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Patent applications and USPTO patent grants for Nistler; John L..The latest application filed is for "phase-shift photomask for patterning high density features".
Patent | Date |
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Phase-shift photomask for patterning high density features Grant 6,780,568 - Nistler , et al. August 24, 2 | 2004-08-24 |
Phase-shift photomask for patterning high density features Grant 6,410,191 - Nistler , et al. June 25, 2 | 2002-06-25 |
Multipurpose defect test structure with switchable voltage contrast capability and method of use Grant 6,297,644 - Jarvis , et al. October 2, 2 | 2001-10-02 |
Modifying a design layer of an integrated circuit using overlying and underlying design layers Grant 6,226,781 - Nistler , et al. May 1, 2 | 2001-05-01 |
Fabrication of a non-ldd graded p-channel mosfet Grant 6,096,616 - Nistler , et al. August 1, 2 | 2000-08-01 |
Silicon implantation into selective areas of a refractory metal to reduce consumption of silicon-based junctions during salicide formation Grant 6,072,222 - Nistler June 6, 2 | 2000-06-06 |
Voting technique for the manufacture of defect-free printing phase shift lithography Grant 5,308,722 - Nistler May 3, 1 | 1994-05-03 |
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