Nunomura; Masataka

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nunomura; Masataka.The latest application filed is for "photosensitive polymer composition, method of forming relief patterns, and electronic equipment".

Company Profile

0.5.7

Nunomura; Masataka - Ibaraki JP
Nunomura; Masataka - Hitachi JP
Nunomura, Masataka - Hitachi-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Grant 8,304,149 - Nunomura , et al. November 6, 2	2012-11-06
Photosensitive Polymer Composition, Method Of Forming Relief Patterns, And Electronic Equipment App 20110076458 - NUNOMURA; Masataka ; et al.	2011-03-31
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Grant 7,851,128 - Nunomura , et al. December 14, 2	2010-12-14
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment App 20070072122 - Nunomura; Masataka ; et al.	2007-03-29
Pattern-forming process using photosensitive resin composition Grant 7,153,631 - Hagiwara , et al. December 26, 2	2006-12-26
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment Grant 7,150,947 - Nunomura , et al. December 19, 2	2006-12-19
Pattern-forming process using photosensitive resin composition App 20040106066 - Hagiwara, Hideo ; et al.	2004-06-03
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment App 20040029045 - Nunomura, Masataka ; et al.	2004-02-12
Photosensitive resin composition App 20020004177 - Hagiwara, Hideo ; et al.	2002-01-10
Photosensitive polymer composition, method for forming relief patterns, and electronic parts Grant 6,329,110 - Nunomura , et al. December 11, 2	2001-12-11
Photosensitive polymer composition, method for forming relief patterns, and electronic parts App 20010031419 - Nunomura, Masataka ; et al.	2001-10-18
Photosensitive polymer composition, method for forming relief patterns, and electronic parts App 20010009746 - Nunomura, Masataka ; et al.	2001-07-26

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