Nunan; Peter D.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nunan; Peter D..The latest application filed is for "using ion implantation to control trench depth and alter optical properties of a substrate".

Company Profile

0.5.7

Nunan; Peter D. - Monte Sereno CA
Nunan; Peter D. - Monte Serono CA
Nunan; Peter D. - MonteSereno CA
Nunan; Peter D. - Scottsdale AZ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Technique for matching performance of ion implantation devices using an in-situ mask Grant 7,619,229 - Nunan , et al. November 17, 2	2009-11-17
Using Ion Implantation To Control Trench Depth And Alter Optical Properties Of A Substrate App 20090137106 - Nunan; Peter D.	2009-05-28
Uniformity Control For Ion Beam Assisted Etching App 20090084757 - Erokhin; Yuri ; et al.	2009-04-02
Technique For Matching Performance Of Ion Implantation Devices Using An In-situ Mask App 20080087844 - Nunan; Peter D. ; et al.	2008-04-17
Technique For Depositing Metallic Films Using Ion Implantation Surface Modification For Catalysis Of Electroless Deposition App 20070184194 - Nunan; Peter D. ; et al.	2007-08-09
Method and apparatus for transistor sidewall salicidation Grant 7,151,018 - Nunan , et al. December 19, 2	2006-12-19
Apparatus and methods for determining and localization of failures in test structures using voltage contrast Grant 6,861,666 - Weiner , et al. March 1, 2	2005-03-01
Apparatus and methods for monitoring self-aligned contact arrays using voltage contrast inspection Grant 6,855,568 - Weiner , et al. February 15, 2	2005-02-15
Method of utilizing hard mask for copper plasma etch Grant 6,797,640 - Tesauro , et al. September 28, 2	2004-09-28
Apparatus and methods for monitoring self-aligned contact arrays App 20030003611 - Weiner, Kurt H. ; et al.	2003-01-02
Hard Mask for copper plasma etch App 20020048952 - Tesauro, Mark Richard ; et al.	2002-04-25
Hard Mask For Copper Plasma Etch App 20010035582 - TESAURO, MARK RICHARD ; et al.	2001-11-01

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