Noya; Go

Patent Applications and Registrations

Patent applications and USPTO patent grants for Noya; Go.The latest application filed is for "film forming composition and film forming method using the same".

Company Profile

4.15.18

Noya; Go - Kakegawa JP
NOYA; Go - Kakegawa-shi JP
Noya; Go - Shizouka JP
Noya; Go - Shizuoka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Film forming composition and film forming method using the same Grant 11,161,982 - Ozaki , et al. November 2, 2	2021-11-02
Film forming composition Grant 11,059,995 - Noya , et al. July 13, 2	2021-07-13
Film Forming Composition And Film Forming Method Using The Same App 20210115253 - OZAKI; Yuki ; et al.	2021-04-22
Film Forming Composition App 20200377761 - NOYA; Go ; et al.	2020-12-03
Composition for forming underlayer and method for forming underlayer therewith Grant 10,451,971 - Suzuki , et al. Oc	2019-10-22
Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using composition Grant 10,435,555 - Nakasugi , et al. O	2019-10-08
A Polymer, Composition, Forming Sacrificial Layer And Method For Semiconductor Device Therewith App 20190048129 - NAKASUGI; Shigemasa ; et al.	2019-02-14
Composition For Forming Underlayer And Method For Forming Underlayer Therewith App 20180039178 - SUZUKI; Masato ; et al.	2018-02-08
Sacrificial Film Composition, Method For Preparing Same, Semiconductor Device Having Voids Formed Using Said Composition, And Method For Manufacturing Semiconductor Device Using Said Composition App 20170218227 - NAKASUGI; Shigemasa ; et al.	2017-08-03
Void Forming Composition, Semiconductor Device Provided With Voids Formed Using Composition, And Method For Manufacturing Semiconductor Device Using Composition App 20170210896 - NAKASUGI; Shigemasa ; et al.	2017-07-27
Rinsing liquid for lithography and pattern forming method using same Grant 9,494,867 - Matsuura , et al. November 15, 2	2016-11-15
Composition for forming fine resist pattern and pattern formation method using same Grant 9,360,756 - Yamamoto , et al. June 7, 2	2016-06-07
Rinsing Liquid For Lithography And Pattern Forming Method Using Same App 20160109805 - MATSUURA; Yuriko ; et al.	2016-04-21
Composition for forming tungsten oxide film and method for producing tungsten oxide film using same Grant 9,152,052 - Noya October 6, 2	2015-10-06
Composition For Forming Fine Resist Pattern And Pattern Formation Method Using Same App 20150253669 - Yamamoto; Kazuma ; et al.	2015-09-10
Composition For Forming Tungsten Oxide Film And Method For Producing Tungsten Oxide Film Using Same App 20140356792 - Noya; Go	2014-12-04
Composition for formation of top antireflective film, and pattern formation method using the composition Grant 8,568,955 - Akiyama , et al. October 29, 2	2013-10-29
Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern Grant 8,501,394 - Takano , et al. August 6, 2	2013-08-06
Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method Grant 8,101,333 - Noya , et al. January 24, 2	2012-01-24
Processing liquid for resist substrate and method of processing resist substrate using the same Grant 7,998,664 - Noya , et al. August 16, 2	2011-08-16
Superfine-patterned Mask, Method For Production Thereof, And Method Employing The Same For Forming Superfine-pattern App 20100308015 - Takano; Yusuke ; et al.	2010-12-09
Composition For Formation Of Top Antireflective Film, And Pattern Formation Method Using The Composition App 20100286318 - Akiyama; Yasushi ; et al.	2010-11-11
Composition For Formation Of Top Anti-reflective Film, And Pattern Formation Method Using The Composition App 20100279235 - Noya; Go ; et al.	2010-11-04
Processing Liquid for Resist Substrate and Method of Processing Resist Substrate Using the Same App 20100233634 - Noya; Go ; et al.	2010-09-16
Composition For Upper Surface Antireflection Film, And Method For Pattern Formation Using The Same App 20100062363 - Noya; Go ; et al.	2010-03-11
Solution for treatment of resist substrate after development processing and method for treatment of resist substrate using the same App 20100028817 - Noya; Go ; et al.	2010-02-04
Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method App 20100021700 - Noya; Go ; et al.	2010-01-28
Method of forming microfined resist pattern App 20100003468 - Noya; Go ; et al.	2010-01-07

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