Nomura; Asuka
Patent Applications and Registrations
Patent applications and USPTO patent grants for Nomura; Asuka.The latest application filed is for "method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions".
- Nomura; Asuka - Poughkeepsie NY
| Patent | Date |
|---|---|
| Method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions Grant 7,279,386 - Kelling , et al. October 9, 2 | 2007-10-09 |
| Method of forming isolation trench with spacer formation Grant 7,144,785 - Dakshina-Murthy , et al. December 5, 2 | 2006-12-05 |
| Method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions App 20060121711 - Kelling; Mark C. ; et al. | 2006-06-08 |
| Method of forming isolation trench with spacer formation App 20060094205 - Dakshina-Murthy; Srikanteswara ; et al. | 2006-05-04 |
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