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Patent applications and USPTO patent grants for Novembre, Anthony E..The latest application filed is for "process for fabricating a projection electron lithography mask and a removable, reusable cover for use therein".
Patent | Date |
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Process for fabricating a projection electron lithography mask and a removable, reusable cover for use therein App 20010031404 - Caminos, Carlos G. ;   et al. | 2001-10-18 |
Device fabrication process Grant 5,366,851 - Novembre November 22, 1 | 1994-11-22 |
Resist materials Grant 5,066,566 - Novembre November 19, 1 | 1991-11-19 |
Negative resist with oxygen plasma resistance Grant 4,935,094 - Mixon , et al. June 19, 1 | 1990-06-19 |
Processes involving lithographic materials Grant 4,892,617 - Bates , et al. January 9, 1 | 1990-01-09 |
Negative resist with oxygen plasma resistance Grant 4,701,342 - Novembre , et al. October 20, 1 | 1987-10-20 |
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