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name:-0.010209083557129
name:-0.0057380199432373
name:-0.0003359317779541
Nozawa; Yoshiyuki Patent Filings

Nozawa; Yoshiyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nozawa; Yoshiyuki.The latest application filed is for "plasma etching method".

Company Profile
0.7.8
  • Nozawa; Yoshiyuki - Hyogo N/A JP
  • Nozawa; Yoshiyuki - Nishinomiya N/A JP
  • Nozawa; Yoshiyuki - Amagasaki JP
  • Nozawa; Yoshiyuki - Nishinomiya-shi JP
  • Nozawa; Yoshiyuki - Amagasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma etching method
Grant 8,628,676 - Ikemoto , et al. January 14, 2
2014-01-14
Method, apparatus and program for manufacturing silicon structure
Grant 8,546,265 - Nozawa , et al. October 1, 2
2013-10-01
Plasma etching method capable of detecting end point and plasma etching device therefor
Grant 8,518,283 - Yamamoto , et al. August 27, 2
2013-08-27
Plasma Etching Method
App 20130034961 - Ikemoto; Naoya ;   et al.
2013-02-07
Plasma Etching Apparatus
App 20120006490 - Yamamoto; Takashi ;   et al.
2012-01-12
Method, Apparatus And Program For Manufacturing Silicon Structure
App 20110097903 - Nozawa; Yoshiyuki ;   et al.
2011-04-28
Plasma Etching Method Capable Of Detecting End Point And Plasma Etching Device Therefor
App 20090277872 - Yamamoto; Takashi ;   et al.
2009-11-12
Silicon Substrate Etching Method
App 20070212888 - Kasai; Kazuo ;   et al.
2007-09-13
Method for etching of a silicon substrate and etching apparatus
Grant 7,220,678 - Nozawa , et al. May 22, 2
2007-05-22
Method for etching of a silicon substrate and etching apparatus
App 20050130436 - Nozawa, Yoshiyuki ;   et al.
2005-06-16
Silicon substrate etching method and etching apparatus
App 20040180544 - Kasai, Kazuo ;   et al.
2004-09-16

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