loadpatents
name:-0.0098118782043457
name:-0.017030000686646
name:-0.00042104721069336
Niuya; Takayuki Patent Filings

Niuya; Takayuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Niuya; Takayuki.The latest application filed is for "substrate processing method and substrate processing apparatus".

Company Profile
0.16.6
  • Niuya; Takayuki - Tokyo-To JP
  • Niuya; Takayuki - Plano TX
  • Niuya; Takayuki - Ibaraki JP
  • Niuya; Takayuki - Tsukuba JP
  • Niuya; Takayuki - Ibaraki-ken JP
  • Niuya; Takayuki - Tsukubashi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate processing method and substrate processing apparatus
App 20060163205 - Niuya; Takayuki ;   et al.
2006-07-27
Substrate processing method and substrate processing apparatus
Grant 6,979,655 - Niuya , et al. December 27, 2
2005-12-27
Method for forming a memory integrated circuit with bitlines over gates and capacitors over bitlines
Grant 6,946,701 - Niuya September 20, 2
2005-09-20
Cleaning agent and cleaning method
Grant 6,875,288 - Gotoh , et al. April 5, 2
2005-04-05
Method of manufacturing semiconductor device and manufacturing apparatus
Grant 6,838,370 - Niuya , et al. January 4, 2
2005-01-04
Selective oxidation for semiconductor device fabrication
Grant 6,835,672 - Park , et al. December 28, 2
2004-12-28
Method for forming a memory integrated circuit
App 20040021228 - Niuya, Takayuki
2004-02-05
Method for forming a memory integrated circuit
Grant 6,617,211 - Niuya September 9, 2
2003-09-09
Method of forming a plated layer to a predetermined thickness
Grant 6,607,650 - Niuya , et al. August 19, 2
2003-08-19
Substrate processing method and substrate processing apparatus
App 20030119318 - Niuya, Takayuki ;   et al.
2003-06-26
Cleaning method using an oxidizing agent, chelating agent and fluorine compound
Grant 6,514,352 - Gotoh , et al. February 4, 2
2003-02-04
Cleaning method
App 20020066465 - Gotoh, Hideto ;   et al.
2002-06-06
Cleaning agent and cleaning method
App 20020064963 - Gotoh, Hideto ;   et al.
2002-05-30
Simple stack cell capacitor formation
App 20020001902 - Ukita, Shigenari ;   et al.
2002-01-03
Silicon nitride dopant diffusion barrier in integrated circuits
Grant 6,277,720 - Doshi , et al. August 21, 2
2001-08-21
Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same
Grant 6,265,309 - Gotoh , et al. July 24, 2
2001-07-24
Birdsbeak encroachment using combination of wet and dry etch for isolation nitride
Grant 6,066,545 - Doshi , et al. May 23, 2
2000-05-23
Silicon nitride sidewall and top surface layer separating conductors
Grant 5,914,279 - Yang , et al. June 22, 1
1999-06-22
Method of forming a trench-type semiconductor memory device
Grant 5,804,478 - Nagata , et al. September 8, 1
1998-09-08
Semiconductor device
Grant 5,675,533 - Niuya , et al. October 7, 1
1997-10-07
Method of manufacturing a semiconductor device
Grant 5,470,778 - Nagata , et al. November 28, 1
1995-11-28
Method of fabricating random access memory device having sidewall insulating layer on the laminate structure
Grant 5,470,777 - Nagata , et al. November 28, 1
1995-11-28

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