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Substrate Placing Table And Substrate Processing Apparatus
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Substrate placing table and substrate processing apparatus
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Substrate Placing Table And Substrate Processing Apparatus
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Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,569,186 - Kohno , et al. October 29, 2 | 2013-10-29 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
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Plasma cleaning method and plasma CVD method
Grant 8,366,953 - Kohno , et al. February 5, 2 | 2013-02-05 |
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,329,596 - Kohno , et al. December 11, 2 | 2012-12-11 |
Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus
Grant 8,318,614 - Kohno , et al. November 27, 2 | 2012-11-27 |
MOS semiconductor memory device having charge storage region formed from stack of insulating films
Grant 8,258,571 - Endoh , et al. September 4, 2 | 2012-09-04 |
Semiconductor Device Manufacturing Method
App 20120184107 - Sato; Yoshihiro ; et al. | 2012-07-19 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20120178268 - KOHNO; Masayuki ; et al. | 2012-07-12 |
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,138,103 - Kohno , et al. March 20, 2 | 2012-03-20 |
Forming a silicon nitride film by plasma CVD
Grant 8,119,545 - Honda , et al. February 21, 2 | 2012-02-21 |
Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus
Grant 8,114,790 - Kohno , et al. February 14, 2 | 2012-02-14 |
Silicon Oxynitride Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110189862 - Honda; Minoru ; et al. | 2011-08-04 |
Process For Producing Silicon Nitride Film, Process For Producing Silicon Nitride Film Laminate, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110086517 - Honda; Minoru ; et al. | 2011-04-14 |
Method of forming gate insulation film, semiconductor device, and computer recording medium
Grant 7,915,177 - Nishita , et al. March 29, 2 | 2011-03-29 |
Mos Semiconductor Memory Device
App 20100283097 - Endoh; Tetsuo ; et al. | 2010-11-11 |
Silicon Nitride Film And Nonvolatile Semiconductor Memory Device
App 20100140683 - Miyazaki; Seiichi ; et al. | 2010-06-10 |
Method Of Forming Gate Insulation Film, Semiconductor Device, And Computer Recording Medium
App 20100130023 - Nishita; Tatsuo ; et al. | 2010-05-27 |
Method of forming gate insulating film, semiconductor device and computer recording medium
Grant 7,674,722 - Nishita , et al. March 9, 2 | 2010-03-09 |
Method For Forming Silicon Nitride Film, Method For Manufacturing Nonvolatile Semiconductor Memory Device, Nonvolatile Semiconductor Memory Device And Plasma Apparatus
App 20100052040 - Kohno; Masayuki ; et al. | 2010-03-04 |
Plasma Cleaning Method And Plasma Cvd Method
App 20090308840 - Kohno; Masayuki ; et al. | 2009-12-17 |
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device
App 20090239364 - Nishita; Tatsuo ; et al. | 2009-09-24 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film, Method For Manufacturing Semiconductor Device And Plasma Cvd Method
App 20090203228 - Kohno; Masayuki ; et al. | 2009-08-13 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20090197376 - Kohno; Masayuki ; et al. | 2009-08-06 |
Plasma Treatment Apparatus And Plasma Treatment Method
App 20090029564 - Yamashita; Jun ; et al. | 2009-01-29 |
Method of Forming Gate Insulating Film, Semiconductor Device and Computer Recording Medium
App 20070290247 - Nishita; Tatsuo ; et al. | 2007-12-20 |
Method of oxidizing member to be treated
Grant 7,304,002 - Nishita , et al. December 4, 2 | 2007-12-04 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method
Grant 7,156,923 - Kato , et al. January 2, 2 | 2007-01-02 |
Method of oxidizing member to be treated
App 20060094248 - Nishita; Tatsuo ; et al. | 2006-05-04 |
Plasma processing apparatus and plasma processing method
App 20050205013 - Nakanishi, Toshio ; et al. | 2005-09-22 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method
App 20050081789 - Kato, Hitoshi ; et al. | 2005-04-21 |
Precleaning method of precleaning a silicon nitride film forming system
Grant 6,844,273 - Kato , et al. January 18, 2 | 2005-01-18 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method
App 20020106909 - Kato, Hitoshi ; et al. | 2002-08-08 |
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