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Patent applications and USPTO patent grants for NUNTAWORANUCH; Nattaworn.The latest application filed is for "deposition radial and edge profile tenability through independent control of teos flow".
Patent | Date |
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Deposition Radial And Edge Profile Tenability Through Independent Control Of Teos Flow App 20180350562 - BALUJA; Sanjeev ;   et al. | 2018-12-06 |
Lateral plasma/radical source Grant 10,121,655 - Subramani , et al. November 6, 2 | 2018-11-06 |
High Deposition Rate High Quality Silicon Nitride Enabled By Remote Nitrogen Radical Source App 20180294144 - AUBUCHON; Joseph F. ;   et al. | 2018-10-11 |
Lateral Plasma/Radical Source App 20170148626 - Subramani; Anantha K. ;   et al. | 2017-05-25 |
Magnet Configurations For Radial Uniformity Tuning Of Icp Plasmas App 20160225590 - Aubuchon; Joseph F. ;   et al. | 2016-08-04 |
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