Patent | Date |
---|
Heat storage unit, heat storage system, and heat storage method Grant 11,448,471 - Nomura , et al. September 20, 2 | 2022-09-20 |
Heat Storage Apparatus App 20220259475 - NOBUTOKI; Hideharu ;   et al. | 2022-08-18 |
Heat Storage Unit, Heat Storage System, And Heat Storage Method App 20210108861 - NOMURA; Yasumitsu ;   et al. | 2021-04-15 |
Heat Storage Material, Method Of Producing Same, And Heat Storage Tank App 20200392390 - NOBUTOKI; Hideharu | 2020-12-17 |
Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film Grant 8,846,148 - Kumada , et al. September 30, 2 | 2014-09-30 |
Source material for preparing low dielectric constant material Grant 8,674,046 - Nobutoki , et al. March 18, 2 | 2014-03-18 |
Plasma Cvd Apparatus, Method For Forming Thin Film And Semiconductor Device App 20130160711 - KUMADA; Teruhiko ;   et al. | 2013-06-27 |
Plasma CVD apparatus, method for forming thin film and semiconductor device Grant 8,404,314 - Kumada , et al. March 26, 2 | 2013-03-26 |
Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device Grant 8,288,294 - Kafuku , et al. October 16, 2 | 2012-10-16 |
Insulating Film For Semiconductor Device, Process And Apparatus For Producing Insulating Film For Semiconductor Device, Semiconductor Device, And Process For Producing The Semiconductor Device App 20110266660 - Kafuku; Hidetaka ;   et al. | 2011-11-03 |
Semiconductor device and method of fabricating the same Grant 7,981,790 - Kumada , et al. July 19, 2 | 2011-07-19 |
Composition for low dielectric material, low dielectric material and method for production thereof Grant 7,824,784 - Kumada , et al. November 2, 2 | 2010-11-02 |
Manufacturing Method Of Semiconductor Device, Insulating Film For Semiconductor Device, And Manufacturing Apparatus Of The Same App 20100181654 - Fujiwara; Toshihito ;   et al. | 2010-07-22 |
Plasma Cvd Apparatus, Method For Forming Thin Film And Semiconductor Device App 20100164072 - Kumada; Teruhiko ;   et al. | 2010-07-01 |
Semiconductor Device And Method Of Fabricating The Same App 20100112805 - Kumada; Teruhiko ;   et al. | 2010-05-06 |
Semiconductor device and method of fabricating the same Grant 7,671,473 - Kumada , et al. March 2, 2 | 2010-03-02 |
Source Material For Preparing Low Dielectric Constant Material App 20100004425 - Nobutoki; Hideharu ;   et al. | 2010-01-07 |
Composition for Chemical Vapor Deposition Film-Formation and Method for Production of Low Dielectric Constant Film App 20090232987 - Kumada; Teruhiko ;   et al. | 2009-09-17 |
Composition For Low Dielectric Material, Low Dielectric Material And Method For Production Thereof App 20090090274 - KUMADA; Teruhiko ;   et al. | 2009-04-09 |
Process for Film Production and Semiconductor Device Utilizing Film Produced by the Process App 20080038585 - Kumada; Teruhiko ;   et al. | 2008-02-14 |
Plasma Cvd Device App 20080029027 - Kumada; Teruhiko ;   et al. | 2008-02-07 |
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device Grant 7,192,540 - Tsunoda , et al. March 20, 2 | 2007-03-20 |
Rare earth element permanent magnet material Grant 7,175,718 - Nobutoki , et al. February 13, 2 | 2007-02-13 |
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device App 20060091382 - Tsunoda; Sei ;   et al. | 2006-05-04 |
Via-filling material and process for fabricating semiconductor integrated circuit using the material Grant 7,030,007 - Kumada , et al. April 18, 2 | 2006-04-18 |
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device Grant 7,029,605 - Tsunoda , et al. April 18, 2 | 2006-04-18 |
Composition for low dielectric material, low dielectric material and method for production thereof App 20050282015 - Kumada, Teruhiko ;   et al. | 2005-12-22 |
Process for preparing low dielectric constant material App 20050181628 - Nobutoki, Hideharu ;   et al. | 2005-08-18 |
Low dielectric constant material, insulating film comprising the low dielectric constant material, and semiconductor device Grant 6,924,240 - Nobutoki , et al. August 2, 2 | 2005-08-02 |
Via-filling material and process for fabricating semiconductor integrated circuit using the material App 20050101123 - Kumada, Teruhiko ;   et al. | 2005-05-12 |
Method of calculating magnetic interaction of molecules using localized magnetic orbital Grant 6,704,663 - Nobutoki , et al. March 9, 2 | 2004-03-09 |
Rare earth element permanent magnet material App 20040025975 - Nobutoki, Hideharu ;   et al. | 2004-02-12 |
Method of calculating magnetic interaction of molecules using localized magnetic orbital App 20030204324 - Nobutoki, Hideharu ;   et al. | 2003-10-30 |
Low dielectric constant material, process for preparing the same, insulating film comprising the same and semiconductor device App 20030100175 - Nobutoki, Hideharu ;   et al. | 2003-05-29 |
Semiconductor device App 20020063338 - Mikami, Noboru ;   et al. | 2002-05-30 |
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device App 20020058142 - Tsunoda, Sei ;   et al. | 2002-05-16 |
Low dielectric constant film having thermal resistance, process for forming the same, insulation film between semiconductor layer using the same, and semiconductor device App 20020053653 - Tsunoda, Sei ;   et al. | 2002-05-09 |
Organic nonlinear optical material and nonlinear optical element using the same Grant 6,086,794 - Nobutoki , et al. July 11, 2 | 2000-07-11 |
System for simulating properties of a material having periodically repeated structure Grant 5,694,343 - Nobutoki December 2, 1 | 1997-12-02 |
Field-effect transistor with at least two different semiconductive organic channel compounds Grant 5,500,537 - Tsumura , et al. March 19, 1 | 1996-03-19 |