Nitta; Kazuyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nitta; Kazuyuki.The latest application filed is for "resist composition and resist pattern forming method".

Company Profile

0.24.25

Nitta; Kazuyuki - Kawasaki N/A JP
Nitta; Kazuyuki - Kawasaki-shi JP
Nitta; Kazuyuki - 150 Nakamaruko JP
Nitta; Kazuyuki - Ebina-shi JP
Nitta; Kazuyuki - Ebina JP
Nitta; Kazuyuki - Kanagawa JP
Nitta; Kazuyuki - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resist composition and resist pattern forming method Grant 8,399,173 - Fujita , et al. March 19, 2	2013-03-19
Resist Composition And Resist Pattern Forming Method App 20090258313 - Fujita; Shoichi ; et al.	2009-10-15
Resist developer and resist pattern formation method using same Grant 7,407,739 - Nitta August 5, 2	2008-08-05
Positive resist composition and method of forming resist pattern Grant 7,402,372 - Hagihara , et al. July 22, 2	2008-07-22
Chemically amplified positive photo resist composition and method for forming resist pattern Grant 7,358,028 - Maruyama , et al. April 15, 2	2008-04-15
Chemical amplified positive photo resist composition and method for forming resist pattern Grant 7,329,478 - Nakagawa , et al. February 12, 2	2008-02-12
Positive resist composition and compound used therein Grant 7,232,643 - Nitta June 19, 2	2007-06-19
Positive-working photoresist composition and photosensitive material using same App 20070122744 - Maemori; Satoshi ; et al.	2007-05-31
Chemical Amplification Type Positive Photoresist Composition And Resist Pattern Forming Method App 20070117045 - Maruyama; Kenji ; et al.	2007-05-24
Positive resist composition and method of forming resist pattern using same Grant 7,192,687 - Nitta , et al. March 20, 2	2007-03-20
Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device Grant 7,150,956 - Nitta , et al. December 19, 2	2006-12-19
Method for decreasing surface defects of patterned resist layer Grant 7,094,924 - Nitta , et al. August 22, 2	2006-08-22
Resist developer and resist pattern formation method using same App 20060029885 - Nitta; Kazuyuki	2006-02-09
Chemical amplified positive photo resist composition and method for forming resist pattern App 20060003260 - Nakagawa; Yusuke ; et al.	2006-01-05
Positive resist composition and compound used therein App 20050266340 - Nitta, Kazuyuki	2005-12-01
Chemically amplified positive photo resist composition and method for forming resist pattern App 20050244740 - Maruyama, Kenji ; et al.	2005-11-03
Chemical-amplification positive-working photoresist composition App 20050170276 - Nitta, Kazuyuki ; et al.	2005-08-04
Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device Grant 6,921,621 - Nitta , et al. July 26, 2	2005-07-26
Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device App 20050112498 - Nitta, Kazuyuki ; et al.	2005-05-26
Positive resist composition and method of forming resist pattern using same App 20050079445 - Nitta, Kazuyuki ; et al.	2005-04-14
Positive resist composition and method of forming resist pattern App 20050042540 - Okubo, Waki ; et al.	2005-02-24
Positive resist composition and method of forming resist pattern App 20050042541 - Hagihara, Mitsuo ; et al.	2005-02-24
Method for forming fine resist pattern App 20050037291 - Nitta, Kazuyuki ; et al.	2005-02-17
Method for the preparation of a semiconductor device Grant 6,818,380 - Maemori , et al. November 16, 2	2004-11-16
Positive-working photoresist composition and resist patterning method using same Grant 6,787,290 - Nitta , et al. September 7, 2	2004-09-07
Method for the preparation of a semiconductor device Grant 6,777,158 - Maemori , et al. August 17, 2	2004-08-17
Positive-working photoresist composition App 20040072103 - Sato, Kazufumi ; et al.	2004-04-15
Method for the preparation of a semiconductor device App 20040067615 - Maemori, Satoshi ; et al.	2004-04-08
Positive-working photoresist composition Grant 6,677,103 - Sato , et al. January 13, 2	2004-01-13
Resist developer and resist pattern formation method using same App 20030203316 - Nitta, Kazuyuki	2003-10-30
Photosensitive laminate, process for forming resist pattern using same and positive resist composition Grant 6,638,684 - Okubo , et al. October 28, 2	2003-10-28
Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device App 20030190550 - Nitta, Kazuyuki ; et al.	2003-10-09
Positive resist composition Grant RE38,254 - Sato , et al. September 16, 2	2003-09-16
Method for decreasing surface defects of patterned resist layer Grant 6,605,417 - Nitta , et al. August 12, 2	2003-08-12
Method for decreasing surface defects of patterned resist layer App 20030138736 - Nitta, Kazuyuki ; et al.	2003-07-24
Positive-working photoresist composition Grant 6,444,394 - Sato , et al. September 3, 2	2002-09-03
Positive-working photoresist composition App 20020110750 - Sato, Kazufumi ; et al.	2002-08-15
Method for forming a hole-patterned photoresist layer App 20020106580 - Nitta, Kazuyuki ; et al.	2002-08-08
Positive-working photoresist composition and photosensitive material using same App 20020058202 - Maemori, Satoshi ; et al.	2002-05-16
Positive-working photoresist composition and resist patterning method using same App 20020045130 - Nitta, Kazuyuki ; et al.	2002-04-18
Method for the preparation of a semiconductor device App 20020045133 - Maemori, Satoshi ; et al.	2002-04-18
Photosensitive laminate, process for forming resist pattern using same and positive resist compostion App 20020045123 - Okubo, Waki ; et al.	2002-04-18
Method for decreasing surface defects of patterned resist layer App 20010014431 - Nitta, Kazuyuki ; et al.	2001-08-16
Chemical-sensitization photoresist composition Grant 5,945,517 - Nitta , et al. August 31, 1	1999-08-31
Chemical-sensitization positive-working photoresist composition Grant 5,856,058 - Sato , et al. January 5, 1	1999-01-05
Positive-working photoresist composition and multilayered resist material using the same Grant 5,817,444 - Sato , et al. October 6, 1	1998-10-06
Positive-working photoresist composition Grant 5,770,343 - Sato , et al. June 23, 1	1998-06-23
Positive photoresist compositions and multilayer resist materials using the same Grant 5,728,504 - Hosoda , et al. March 17, 1	1998-03-17

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