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name:-0.0061860084533691
name:-0.00097894668579102
Nozaki; Yoshikazu Patent Filings

Nozaki; Yoshikazu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nozaki; Yoshikazu.The latest application filed is for "plasma processing apparatus".

Company Profile
0.4.6
  • Nozaki; Yoshikazu - Tokyo JP
  • Nozaki; Yoshikazu - Yokohama JP
  • Nozaki; Yoshikazu - Palo Alto CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma processing apparatus
Grant 7,849,815 - Osada , et al. December 14, 2
2010-12-14
Plasma Processing Apparatus
App 20090044910 - OSADA; Tomoaki ;   et al.
2009-02-19
Transmission system with congestion state-based flow control
Grant 7,457,238 - Maehara , et al. November 25, 2
2008-11-25
Wafer stage with a magnet
Grant 7,164,571 - Wickramanayaka , et al. January 16, 2
2007-01-16
Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
Grant 7,159,537 - Wickramanayaka , et al. January 9, 2
2007-01-09
Wafer Stage
App 20050185359 - Wickramanayaka, Sunil ;   et al.
2005-08-25
Transmission system
App 20050083837 - Maehara, Akikazu ;   et al.
2005-04-21
Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
App 20050028935 - Wickramanayaka, Sunil ;   et al.
2005-02-10
Plasma processing apparatus
App 20040149216 - Osada, Tomoaki ;   et al.
2004-08-05
Plasma-enhanced processing apparatus
App 20010030024 - Sago, Yasumi ;   et al.
2001-10-18

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