NUMANAMI; Tsuneo

Patent Applications and Registrations

Patent applications and USPTO patent grants for NUMANAMI; Tsuneo.The latest application filed is for "substrate cleaning apparatus and method for cleaning substrate for substrate related to photomask".

Company Profile

0.7.8

NUMANAMI; Tsuneo - Jyoetsu JP
Numanami; Tsuneo - Niigata-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate Cleaning Apparatus And Method For Cleaning Substrate For Substrate Related To Photomask App 20170110355 - NUMANAMI; Tsuneo ; et al.	2017-04-20
Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus Grant 8,956,463 - Numanami February 17, 2	2015-02-17
Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus App 20100083985 - Numanami; Tsuneo	2010-04-08
Photomask blank substrate, photomask blank and photomask Grant 7,351,504 - Nakatsu , et al. April 1, 2	2008-04-01
Method of making photomask blank substrates Grant 7,344,808 - Numanami , et al. March 18, 2	2008-03-18
Method of selecting photomask blank substrates Grant 7,329,475 - Nakatsu , et al. February 12, 2	2008-02-12
Phase shift mask blank, phase shift mask, and method of manufacture Grant 7,179,567 - Inazuki , et al. February 20, 2	2007-02-20
Method of selecting photomask blank substrates Grant 7,070,888 - Nakatsu , et al. July 4, 2	2006-07-04
Photomask blank substrate, photomask blank and photomask App 20050019677 - Nakatsu, Masayuki ; et al.	2005-01-27
Method of selecting photomask blank substrates App 20050019678 - Nakatsu, Masayuki ; et al.	2005-01-27
Method of making photomask blank substrates App 20050020083 - Numanami, Tsuneo ; et al.	2005-01-27
Method of selecting photomask blank substrates App 20050019676 - Nakatsu, Masayuki ; et al.	2005-01-27
Phase shift mask blank, phase shift mask, and method of manufacture App 20030235767 - Inazuki, Yukio ; et al.	2003-12-25
Phase shift mask blank, phase shift mask, and method of manufacture App 20030025216 - Inazuki, Yukio ; et al.	2003-02-06

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