Norman; John Anthony Thomas

Patent Applications and Registrations

Patent applications and USPTO patent grants for Norman; John Anthony Thomas.The latest application filed is for "volatile dihydropyrazinly and dihydropyrazine metal complexes".

Company Profile

2.39.37

Norman; John Anthony Thomas - Encinitas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Volatile dihydropyrazinly and dihydropyrazine metal complexes Grant 10,914,001 - Norman , et al. February 9, 2	2021-02-09
Volatile dihydropyrazinly and dihydropyrazine metal complexes App 20190292659 - Norman; John Anthony Thomas ; et al.	2019-09-26
Volatile Dihydropyrazinly and Dihydropyrazine Metal Complexes App 20180327900 - Norman; John Anthony Thomas ; et al.	2018-11-15
Volatile dihydropyrazinly and dihydropyrazine metal complexes Grant 9,994,954 - Norman , et al. June 12, 2	2018-06-12
Complexes of imidazole ligands Grant 9,018,387 - Norman , et al. April 28, 2	2015-04-28
Metal-enolate precursors for depositing metal-containing films Grant 8,962,875 - Norman , et al. February 24, 2	2015-02-24
Volatile dihydropyrazinly and dihydropyrazine metal complexes App 20150030782 - Ivanov; Sergei Vladimirovich ; et al.	2015-01-29
Volatile group 2 metal precursors Grant 8,859,785 - Norman October 14, 2	2014-10-14
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors App 20140242795 - Norman; John Anthony Thomas ; et al.	2014-08-28
Volatile imidazoles and group 2 imidazole based metal precursors Grant 8,703,103 - Norman , et al. April 22, 2	2014-04-22
Complexes of imidazole ligands Grant 8,680,289 - Norman , et al. March 25, 2	2014-03-25
Liquid precursor for depositing group 4 metal containing films Grant 8,592,606 - Lei , et al. November 26, 2	2013-11-26
Group 2 Imidazolate Formulations for Direct Liquid Injection App 20130260025 - Norman; John Anthony Thomas ; et al.	2013-10-03
Liquid composition containing aminoether for deposition of metal-containing films Grant 8,507,704 - Ivanov , et al. August 13, 2	2013-08-13
Complexes Of Imidazole Ligands App 20130078391 - Norman; John Anthony Thomas ; et al.	2013-03-28
Metal-Enolate Precursors For Depositing Metal-Containing Films App 20130066082 - Norman; John Anthony Thomas ; et al.	2013-03-14
Metal-Enolate Precursors For Depositing Metal-Containing Films App 20130011579 - Norman; John Anthony Thomas ; et al.	2013-01-10
High coordination sphere group 2 metal .beta.-diketiminate precursors Grant 8,313,807 - Norman , et al. November 20, 2	2012-11-20
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 8,293,001 - Vrtis , et al. October 23, 2	2012-10-23
Process for selectively depositing copper thin films on substrates with copper and ruthenium areas via vapor deposition Grant 8,283,485 - Norman October 9, 2	2012-10-09
Copper precursors for thin film deposition Grant 8,263,795 - Norman , et al. September 11, 2	2012-09-11
Complexes Of Imidazole Ligands App 20120121806 - Norman; John Anthony Thomas ; et al.	2012-05-17
Low temperature thermal conductive inks Grant 8,143,431 - Norman , et al. March 27, 2	2012-03-27
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors App 20120035351 - Norman; John Anthony Thomas ; et al.	2012-02-09
Liquid Composition Containing Aminoether For Deposition Of Metal-containing Films App 20110212629 - Ivanov; Sergei Vladimirovich ; et al.	2011-09-01
Methods for depositing metal films onto diffusion barrier layers by CVD or ALD processes Grant 7,985,449 - Garg , et al. July 26, 2	2011-07-26
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants App 20110143032 - Vrtis; Raymond Nicholas ; et al.	2011-06-16
Liquid Precursor for Depositing Group 4 Metal Containing Films App 20110135838 - Lei; Xinjian ; et al.	2011-06-09
Volatile Group 2 Metal Precursors App 20110120875 - Norman; John Anthony Thomas	2011-05-26
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 7,943,195 - Vrtis , et al. May 17, 2	2011-05-17
Materials for adhesion enhancement of copper film on diffusion barriers Grant 7,919,409 - Cheng , et al. April 5, 2	2011-04-05
Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides Grant 7,754,906 - Norman , et al. July 13, 2	2010-07-13
High Coordination Sphere Group 2 Metal B-Diketiminate Precursors App 20100173075 - Norman; John Anthony Thomas ; et al.	2010-07-08
Volatile Group 2 Metal 1,3,5-Triazapentadienate Compounds App 20100130779 - Norman; John Anthony Thomas	2010-05-27
Group 2 Metal Precursors For Deposition Of Group 2 Metal Oxide Films App 20100119726 - Lei; Xinjian ; et al.	2010-05-13
Materials for Adhesion Enhancement of Copper Film on Diffusion Barriers App 20100038785 - Cheng; Hansong ; et al.	2010-02-18
Copper Precursors for Thin Film Deposition App 20090114874 - Norman; John Anthony Thomas ; et al.	2009-05-07
Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processes Grant 7,524,533 - Garg , et al. April 28, 2	2009-04-28
Process for Forming Continuous Copper Thin Films Via Vapor Deposition App 20080318418 - Norman; John Anthony Thomas	2008-12-25
Low Temperature Thermal Conductive Inks App 20080305268 - Norman; John Anthony Thomas ; et al.	2008-12-11
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants App 20080271640 - Vrtis; Raymond Nicholas ; et al.	2008-11-06
Metal Precursor Solutions For Chemical Vapor Deposition App 20080254218 - Lei; Xinjian ; et al.	2008-10-16
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants Grant 7,384,471 - Vrtis , et al. June 10, 2	2008-06-10
Methods For Depositing Metal Films On Diffusion Barrier Layers By CVD Processes App 20080075855 - Garg; Diwakar ; et al.	2008-03-27
Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes Grant 7,311,946 - Garg , et al. December 25, 2	2007-12-25
Diffusion Barrier Layers and Methods Comprising for Depositing Metal Films by CVD or ALD Processes App 20070190779 - Garg; Diwakar ; et al.	2007-08-16
Volatile metal .beta.-ketoiminate and metal .beta.-diiminate complexes Grant 7,205,422 - Norman April 17, 2	2007-04-17
Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides App 20070082500 - Norman; John Anthony Thomas ; et al.	2007-04-12
Volatile metal beta-ketoiminate and metal beta-diiminate complexes App 20060145142 - Norman; John Anthony Thomas	2006-07-06
Volatile metal .beta.-ketoiminate complexes Grant 7,034,169 - Norman April 25, 2	2006-04-25
Process for atomic layer deposition of metal films Grant 6,869,876 - Norman , et al. March 22, 2	2005-03-22
Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants Grant 6,846,515 - Vrtis , et al. January 25, 2	2005-01-25
Copper CVD precursors with enhanced adhesion properties Grant 6,838,573 - Farnia , et al. January 4, 2	2005-01-04
Diffusion barrier layers and methods comprising for depositing metal films by CVD or ALD processes App 20040234704 - Garg, Diwakar ; et al.	2004-11-25
Volatile precursors for deposition of metals and metal-containing films Grant 6,818,783 - Norman , et al. November 16, 2	2004-11-16
Diffusion barrier layers and methods comprising same for depositing metal films by CVD or ALD processes App 20040219369 - Garg, Diwakar ; et al.	2004-11-04
Precursors for metal containing films App 20040215030 - Norman, John Anthony Thomas	2004-10-28
Process for atomic layer deposition of metal films App 20040087143 - Norman, John Anthony Thomas ; et al.	2004-05-06
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants App 20030232137 - Vrtis, Raymond Nicholas ; et al.	2003-12-18
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants App 20030198742 - Vrtis, Raymond Nicholas ; et al.	2003-10-23
Volatile precursors for deposition of metals and metal-containing films App 20030135061 - Norman, John Anthony Thomas ; et al.	2003-07-17
Preparation of metal imino/amino complexes for metal oxide and metal nitride thin films Grant 6,552,209 - Lei , et al. April 22, 2	2003-04-22
Process for metal metalloid oxides and nitrides with compositional gradients Grant 6,537,613 - Senzaki , et al. March 25, 2	2003-03-25
Liquid precursor mixtures for deposition of multicomponent metal containing materials Grant 6,503,561 - Senzaki , et al. January 7, 2	2003-01-07
Volatile precursors for deposition of metals and metal-containing films App 20020013487 - Norman, John Anthony Thomas ; et al.	2002-01-31
Synthesis of tantalum nitride Grant 6,319,567 - Senzaki , et al. November 20, 2	2001-11-20
Liquid precursor mixtures for deposition of multicomponent metal containing materials Grant 6,238,734 - Senzaki , et al. May 29, 2	2001-05-29

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