loadpatents
name:-0.032572031021118
name:-0.018487930297852
name:-0.00073790550231934
Nobutoki; Hideharu Patent Filings

Nobutoki; Hideharu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nobutoki; Hideharu.The latest application filed is for "heat storage apparatus".

Company Profile
0.20.24
  • Nobutoki; Hideharu - Tokyo JP
  • NOBUTOKI; Hideharu - Chiyoda-ku JP
  • Nobutoki; Hideharu - Neyagawa JP
  • Nobutoki; Hideharu - Neyagawa-shi JP
  • Nobutoki, Hideharu - Osaka JP
  • Nobutoki; Hideharu - Amagasaki JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Heat storage unit, heat storage system, and heat storage method
Grant 11,448,471 - Nomura , et al. September 20, 2
2022-09-20
Heat Storage Apparatus
App 20220259475 - NOBUTOKI; Hideharu ;   et al.
2022-08-18
Heat Storage Unit, Heat Storage System, And Heat Storage Method
App 20210108861 - NOMURA; Yasumitsu ;   et al.
2021-04-15
Heat Storage Material, Method Of Producing Same, And Heat Storage Tank
App 20200392390 - NOBUTOKI; Hideharu
2020-12-17
Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film
Grant 8,846,148 - Kumada , et al. September 30, 2
2014-09-30
Source material for preparing low dielectric constant material
Grant 8,674,046 - Nobutoki , et al. March 18, 2
2014-03-18
Plasma Cvd Apparatus, Method For Forming Thin Film And Semiconductor Device
App 20130160711 - KUMADA; Teruhiko ;   et al.
2013-06-27
Plasma CVD apparatus, method for forming thin film and semiconductor device
Grant 8,404,314 - Kumada , et al. March 26, 2
2013-03-26
Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device
Grant 8,288,294 - Kafuku , et al. October 16, 2
2012-10-16
Insulating Film For Semiconductor Device, Process And Apparatus For Producing Insulating Film For Semiconductor Device, Semiconductor Device, And Process For Producing The Semiconductor Device
App 20110266660 - Kafuku; Hidetaka ;   et al.
2011-11-03
Semiconductor device and method of fabricating the same
Grant 7,981,790 - Kumada , et al. July 19, 2
2011-07-19
Composition for low dielectric material, low dielectric material and method for production thereof
Grant 7,824,784 - Kumada , et al. November 2, 2
2010-11-02
Manufacturing Method Of Semiconductor Device, Insulating Film For Semiconductor Device, And Manufacturing Apparatus Of The Same
App 20100181654 - Fujiwara; Toshihito ;   et al.
2010-07-22
Plasma Cvd Apparatus, Method For Forming Thin Film And Semiconductor Device
App 20100164072 - Kumada; Teruhiko ;   et al.
2010-07-01
Semiconductor Device And Method Of Fabricating The Same
App 20100112805 - Kumada; Teruhiko ;   et al.
2010-05-06
Semiconductor device and method of fabricating the same
Grant 7,671,473 - Kumada , et al. March 2, 2
2010-03-02
Source Material For Preparing Low Dielectric Constant Material
App 20100004425 - Nobutoki; Hideharu ;   et al.
2010-01-07
Composition for Chemical Vapor Deposition Film-Formation and Method for Production of Low Dielectric Constant Film
App 20090232987 - Kumada; Teruhiko ;   et al.
2009-09-17
Composition For Low Dielectric Material, Low Dielectric Material And Method For Production Thereof
App 20090090274 - KUMADA; Teruhiko ;   et al.
2009-04-09
Process for Film Production and Semiconductor Device Utilizing Film Produced by the Process
App 20080038585 - Kumada; Teruhiko ;   et al.
2008-02-14
Plasma Cvd Device
App 20080029027 - Kumada; Teruhiko ;   et al.
2008-02-07
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device
Grant 7,192,540 - Tsunoda , et al. March 20, 2
2007-03-20
Rare earth element permanent magnet material
Grant 7,175,718 - Nobutoki , et al. February 13, 2
2007-02-13
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device
App 20060091382 - Tsunoda; Sei ;   et al.
2006-05-04
Via-filling material and process for fabricating semiconductor integrated circuit using the material
Grant 7,030,007 - Kumada , et al. April 18, 2
2006-04-18
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device
Grant 7,029,605 - Tsunoda , et al. April 18, 2
2006-04-18
Composition for low dielectric material, low dielectric material and method for production thereof
App 20050282015 - Kumada, Teruhiko ;   et al.
2005-12-22
Process for preparing low dielectric constant material
App 20050181628 - Nobutoki, Hideharu ;   et al.
2005-08-18
Low dielectric constant material, insulating film comprising the low dielectric constant material, and semiconductor device
Grant 6,924,240 - Nobutoki , et al. August 2, 2
2005-08-02
Via-filling material and process for fabricating semiconductor integrated circuit using the material
App 20050101123 - Kumada, Teruhiko ;   et al.
2005-05-12
Method of calculating magnetic interaction of molecules using localized magnetic orbital
Grant 6,704,663 - Nobutoki , et al. March 9, 2
2004-03-09
Rare earth element permanent magnet material
App 20040025975 - Nobutoki, Hideharu ;   et al.
2004-02-12
Method of calculating magnetic interaction of molecules using localized magnetic orbital
App 20030204324 - Nobutoki, Hideharu ;   et al.
2003-10-30
Low dielectric constant material, process for preparing the same, insulating film comprising the same and semiconductor device
App 20030100175 - Nobutoki, Hideharu ;   et al.
2003-05-29
Semiconductor device
App 20020063338 - Mikami, Noboru ;   et al.
2002-05-30
Low dielectric constant material having thermal resistance, insulation film between semiconductor layers using the same, and semiconductor device
App 20020058142 - Tsunoda, Sei ;   et al.
2002-05-16
Low dielectric constant film having thermal resistance, process for forming the same, insulation film between semiconductor layer using the same, and semiconductor device
App 20020053653 - Tsunoda, Sei ;   et al.
2002-05-09
Organic nonlinear optical material and nonlinear optical element using the same
Grant 6,086,794 - Nobutoki , et al. July 11, 2
2000-07-11
System for simulating properties of a material having periodically repeated structure
Grant 5,694,343 - Nobutoki December 2, 1
1997-12-02
Field-effect transistor with at least two different semiconductive organic channel compounds
Grant 5,500,537 - Tsumura , et al. March 19, 1
1996-03-19

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