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name:-0.001629114151001
name:-0.0015389919281006
NONOMURA; Kazuki Patent Filings

NONOMURA; Kazuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for NONOMURA; Kazuki.The latest application filed is for "method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium".

Company Profile
1.2.5
  • NONOMURA; Kazuki - Toyama-shi JP
  • NONOMURA; Kazuki - Toyama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus And Non-transitory Computer-readable Recording Medium
App 20220093386 - NONOMURA; Kazuki ;   et al.
2022-03-24
Substrate Processing Apparatus, Reaction Container, Method Of Manufacturing Semiconductor Device, And Recording Medium
App 20220002871 - NONOMURA; Kazuki
2022-01-06
Method Of Manufacturing Semiconductor Device, Substrate Processing Apparatus And Non-transitory Computer-readable Recording Medium
App 20220002873 - NONOMURA; Kazuki ;   et al.
2022-01-06
Substrate processing apparatus and precursor gas nozzle
Grant 11,020,760 - Fujino , et al. June 1, 2
2021-06-01
Substrate Retrainer And Substrate Processing Apparatus
App 20180286725 - NONOMURA; Kazuki ;   et al.
2018-10-04
Gas supply nozzle
Grant D828,091 - Fujino , et al. September 11, 2
2018-09-11
Substrate Processing Apparatus And Precursor Gas Nozzle
App 20170232457 - FUJINO; Toshiki ;   et al.
2017-08-17

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