent | Date |
|---|
Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications
Grant 11,401,441 - Shi , et al. August 2, 2 | 2022-08-02 |
Selective Chemical Mechanical Planarization Polishing
App 20220195245 - Shi; Xiaobo ; et al. | 2022-06-23 |
Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives
Grant 11,326,076 - Shi , et al. May 10, 2 | 2022-05-10 |
Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing
Grant 11,254,839 - Shi , et al. February 22, 2 | 2022-02-22 |
Compositions And Processes For Depositing Carbon-doped Silicon-containing Films
App 20220041870 - XIAO; MANCHAO ; et al. | 2022-02-10 |
Organoaminosilane Precursors And Methods For Depositing Films Comprising Same
App 20210407793 - O'NEILL; MARK LEONARD ; et al. | 2021-12-30 |
Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process
Grant 11,180,678 - Shi , et al. November 23, 2 | 2021-11-23 |
Low Oxide Trench Dishing Chemical Mechanical Polishing
App 20210324270 - Shi; Xiaobo ; et al. | 2021-10-21 |
Low Oxide Trench Dishing Chemical Mechanical Polishing
App 20210309885 - Shi; Xiaobo ; et al. | 2021-10-07 |
Organoaminosilane precursors and methods for depositing films comprising same
Grant 11,139,162 - O'Neill , et al. October 5, 2 | 2021-10-05 |
Low oxide trench dishing chemical mechanical polishing
Grant 11,078,417 - Shi , et al. August 3, 2 | 2021-08-03 |
Low oxide trench dishing chemical mechanical polishing
Grant 11,072,726 - Shi , et al. July 27, 2 | 2021-07-27 |
Low Oxide Trench Dishing Shallow Trench Isolation Chemical Mechanical Planarization Polishing
App 20210179890 - Shi; Xiaobo ; et al. | 2021-06-17 |
High temperature atomic layer deposition of silicon oxide thin films
Grant 10,991,571 - Chandra , et al. April 27, 2 | 2021-04-27 |
Metal chemical mechanical planarization (CMP) composition and methods therefore
Grant 10,920,106 - Shi , et al. February 16, 2 | 2021-02-16 |
Composite particles, method of refining and use thereof
Grant 10,894,906 - Zhou , et al. January 19, 2 | 2021-01-19 |
Chemical Mechanical Polishing For Copper And Through Silicon Via Applications
App 20200277514 - Shi; Xiaobo ; et al. | 2020-09-03 |
Chemical mechanical polishing (CMP) of cobalt-containing substrate
Grant 10,745,589 - Shi , et al. A | 2020-08-18 |
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Tunable Silicon Oxide And Silicon Nitride
App 20200239736 - Shi; Xiaobo ; et al. | 2020-07-30 |
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Low Abrasive Concentration And A Combinati
App 20200239735 - Shi; Xiaobo ; et al. | 2020-07-30 |
Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
Grant 10,669,449 - Zhou , et al. | 2020-06-02 |
Suppressing SiN Removal Rates And Reducing Oxide Trench Dishing For Shallow Trench Isolation (STI) Process
App 20200131404 - Shi; Xiaobo ; et al. | 2020-04-30 |
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof
App 20200115590 - Zhou; Hongjun ; et al. | 2020-04-16 |
High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Pla
App 20200095502 - Shi; Xiaobo ; et al. | 2020-03-26 |
Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions
App 20200048496 - Shi; Xiaobo ; et al. | 2020-02-13 |
Organoaminosilane Precursors And Methods For Depositing Films Comprising Same
App 20200051811 - O'Neill; Mark Leonard ; et al. | 2020-02-13 |
Metal Chemical Mechanical Planarization (CMP) Composition And Methods Therefore
App 20200032107 - Shi; Xiaobo ; et al. | 2020-01-30 |
Tungsten Chemical Mechanical Polishing For Reduced Oxide Erosion
App 20200024515 - Lu; Chun ; et al. | 2020-01-23 |
Low Oxide Trench Dishing Chemical Mechanical Polishing
App 20200002574 - Shi; Xiaobo ; et al. | 2020-01-02 |
Low Oxide Trench Dishing Chemical Mechanical Polishing
App 20200002608 - Shi; Xiaobo ; et al. | 2020-01-02 |
Low Oxide Trench Dishing Chemical Mechanical Polishing
App 20200002607 - Shi; Xiaobo ; et al. | 2020-01-02 |
Tungsten Chemical Mechanical Polishing Compositions
App 20190382619 - Shi; Xiaobo ; et al. | 2019-12-19 |
Composite Particles, Method of Refining And Use Thereof
App 20190359868 - Zhou; Hongjun ; et al. | 2019-11-28 |
Chemical Mechanical Polishing Tungsten Buffing Slurries
App 20190352535 - Shi; Xiaobo ; et al. | 2019-11-21 |
Metal chemical mechanical planarization (CMP) composition and methods therefore
Grant 10,465,096 - Shi , et al. No | 2019-11-05 |
Organoaminosilane precursors and methods for depositing films comprising same
Grant 10,460,929 - O'Neill , et al. Oc | 2019-10-29 |
Organoaminosilane precursors and methods for depositing films comprising same
Grant 10,453,675 - O'Neill , et al. Oc | 2019-10-22 |
Composite particles, method of refining and use thereof
Grant 10,421,890 - Zhou , et al. Sept | 2019-09-24 |
Compositions and Processes for Depositing Carbon-Doped Silicon-Containing Films
App 20190287798 - Xiao; Manchao ; et al. | 2019-09-19 |
High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films
App 20190189431 - Chandra; Haripin ; et al. | 2019-06-20 |
Compositions and processes for depositing carbon-doped silicon-containing films
Grant 10,319,584 - Xiao , et al. | 2019-06-11 |
Barrier materials for display devices
Grant 10,319,862 - Ridgeway , et al. | 2019-06-11 |
Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate
App 20190172720 - Shi; Xiaobo ; et al. | 2019-06-06 |
Methods for depositing films with organoaminodisilane precursors
Grant 10,283,350 - Xiao , et al. | 2019-05-07 |
High temperature atomic layer deposition of silicon oxide thin films
Grant 10,242,864 - Chandra , et al. | 2019-03-26 |
Metal Chemical Mechanical Planarization (CMP) Composition and Methods Therefore
App 20190062597 - Shi; Xiaobo ; et al. | 2019-02-28 |
Chemical mechanical polishing (CMP) of cobalt-containing substrate
Grant 10,217,645 - Shi , et al. Feb | 2019-02-26 |
Chemical Mechanical Planarization (CMP) Composition and Methods Therefore for Copper and Through Silica Via (TSV) Applications
App 20190055430 - Shi; Xiaobo ; et al. | 2019-02-21 |
Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
Grant 10,109,493 - Zhou , et al. October 23, 2 | 2018-10-23 |
Methods for Depositing Films with Organoaminodisilane Precursors
App 20180294152 - Xiao; Manchao ; et al. | 2018-10-11 |
Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films
App 20180277360 - Li; Jianheng ; et al. | 2018-09-27 |
Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives
Grant 10,032,644 - Shi , et al. July 24, 2 | 2018-07-24 |
Methods for depositing films with organoaminodisilane precursors
Grant 9,997,350 - Xiao , et al. June 12, 2 | 2018-06-12 |
Organoaminodisilane precursors and methods for depositing films comprising same
Grant 9,978,585 - Xiao , et al. May 22, 2 | 2018-05-22 |
Low dishing copper chemical mechanical planarization
Grant 9,978,609 - Shi , et al. May 22, 2 | 2018-05-22 |
Methods for depositing silicon nitride films
Grant 9,905,415 - Chandra , et al. February 27, 2 | 2018-02-27 |
Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrate
App 20170362466 - Shi; Xiaobo ; et al. | 2017-12-21 |
Composite Particles, Method of Refining and Use Thereof
App 20170283673 - Zhou; Hongjun ; et al. | 2017-10-05 |
High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films
App 20170256399 - Chandra; Haripin ; et al. | 2017-09-07 |
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
App 20170207084 - O'Neill; Mark Leonard ; et al. | 2017-07-20 |
Methods for Depositing Films with Organoaminodisilane Precursors
App 20170186605 - Xiao; Manchao ; et al. | 2017-06-29 |
Methods for depositing films with organoaminodisilane precursors
Grant 9,613,799 - Xiao , et al. April 4, 2 | 2017-04-04 |
High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films
App 20160365244 - Chandra; Haripin ; et al. | 2016-12-15 |
Barrier Chemical Mechanical Planarization Slurries Using Ceria-Coated Silica Abrasives
App 20160358790 - Shi; Xiaobo ; et al. | 2016-12-08 |
Compositions and Processes for Depositing Carbon-Doped Silicon-Containing Films
App 20160351389 - Xiao; Manchao ; et al. | 2016-12-01 |
Methods to prepare silicon-containing films
Grant 9,502,234 - Xiao , et al. November 22, 2 | 2016-11-22 |
Low Dishing Copper Chemical Mechanical Planarization
App 20160314989 - Shi; Xiaobo ; et al. | 2016-10-27 |
High temperature atomic layer deposition of silicon oxide thin films
Grant 9,460,912 - Chandra , et al. October 4, 2 | 2016-10-04 |
Compositions and processes for depositing carbon-doped silicon-containing films
Grant 9,447,287 - Xiao , et al. September 20, 2 | 2016-09-20 |
Composite Abrasive Particles For Chemical Mechanical Planarization Composition and Method of Use Thereof
App 20160200944 - Zhou; Hongjun ; et al. | 2016-07-14 |
Methods For Depositing Films With Organoaminodisilane Precursors
App 20160203975 - Xiao; Manchao ; et al. | 2016-07-14 |
Methods for depositing films with organoaminodisilane precursors
Grant 9,337,018 - Xiao , et al. May 10, 2 | 2016-05-10 |
Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor
App 20160122590 - Lew; Blake J. ; et al. | 2016-05-05 |
Method And Composition For Providing Pore Sealing Layer On Porous Low Dielectric Constant Films
App 20160049293 - Li; Jianheng ; et al. | 2016-02-18 |
Chemical Mechanical Polishing (CMP) of Colbalt-Containing Substrate
App 20160027657 - Shi; Xiaobo ; et al. | 2016-01-28 |
Chemical vapor deposition method
Grant 9,212,420 - Lee , et al. December 15, 2 | 2015-12-15 |
Alkoxyaminosilane compounds and applications thereof
Grant 9,200,167 - Spence , et al. December 1, 2 | 2015-12-01 |
Compositions And Methods For The Deposition Of Silicon Oxide Films
App 20150275355 - Mallikarjunan; Anupama ; et al. | 2015-10-01 |
Methods to Prepare Silicon-Containing Films
App 20150249007 - Xiao; Manchao ; et al. | 2015-09-03 |
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
Grant 9,061,317 - Vrtis , et al. June 23, 2 | 2015-06-23 |
Organoaminosilane precursors and methods for making and using same
Grant 9,005,719 - Xiao , et al. April 14, 2 | 2015-04-14 |
Methods for Depositing Silicon Nitride Films
App 20150099375 - Haripin; Chandra ; et al. | 2015-04-09 |
Halogenated organoaminosilane precursors and methods for depositing films comprising same
Grant 8,993,072 - Xiao , et al. March 31, 2 | 2015-03-31 |
Organoaminosilane Precursors And Methods For Depositing Films Comprising Same
App 20150087139 - O'Neill; Mark Leonard ; et al. | 2015-03-26 |
Antireflective coatings for photovoltaic applications
Grant 8,987,039 - Hurley , et al. March 24, 2 | 2015-03-24 |
Methods for using porogens for low k porous organosilica glass films
Grant 8,951,342 - Vrtis , et al. February 10, 2 | 2015-02-10 |
Process for producing silicon and oxide films from organoaminosilane precursors
Grant 8,940,648 - Xiao , et al. January 27, 2 | 2015-01-27 |
Barrier Materials For Display Devices
App 20150021599 - Ridgeway; Robert Gordon ; et al. | 2015-01-22 |
Compositions And Methods For Making Silicon Containing Films
App 20150014823 - Mallikarjunan; Anupama ; et al. | 2015-01-15 |
Organoaminosilane precursors and methods for depositing films comprising same
Grant 8,912,353 - Xiao , et al. December 16, 2 | 2014-12-16 |
Materials and Methods of Forming Controlled Void
App 20140363950 - Vrtis; Raymond Nicholas ; et al. | 2014-12-11 |
Dielectric barrier deposition using nitrogen containing precursor
Grant 8,889,235 - Mallikarjunan , et al. November 18, 2 | 2014-11-18 |
Materials and methods of forming controlled void
Grant 8,846,522 - Vrtis , et al. September 30, 2 | 2014-09-30 |
Compositions And Processes For Depositing Carbon-doped Silicon-containing Films
App 20140287164 - Xiao; Manchao ; et al. | 2014-09-25 |
Organoaminosilane Precursors And Methods For Making And Using Same
App 20140272194 - Xiao; Manchao ; et al. | 2014-09-18 |
Organoaminosilane precursors and methods for making and using same
Grant 8,771,807 - Xiao , et al. July 8, 2 | 2014-07-08 |
Dielectric Films Comprising Silicon And Methods For Making Same
App 20140183706 - Yang; Liu ; et al. | 2014-07-03 |
Low-impurity organosilicon product as precursor for CVD
Grant 8,759,563 - Mayorga , et al. June 24, 2 | 2014-06-24 |
Dielectric films comprising silicon and methods for making same
Grant 8,703,624 - Yang , et al. April 22, 2 | 2014-04-22 |
Non-oxygen Containing Silicon-based Films And Methods Of Forming The Same
App 20140030448 - Bowen; Heather Regina ; et al. | 2014-01-30 |
Dielectric barrier deposition using oxygen containing precursor
Grant 8,637,396 - Matz , et al. January 28, 2 | 2014-01-28 |
Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
App 20130330937 - Xiao; Manchao ; et al. | 2013-12-12 |
Organoaminodisilane Precursors And Methods For Depositing Films Comprising Same
App 20130319290 - Xiao; Manchao ; et al. | 2013-12-05 |
Organoaminodisilane Precursors And Methods For Depositing Films Comprising Same
App 20130323435 - Xiao; Manchao ; et al. | 2013-12-05 |
High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films
App 20130295779 - Chandra; Haripin ; et al. | 2013-11-07 |
Catalyst Synthesis For Organosilane Sol-gel Reactions
App 20130243968 - Xiao; Manchao ; et al. | 2013-09-19 |
Process for producing silicon and oxide films from organoaminosilane precursors
Grant 8,530,361 - Xiao , et al. September 10, 2 | 2013-09-10 |
Alkoxyaminosilane Compounds And Applications Thereof
App 20130196082 - Spence; Daniel P. ; et al. | 2013-08-01 |
Materials and Methods of Forming Controlled Void
App 20130157435 - Vrtis; Raymond Nicholas ; et al. | 2013-06-20 |
Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes
Grant 8,460,753 - Xiao , et al. June 11, 2 | 2013-06-11 |
Organoaminosilane Precursors And Methods For Making And Using Same
App 20130129940 - Xiao; Manchao ; et al. | 2013-05-23 |
Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor
Grant 8,440,099 - Mayorga , et al. May 14, 2 | 2013-05-14 |
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
App 20130095255 - Vrtis; Raymond Nicholas ; et al. | 2013-04-18 |
Halogenated Organoaminosilane Precursors And Methods For Depositing Films Comprising Same
App 20130078392 - Xiao; Manchao ; et al. | 2013-03-28 |
Materials and methods of forming controlled void
Grant 8,399,349 - Vrtis , et al. March 19, 2 | 2013-03-19 |
Low-Impurity Organosilicon Product as Precursor for CVD
App 20130060061 - Mayorga; Steven Gerard ; et al. | 2013-03-07 |
Low-impurity organosilicon product as precursor for CVD
Grant 8,329,933 - Mayorga , et al. December 11, 2 | 2012-12-11 |
Methods For Using Porogens For Low K Porous Organosilica Glass Films
App 20120282415 - Vrtis; Raymond Nicholas ; et al. | 2012-11-08 |
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
Grant 8,293,001 - Vrtis , et al. October 23, 2 | 2012-10-23 |
Process for restoring dielectric properties
Grant 8,283,260 - Weigel , et al. October 9, 2 | 2012-10-09 |
Aminovinylsilane for CVD and ALD SiO2 Films
App 20120148745 - Xiao; Manchao ; et al. | 2012-06-14 |
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
App 20120128897 - Xiao; Manchao ; et al. | 2012-05-24 |
Process stability of NBDE using substituted phenol stabilizers
Grant 8,173,213 - Mayorga , et al. May 8, 2 | 2012-05-08 |
Mechanical enhancer additives for low dielectric films
Grant 8,137,764 - Vincent , et al. March 20, 2 | 2012-03-20 |
Low-impurity Organosilicon Product As Precursor For Cvd
App 20110295033 - Mayorga; Steven Gerard ; et al. | 2011-12-01 |
Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
App 20110262642 - Xiao; Manchao ; et al. | 2011-10-27 |
Adhesion to copper and copper electromigration resistance
Grant 8,043,976 - Vrtis , et al. October 25, 2 | 2011-10-25 |
Aminosilanes for shallow trench isolation films
Grant 7,999,355 - Weigel , et al. August 16, 2 | 2011-08-16 |
Method and composition for restoring dielectric properties of porous dielectric materials
Grant 7,977,121 - Tamboli , et al. July 12, 2 | 2011-07-12 |
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants
App 20110143032 - Vrtis; Raymond Nicholas ; et al. | 2011-06-16 |
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
Grant 7,943,195 - Vrtis , et al. May 17, 2 | 2011-05-17 |
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
Grant 7,932,188 - Lukas , et al. April 26, 2 | 2011-04-26 |
Dielectric Barrier Deposition Using Nitrogen Containing Precursor
App 20100291321 - Mallikarjunan; Anupama ; et al. | 2010-11-18 |
Chemical vapor deposition method
App 20100247803 - LEE; Eric M. ; et al. | 2010-09-30 |
Dielectric Films Comprising Silicon And Methods For Making Same
App 20100233886 - Yang; Liu ; et al. | 2010-09-16 |
Dielectric Barrier Deposition Using Oxygen Containing Precursor
App 20100136789 - Matz; Laura M. ; et al. | 2010-06-03 |
Process For Restoring Dielectric Properties
App 20100041234 - Weigel; Scott Jeffrey ; et al. | 2010-02-18 |
Aminosilanes for Shallow Trench Isolation Films
App 20100009546 - Weigel; Scott Jeffrey ; et al. | 2010-01-14 |
Process Stability of NBDE Using Substituted Phenol Stabilizers
App 20090297711 - Mayorga; Steven Gerard ; et al. | 2009-12-03 |
Adhesion to Copper and Copper Electromigration Resistance
App 20090236745 - Vrtis; Raymond Nicholas ; et al. | 2009-09-24 |
Method for removing carbon-containing residues from a substrate
Grant 7,581,549 - Johnson , et al. September 1, 2 | 2009-09-01 |
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-based Precursor
App 20090159844 - Mayorga; Steven Gerard ; et al. | 2009-06-25 |
Antireflective Coatings
App 20090096106 - Vrtis; Raymond Nicholas ; et al. | 2009-04-16 |
Antireflective Coatings For Photovoltaic Applications
App 20090095346 - Hurley; Patrick Timothy ; et al. | 2009-04-16 |
Activated chemical process for enhancing material properties of dielectric films
Grant 7,500,397 - Weigel , et al. March 10, 2 | 2009-03-10 |
Mechanical Enhancement of Dense and Porous Organosilicate Materials by UV Exposure
App 20090054674 - Lukas; Aaron Scott ; et al. | 2009-02-26 |
Non-thermal process for forming porous low dielectric constant films
Grant 7,470,454 - Lukas , et al. December 30, 2 | 2008-12-30 |
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
Grant 7,468,290 - Lukas , et al. December 23, 2 | 2008-12-23 |
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
App 20080271640 - Vrtis; Raymond Nicholas ; et al. | 2008-11-06 |
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
App 20080268177 - Vrtis; Raymond Nicholas ; et al. | 2008-10-30 |
Activated Chemical Process for Enhancing Material Properties of Dielectric Films
App 20080199977 - Weigel; Scott Jeffrey ; et al. | 2008-08-21 |
Non-thermal process for forming porous low dielectric constant films
Grant 7,404,990 - Lukas , et al. July 29, 2 | 2008-07-29 |
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
Grant 7,384,471 - Vrtis , et al. June 10, 2 | 2008-06-10 |
Method and composition for restoring dielectric properties of porous dielectric materials
App 20080118995 - Tamboli; Dnyanesh Chandrakant ; et al. | 2008-05-22 |
Porous low dielectric constant compositions and methods for making and using same
Grant 7,332,445 - Lukas , et al. February 19, 2 | 2008-02-19 |
Materials And Methods Of Forming Controlled Void
App 20080038934 - VRTIS; RAYMOND NICHOLAS ; et al. | 2008-02-14 |
Curing Dielectric Films Under A Reducing Atmosphere
App 20070299239 - Weigel; Scott Jeffrey ; et al. | 2007-12-27 |
Low-Impurity Organosilicon Product As Precursor For CVD
App 20070287849 - Mayorga; Steven Gerard ; et al. | 2007-12-13 |
Method for removing a residue from a chamber
App 20060196525 - Vrtis; Raymond Nicholas ; et al. | 2006-09-07 |
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
Grant 7,098,149 - Lukas , et al. August 29, 2 | 2006-08-29 |
Method for defining a feature on a substrate
App 20060183055 - O'Neill; Mark Leonard ; et al. | 2006-08-17 |
Low dielectric constant material and method of processing by CVD
Grant 7,074,489 - O'Neill , et al. July 11, 2 | 2006-07-11 |
Porous low dielectric constant compositions and methods for making and using same
App 20060078676 - Lukas; Aaron Scott ; et al. | 2006-04-13 |
Method for removing carbon-containing residues from a substrate
App 20060027249 - Johnson; Andrew David ; et al. | 2006-02-09 |
Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants
Grant 6,846,515 - Vrtis , et al. January 25, 2 | 2005-01-25 |
Mechanical enhancer additives for low dielectric films
App 20040241463 - Vincent, Jean Louise ; et al. | 2004-12-02 |
Method for enhancing deposition rate of chemical vapor deposition films
App 20040197474 - Vrtis, Raymond Nicholas ; et al. | 2004-10-07 |
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
App 20040175957 - Lukas, Aaron Scott ; et al. | 2004-09-09 |
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
App 20040175501 - Lukas, Aaron Scott ; et al. | 2004-09-09 |
Non-thermal process for forming porous low dielectric constant films
App 20040096672 - Lukas, Aaron Scott ; et al. | 2004-05-20 |
Non-thermal process for forming porous low dielectric constant films
App 20040096593 - Lukas, Aaron Scott ; et al. | 2004-05-20 |
Low dielectric constant material and method of processing by CVD
Grant 6,716,770 - O'Neill , et al. April 6, 2 | 2004-04-06 |
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
App 20030232137 - Vrtis, Raymond Nicholas ; et al. | 2003-12-18 |
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
App 20030198742 - Vrtis, Raymond Nicholas ; et al. | 2003-10-23 |
Low dielectric constant material and method of processing by CVD
App 20030162034 - O'Neill, Mark Leonard ; et al. | 2003-08-28 |
Organosilicon precursors for interlayer dielectric films with low dielectric constants
Grant 6,583,048 - Vincent , et al. June 24, 2 | 2003-06-24 |
Low dielectric constant material and method of processing by CVD
App 20030049460 - O'Neill, Mark Leonard ; et al. | 2003-03-13 |
| 