Nowland; John G.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nowland; John G..The latest application filed is for "chemical mechanical polishing pad with polishing layer and window".

Company Profile

0.6.6

Nowland; John G. - Elkton MD

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Chemical mechanical polishing pad with polishing layer and window Grant 9,259,820 - Qian , et al. February 16, 2	2016-02-16
Soft and conditionable chemical mechanical window polishing pad Grant 9,238,295 - Qian , et al. January 19, 2	2016-01-19
Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer Grant 9,238,296 - Murnane , et al. January 19, 2	2016-01-19
Soft and conditionable chemical mechanical polishing pad stack Grant 9,233,451 - Murnane , et al. January 12, 2	2016-01-12
Chemical Mechanical Polishing Pad With Polishing Layer And Window App 20150273652 - Qian; Bainian ; et al.	2015-10-01
Method of chemical mechanical polishing a substrate Grant 9,102,034 - Jensen , et al. August 11, 2	2015-08-11
Soft and conditionable chemical mechanical polishing pad with window Grant 9,064,806 - Qian , et al. June 23, 2	2015-06-23
Method Of Chemical Mechanical Polishing A Substrate App 20150065014 - Jensen; Michelle ; et al.	2015-03-05
Chemical Mechanical Polishing Pad App 20150065013 - Jensen; Michelle ; et al.	2015-03-05
Soft and Conditionable Chemical Mechanical Window Polishing Pad App 20140357170 - Qian; Bainian ; et al.	2014-12-04
Soft And Conditionable Chemical Mechanical Polishing Pad Stack App 20140357169 - Murnane; James ; et al.	2014-12-04
Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Conditionable Polishing Layer App 20140357163 - Murnane; James ; et al.	2014-12-04

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