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Patent applications and USPTO patent grants for Nyui; Masaru.The latest application filed is for "exposure apparatus and device manufacturing method".
Patent | Date |
---|---|
Exposure apparatus and device manufacturing method Grant 7,916,273 - Nyui , et al. March 29, 2 | 2011-03-29 |
Exposure Apparatus And Device Manufacturing Method App 20070109514 - Nyui; Masaru ;   et al. | 2007-05-17 |
Polishing apparatus and polishing method Grant 6,551,172 - Nyui , et al. April 22, 2 | 2003-04-22 |
Polishing method and polishing apparatus using the same Grant 6,503,361 - Nyui , et al. January 7, 2 | 2003-01-07 |
Polishing apparatus and polishing method Grant 6,142,855 - Nyui , et al. November 7, 2 | 2000-11-07 |
Film thickness measuring method and apparatus Grant 6,137,575 - Sugiyama , et al. October 24, 2 | 2000-10-24 |
Polishing method and polishing apparatus using the same Grant 6,093,081 - Nyui , et al. July 25, 2 | 2000-07-25 |
Method and apparatus for measuring film thickness and film thickness distribution during polishing Grant 6,004,187 - Nyui , et al. December 21, 1 | 1999-12-21 |
Talbot's interference type optical encoder Grant 5,359,193 - Nyui , et al. October 25, 1 | 1994-10-25 |
Encoder using a birefringent element and a system including the same Grant 5,302,821 - Igaki , et al. April 12, 1 | 1994-04-12 |
Retinal camera Grant 4,810,084 - Nyui March 7, 1 | 1989-03-07 |
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