| Patent | Date |
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Chemical-resistant Protective Film Forming Composition Containing Hydroxyaryl-terminated Polymer
App 20220204686 - OTAGIRI; Shigetaka ; et al. | 2022-06-30 |
Chemical Solution-resistant Protective Film Forming Composition Containing Polymerization Product Having Diol Structure At Terminal Thereof
App 20220145119 - ENDO; Takafumi ; et al. | 2022-05-12 |
Protective Film-forming Composition Having Acetal Structure And Amide Structure
App 20220026806 - NISHITA; Tokio ; et al. | 2022-01-27 |
Chemical-resistant Protective Film-forming Composition Containing Polymerization Product Of Arylene Compound Having Glycidyl Group
App 20210403635 - ENDO; Takafumi ; et al. | 2021-12-30 |
Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure
Grant 11,194,251 - Karasawa , et al. December 7, 2 | 2021-12-07 |
Composition for forming release layer, and release layer
Grant 11,130,855 - Shindo , et al. September 28, 2 | 2021-09-28 |
Composition For Forming Coating Film And Method For Manufacturing Semiconductor Device
App 20210151318 - NISHITA; Tokio ; et al. | 2021-05-20 |
Aqueous solution for resist pattern coating and pattern forming methods using the same
Grant 11,009,795 - Nishita , et al. May 18, 2 | 2021-05-18 |
Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
Grant 10,795,261 - Nishita , et al. October 6, 2 | 2020-10-06 |
Composition For Forming Release Layer, And Release Layer
App 20200239679 - SHINDO; Kazuya ; et al. | 2020-07-30 |
Resist Underlayer Film-forming Composition Comprising Polymer Having Structural Unit Having Urea Linkage
App 20200124965 - NISHITA; Tokio ; et al. | 2020-04-23 |
Coating solution for resist pattern coating and method for forming pattern
Grant 10,613,435 - Nishita , et al. | 2020-04-07 |
Additive For Resist Underlayer Film-forming Composition And Resist Underlayer Film-forming Composition Containing The Same
App 20190317405 - NISHITA; Tokio ; et al. | 2019-10-17 |
Aqueous Solution For Resist Pattern Coating And Pattern Forming Method Using The Same
App 20190243251 - NISHITA; Tokio ; et al. | 2019-08-08 |
Aqueous Solution For Resist Pattern Coating And Pattern Forming Methods Using The Same
App 20190243249 - NISHITA; Tokio ; et al. | 2019-08-08 |
Resist Underlayer Film-forming Composition
App 20190227438 - NISHITA; Tokio ; et al. | 2019-07-25 |
Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure
Grant 10,295,907 - Karasawa , et al. | 2019-05-21 |
Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group
Grant 10,242,871 - Nishita , et al. | 2019-03-26 |
Coating liquid for resist pattern coating
Grant 10,133,178 - Nishita , et al. November 20, 2 | 2018-11-20 |
Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound
Grant 10,113,083 - Ohnishi , et al. October 30, 2 | 2018-10-30 |
Coating Solution For Resist Pattern Coating And Method For Forming Pattern
App 20180107111 - NISHITA; Tokio ; et al. | 2018-04-19 |
Resist underlayer film-forming composition and method for forming resist pattern using the same
Grant 9,910,354 - Sakaida , et al. March 6, 2 | 2018-03-06 |
Coating Liquid For Resist Pattern Coating
App 20170293227 - NISHITA; Tokio ; et al. | 2017-10-12 |
Resist Underlayer Film-forming Composition
App 20170250079 - NISHITA; Tokio ; et al. | 2017-08-31 |
Resist Underlayer Film-forming Composition For Lithography Containing Polymer Having Acrylamide Structure And Acrylic Acid Ester Structure
App 20170045819 - KARASAWA; Ryo ; et al. | 2017-02-16 |
Resist Underlayer Film-forming Composition For Lithography Containing Polymer Having Blocked Isocyanate Structure
App 20170045818 - KARASAWA; Ryo ; et al. | 2017-02-16 |
Resist Underlayer Film-forming Composition And Method For Forming Resist Pattern Using The Same
App 20170045820 - SAKAIDA; Yasushi ; et al. | 2017-02-16 |
Resist underlayer film formation composition and method for forming resist pattern using the same
Grant 9,448,480 - Nishita , et al. September 20, 2 | 2016-09-20 |
Resist Underlayer Film Formation Composition And Method For Forming Resist Pattern Using The Same
App 20160238936 - NISHITA; Tokio ; et al. | 2016-08-18 |
Composition for forming antistatic film and oligomer compound
Grant 9,394,231 - Nishita , et al. July 19, 2 | 2016-07-19 |
Resist Underlayer Film-forming Composition Containing Polymer Which Contains Nitrogen-containing Ring Compound
App 20160186006 - OHNISHI; Ryuji ; et al. | 2016-06-30 |
Composition For Forming Antistatic Film And Oligomer Compound
App 20150008372 - Nishita; Tokio ; et al. | 2015-01-08 |
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