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name:-0.025795936584473
name:-0.022974014282227
name:-0.00069904327392578
Nolscher; Christoph Patent Filings

Nolscher; Christoph

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nolscher; Christoph.The latest application filed is for "method for producing a structure on the surface of a substrate".

Company Profile
0.17.19
  • Nolscher; Christoph - Nurnberg DE
  • Nolscher; Christoph - Dresden DE
  • Nolscher; Christoph - Munchen DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for producing a structure on the surface of a substrate
Grant 8,003,538 - Nolscher , et al. August 23, 2
2011-08-23
Methods of manufacturing semiconductor structures
Grant 7,867,912 - Caspary , et al. January 11, 2
2011-01-11
Masks for lithographic imagings and methods for fabricating the same
Grant 7,491,474 - Nolscher February 17, 2
2009-02-17
Method for exposing a semiconductor wafer by applying periodic movement to a component
Grant 7,443,484 - Nolscher , et al. October 28, 2
2008-10-28
Method For Producing A Structure On The Surface Of A Substrate
App 20080206681 - Nolscher; Christoph ;   et al.
2008-08-28
Method for producing a structure on the surface of a substrate
Grant 7,368,385 - Nolscher , et al. May 6, 2
2008-05-06
Phase shift mask
Grant 7,361,434 - Nolscher April 22, 2
2008-04-22
Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto
Grant 7,297,468 - Nolscher November 20, 2
2007-11-20
Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration
Grant 7,286,207 - Nolscher , et al. October 23, 2
2007-10-23
Method for improving a simulation model of photolithographic projection
Grant 7,207,030 - Kuchler , et al. April 17, 2
2007-04-17
Exposure system and method for operating an exposure system
App 20070075276 - Nolscher; Christoph ;   et al.
2007-04-05
Method for exposing a semiconductor wafer
App 20060256314 - Nolscher; Christoph ;   et al.
2006-11-16
Photolithographic imaging device and apparatus for generating an illumination distribution
App 20060256313 - Renner; Kerstin ;   et al.
2006-11-16
Method for exposing a semiconductor wafer
App 20060244937 - Nolscher; Christoph ;   et al.
2006-11-02
Lithography mask and methods for producing a lithography mask
App 20060210887 - Henkel; Thomas ;   et al.
2006-09-21
Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask
App 20060190850 - Kohle; Roderick ;   et al.
2006-08-24
Photolithographic mask
Grant 7,070,887 - Nolscher July 4, 2
2006-07-04
Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools
Grant 7,011,936 - Nolscher , et al. March 14, 2
2006-03-14
Method of producing a structure on the surface of a substrate
App 20060024621 - Nolscher; Christoph ;   et al.
2006-02-02
Method for the photolithographic projection of a pattern onto a semiconductor wafer with an alternating phase mask
App 20050287446 - Nolscher, Christoph
2005-12-29
Masks for lithographic imagings and methods for fabricating the same
App 20050238966 - Nolscher, Christoph
2005-10-27
Method for transferring a layout of an integrated circuit level to a semiconductor substrate
App 20050196689 - Nolscher, Christoph ;   et al.
2005-09-08
Method for improving a simulation model of photolithographic projection
App 20050114823 - Kuchler, Bernd ;   et al.
2005-05-26
Phase shift mask
App 20050084771 - Nolscher, Christoph
2005-04-21
Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto
App 20040137375 - Nolscher, Christoph
2004-07-15
Method for determining and removing phase conflicts on alternating phase masks
Grant 6,730,463 - Heissmeier , et al. May 4, 2
2004-05-04
Alternating phase mask
Grant 6,680,151 - Heissmeier , et al. January 20, 2
2004-01-20
Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools
App 20030143470 - Nolscher, Christoph ;   et al.
2003-07-31
Photolithographic mask
App 20030022074 - Nolscher, Christoph
2003-01-30
Alternating phase mask
App 20020192574 - Heissmeier, Michael ;   et al.
2002-12-19
Method for determining and removing phase conflicts on alternating phase masks
App 20020155362 - Heissmeier, Michael ;   et al.
2002-10-24
Method for producing an alternating phase mask
App 20020127480 - Mathuni, Josef ;   et al.
2002-09-12
Method for operating a high-temperature fuel cell installation, and a high-temperature fuel cell installation
Grant 6,162,556 - Vollmar , et al. December 19, 2
2000-12-19
Method and system for utilizing enthalpy contained in exhaust gases of low-temperature fuel cells
Grant 6,162,554 - Nolscher , et al. December 19, 2
2000-12-19
PEM fuel cell
Grant 6,010,798 - Hammerschmidt , et al. January 4, 2
2000-01-04
Process for operating a fuel cell installation and fuel cell installation for carrying out the process
Grant 5,976,722 - Muller , et al. November 2, 1
1999-11-02

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