Nobe; Shigeru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nobe; Shigeru.The latest application filed is for "polishing slurry for cmp and polishing method".

Company Profile

0.20.23

Nobe; Shigeru - Hitachi JP
Nobe; Shigeru - Hitachi-shi JP
Nobe; Shigeru - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polishing agent and method for polishing substrate using the polishing agent Grant 10,040,971 - Hoshi , et al. August 7, 2	2018-08-07
Polishing Slurry For Cmp And Polishing Method App 20170267895 - Shinoda; Takashi ; et al.	2017-09-21
Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device Grant 9,633,848 - Aoki , et al. April 25, 2	2017-04-25
Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component Grant 9,395,626 - Tanimoto , et al. July 19, 2	2016-07-19
Polishing Agent And Method For Polishing Substrate Using The Polishing Agent App 20150361303 - HOSHI; Yousuke ; et al.	2015-12-17
Photosensitive Resin Composition, Method For Producing Patterned Cured Film, Semiconductor Element And Electronic Device App 20150325431 - AOKI; Yu ; et al.	2015-11-12
Polishing Slurry For Cmp And Polishing Method App 20150315419 - Shinoda; Takashi ; et al.	2015-11-05
Polishing agent and method for polishing substrate using the polishing agent Grant 9,165,777 - Hoshi , et al. October 20, 2	2015-10-20
Polishing solution for CMP and polishing method using the polishing solution Grant 9,022,834 - Satou , et al. May 5, 2	2015-05-05
Polishing slurry for metal films and polishing method Grant 8,901,002 - Tanaka , et al. December 2, 2	2014-12-02
Photosensitive Resin Composition, Method For Manufacturing Patterned Cured Film, And Electronic Component App 20140322635 - Tanimoto; Akitoshi ; et al.	2014-10-30
Positive photosensitive resin composition, method of creating resist pattern, and electronic component Grant 8,836,089 - Tanimoto , et al. September 16, 2	2014-09-16
Metal polishing slurry and polishing method Grant 8,821,750 - Amanokura , et al. September 2, 2	2014-09-02
Polishing Slurry For Metal Films And Polishing Method App 20140065826 - Tanaka; Takaaki ; et al.	2014-03-06
Polishing Slurry For Cmp And Polishing Method App 20140065825 - Shinoda; Takashi ; et al.	2014-03-06
Polishing agent and method for polishing substrate using the polishing agent Grant 8,617,275 - Hoshi , et al. December 31, 2	2013-12-31
Polishing slurry for metal films and polishing method Grant 8,609,541 - Tanaka , et al. December 17, 2	2013-12-17
Polishing solution for CMP and polishing method using the polishing solution Grant 8,592,317 - Satou , et al. November 26, 2	2013-11-26
Polishing Agent And Method For Polishing Substrate Using The Polishing Agent App 20130252426 - HOSHI; Yousuke ; et al.	2013-09-26
Positive Photosensitive Resin Composition, Method Of Creating Resist Pattern, And Electronic Component App 20130168859 - Tanimoto; Akitoshi ; et al.	2013-07-04
Polishing Solution For Cmp And Polishing Method Using The Polishing Solution App 20110275285 - Satou; Eiichi ; et al.	2011-11-10
Polishing Solution For Cmp And Polishing Method Using The Polishing Solution App 20110275217 - Satou; Eiichi ; et al.	2011-11-10
Polishing Agent And Method For Polishing Substrate Using The Polshing Agent App 20110039475 - Hoshi; Yousuke ; et al.	2011-02-17
Polishing Slurry For Metal Films And Polishing Method App 20110009033 - Tanaka; Takaaki ; et al.	2011-01-13
Metal Polishing Slurry And Polishing Method App 20100120250 - Amanokura; Jin ; et al.	2010-05-13
Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts Grant 7,687,590 - Sakurai , et al. March 30, 2	2010-03-30
Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts Grant 7,682,701 - Sakurai , et al. March 23, 2	2010-03-23
Polishing Slurry For Cmp App 20090283715 - Nobe; Shigeru ; et al.	2009-11-19
CMP Polishing Liquid and Polishing Method App 20090094901 - Shinoda; Takashi ; et al.	2009-04-16
Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts Grant 7,358,300 - Sakurai , et al. April 15, 2	2008-04-15
Polishing slurry for CMP and polishing method App 20070117394 - Shinoda; Takashi ; et al.	2007-05-24
Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity film App 20060199021 - Narita; Takenori ; et al.	2006-09-07
Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts App 20060052566 - Sakurai; Haruaki ; et al.	2006-03-09
Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts App 20050255326 - Sakurai, Haruaki ; et al.	2005-11-17
Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts App 20050119394 - Sakurai, Haruaki ; et al.	2005-06-02
Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity film App 20040253462 - Narita, Takenori ; et al.	2004-12-16

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.