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name:-0.0061531066894531
name:-0.0074291229248047
Nittala; Krishna Patent Filings

Nittala; Krishna

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nittala; Krishna.The latest application filed is for "controlling concentration profiles for deposited films using machine learning".

Company Profile
6.5.15
  • Nittala; Krishna - Sunnyvale CA
  • Nittala; Krishna - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Film formation via pulsed RF plasma
Grant 11,443,919 - Nittala , et al. September 13, 2
2022-09-13
Controlling Concentration Profiles For Deposited Films Using Machine Learning
App 20220285232 - Baryshnikov; Anton V. ;   et al.
2022-09-08
Hardmasks and processes for forming hardmasks by plasma-enhanced chemical vapor deposition
Grant 11,421,324 - Hsu , et al. August 23, 2
2022-08-23
Methods, Systems, And Apparatus For Processing Substrates Using One Or More Amorphous Carbon Hardmask Layers
App 20220262643 - NITTALA; Krishna ;   et al.
2022-08-18
Hardmasks And Processes For Forming Hardmasks By Plasma Enhanced Chemical Vapor Deposition
App 20220119953 - HSU; Jui-Yuan ;   et al.
2022-04-21
Boron Concentration Tunability In Boron-silicon Films
App 20220108892 - Yang; Yi ;   et al.
2022-04-07
Method Of Using Dual Frequency Rf Power In A Process Chamber
App 20220102141 - SINGH; Anup Kumar ;   et al.
2022-03-31
Doping Semiconductor Films
App 20220093390 - Aydin; Aykut ;   et al.
2022-03-24
Integration Processes Utilizing Boron-doped Silicon Materials
App 20220020599 - Koshizawa; Takehito ;   et al.
2022-01-20
Hydrogen Management In Plasma Deposited Films
App 20220020583 - Cheng; Rui ;   et al.
2022-01-20
Polysilicon liners
Grant 11,170,990 - Nittala , et al. November 9, 2
2021-11-09
Methods To Reduce Material Surface Roughness
App 20210140045 - Yang; Yi ;   et al.
2021-05-13
Amorphous Silicon-based Films Resistant To Crystallization
App 20210130174 - Aydin; Aykut ;   et al.
2021-05-06
Polysilicon Liners
App 20200266052 - NITTALA; Krishna ;   et al.
2020-08-20
Film Formation Via Pulsed Rf Plasma
App 20200258720 - A1
2020-08-13
Enhanced Lift Pin Design To Eliminate Local Thickness Non-uniformity In Teos Oxide Films
App 20200058538 - GHOSH; Kalyanjit ;   et al.
2020-02-20
Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
Grant 10,490,436 - Ghosh , et al. Nov
2019-11-26
Enhanced Lift Pin Design To Eliminate Local Thickness Non-uniformity In Teos Oxide Films
App 20170125280 - GHOSH; Kalyanjit ;   et al.
2017-05-04
Low-K oxide deposition by hydrolysis and condensation
Grant 9,245,739 - Ndiege , et al. January 26, 2
2016-01-26
Low-k Oxide Deposition By Hydrolysis And Condensation
App 20150004806 - Ndiege; Nicholas Muga ;   et al.
2015-01-01

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