Nishizawa, Hisao
Patent Applications and Registrations
Patent applications and USPTO patent grants for Nishizawa, Hisao.The latest application filed is for "substrate holding apparatus".
- Nishizawa, Hisao - Kyoto JP
- Nishizawa; Hisao - Shiga JP
- Nishizawa; Hisao - Hikone JP
- Nishizawa; Hisao - Inugami JP
| Patent | Date |
|---|---|
| Substrate holding apparatus App 20030178379 - Hasegawa, Koji ; et al. | 2003-09-25 |
| Method of and an apparatus for processing a substrate Grant 5,888,344 - Ogami , et al. March 30, 1 | 1999-03-30 |
| Substrate holder Grant 5,704,493 - Fujikawa , et al. January 6, 1 | 1998-01-06 |
| Wafer cleaning method and apparatus therefore Grant 5,288,333 - Tanaka , et al. February 22, 1 | 1994-02-22 |
| Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system Grant 5,275,184 - Nishizawa , et al. January 4, 1 | 1994-01-04 |
| Wafer cleaning method and apparatus therefor Grant 5,158,100 - Tanaka , et al. October 27, 1 | 1992-10-27 |
| Method and apparatus for surface treating of substrates Grant 4,871,417 - Nishizawa , et al. October 3, 1 | 1989-10-03 |
| Apparatus for washing opposite surfaces of a substrate Grant 4,811,443 - Nishizawa March 14, 1 | 1989-03-14 |
| Method of surface treatment Grant 4,569,717 - Ohgami , et al. February 11, 1 | 1986-02-11 |
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