Nishino; Masaru
Patent Applications and Registrations
Patent applications and USPTO patent grants for Nishino; Masaru.The latest application filed is for "pattern enhancement using a gas cluster ion beam".
- Nishino; Masaru - Miyagi JP
- Nishino; Masaru - Hillsboro OR
- NISHINO; Masaru - Kurokawa-gun JP
- Nishino; Masaru - Beverly MA
- Nishino; Masaru - Nirasaki N/A JP
- Nishino; Masaru - Halfmoon NY
- Nishino; Masaru - Tokyo JP
- NISHINO; Masaru - Nirasaki City JP
- Nishino; Masaru - Cambridge MA
- Nishino; Masaru - Yamanashi JP
| Patent | Date |
|---|---|
| Pattern enhancement using a gas cluster ion beam Grant 11,450,506 - Dobashi , et al. September 20, 2 | 2022-09-20 |
| Pattern Enhancement Using a Gas Cluster Ion Beam App 20220277924 - Dobashi; Kazuya ; et al. | 2022-09-01 |
| Pattern Enhancement Using a Gas Cluster Ion Beam App 20210335568 - Dobashi; Kazuya ; et al. | 2021-10-28 |
| Plasma Processing Method App 20170221684 - NISHINO; Masaru ; et al. | 2017-08-03 |
| Plasma processing method and plasma processing apparatus Grant 9,653,317 - Nishino , et al. May 16, 2 | 2017-05-16 |
| Method for purging a substrate container Grant 9,305,817 - Kaise , et al. April 5, 2 | 2016-04-05 |
| Plasma Processing Method And Plasma Processing Apparatus App 20150118859 - NISHINO; Masaru ; et al. | 2015-04-30 |
| Etching apparatus Grant 8,986,493 - Tahara , et al. March 24, 2 | 2015-03-24 |
| Plasma processing apparatus and method Grant 8,896,210 - Nishino , et al. November 25, 2 | 2014-11-25 |
| Substrate processing apparatus and substrate processing method Grant 8,790,489 - Honda , et al. July 29, 2 | 2014-07-29 |
| Method For Purging A Substrate Container App 20130213442 - KAISE; Seiichi ; et al. | 2013-08-22 |
| Plasma Processing Apparatus And Method App 20130162142 - NISHINO; Masaru ; et al. | 2013-06-27 |
| Etching Apparatus App 20130118688 - TAHARA; Shigeru ; et al. | 2013-05-16 |
| Etching apparatus Grant 8,361,275 - Tahara , et al. January 29, 2 | 2013-01-29 |
| Method of pattern etching a dielectric film while removing a mask layer Grant 8,252,192 - Lee , et al. August 28, 2 | 2012-08-28 |
| Etching Apparatus App 20120160416 - Tahara; Shigeru ; et al. | 2012-06-28 |
| Optical communication device, optical communication system, optical output control method and program Grant 8,190,023 - Nishino May 29, 2 | 2012-05-29 |
| Substrate Processing Apparatus And Substrate Processing Method App 20120000886 - HONDA; Masanobu ; et al. | 2012-01-05 |
| Method for etching a silicon-containing ARC layer to reduce roughness and CD Grant 7,998,872 - Luong , et al. August 16, 2 | 2011-08-16 |
| Method of pattern etching a dielectric film while removing a mask layer App 20100243604 - LEE; Yao-Sheng ; et al. | 2010-09-30 |
| Process for etching anti-reflective coating to improve roughness, selectivity and CD shrink App 20100216310 - METZ; Andrew W. ; et al. | 2010-08-26 |
| Etching Method And Apparatus App 20100116786 - Tahara; Shigeru ; et al. | 2010-05-13 |
| Etching Method And Apparatus App 20100116787 - Tahara; Shigeru ; et al. | 2010-05-13 |
| Etching method and apparatus Grant 7,674,393 - Tahara , et al. March 9, 2 | 2010-03-09 |
| Optical Communication Device, Optical Communication System, Optical Output Control Method And Program App 20100028004 - NISHINO; Masaru | 2010-02-04 |
| Low damage method for ashing a substrate using CO.sub.2/CO-based process Grant 7,637,269 - Zin , et al. December 29, 2 | 2009-12-29 |
| Oxygen-containing Plasma Flash Process For Reduced Micro-loading Effect And Cd Bias App 20090246713 - Zin; Kelvin ; et al. | 2009-10-01 |
| Method For Etching A Silicon-containing Arc Layer To Reduce Roughness And Cd App 20090197420 - Luong; Vinh Hoang ; et al. | 2009-08-06 |
| Damage-free ashing process and system for post low-k etch Grant 7,279,427 - Nishino , et al. October 9, 2 | 2007-10-09 |
| Plasma Etching Method App 20070111529 - NISHINO; Masaru | 2007-05-17 |
| Damage-free ashing process and system for post low-k etch App 20070032087 - Nishino; Masaru ; et al. | 2007-02-08 |
| Etching method and apparatus App 20060213864 - Tahara; Shigeru ; et al. | 2006-09-28 |
| Dry developing method Grant 6,986,851 - Kitamura , et al. January 17, 2 | 2006-01-17 |
| Level-flattening circuit for WDM optical signals Grant 6,594,046 - Nishino July 15, 2 | 2003-07-15 |
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