NISHIMURA; Yukio

Patent Applications and Registrations

Patent applications and USPTO patent grants for NISHIMURA; Yukio.The latest application filed is for "fluorine-containing polymer, purification method, and radiation-sensitive resin composition".

Company Profile

7.63.60

NISHIMURA; Yukio - Tokyo JP
Nishimura; Yukio - Okazaki JP
NISHIMURA; Yukio - Okazaki-shi JP
Nishimura; Yukio - Kahoku N/A JP
Nishimura; Yukio - Yokkaichi JP
Nishimura; Yukio - Mie JP
Nishimura; Yukio - Ishikawa-ken JP
Nishimura; Yukio - Cupertino CA
Nishimura; Yukio - Hachioji JP
Nishimura; Yukio - Kamakura JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20220137508 - NAKAGAWA; Hiroki ; et al.	2022-05-05
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20210278764 - NAKAGAWA; Hiroki ; et al.	2021-09-09
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 11,036,133 - Nakagawa , et al. June 15, 2	2021-06-15
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20200124961 - NAKAGAWA; Hiroki ; et al.	2020-04-23
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 10,620,534 - Nakagawa , et al.	2020-04-14
Apparatus for acquiring electric activity in the brain and utilization of the same Grant 10,478,085 - Nambu , et al. Nov	2019-11-19
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20190278175 - NAKAGAWA; Hiroki ; et al.	2019-09-12
Magnetic resonance measurement apparatus with improved instruction sequence transfer Grant 10,302,721 - Hachitani , et al.	2019-05-28
Apparatus For Acquiring Electric Activity In The Brain And Utilization Of The Same App 20190038168 - NAMBU; Atsushi ; et al.	2019-02-07
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20190025695 - NAKAGAWA; Hiroki ; et al.	2019-01-24
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 10,082,733 - Nakagawa , et al. September 25, 2	2018-09-25
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20170199453 - NAKAGAWA; Hiroki ; et al.	2017-07-13
Upper Layer-forming Composition And Resist Patterning Method App 20170160637 - Hayama; Takahiro ; et al.	2017-06-08
Radiation-sensitive resin composition, polymer and method for forming a resist pattern Grant 9,598,520 - Kiridoshi , et al. March 21, 2	2017-03-21
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 9,500,950 - Nakagawa , et al. November 22, 2	2016-11-22
Magnetic Resonance Measurement Apparatus with Improved Instruction Sequence Transfer App 20160187440 - Hachitani; Kenichi ; et al.	2016-06-30
Upper Layer-forming Composition And Resist Patterning Method App 20160109801 - Hayama; Takahiro ; et al.	2016-04-21
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20160062237 - NAKAGAWA; Hiroki ; et al.	2016-03-03
Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method Grant 9,261,789 - Hayama , et al. February 16, 2	2016-02-16
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 9,213,236 - Nakagawa , et al. December 15, 2	2015-12-15
Immersion upper layer film forming composition and method of forming photoresist pattern Grant 9,182,674 - Kimura , et al. November 10, 2	2015-11-10
Apparatus For Acquiring Electric Activity In The Brain And Utilization Of The Same App 20150223718 - Nambu; Atsushi ; et al.	2015-08-13
Composition for formation of upper layer film, and method for formation of photoresist pattern Grant 8,895,229 - Nishimura , et al. November 25, 2	2014-11-25
Method for forming pattern Grant 8,808,974 - Nishimura , et al. August 19, 2	2014-08-19
Radiation-sensitive resin composition Grant 8,802,348 - Otsuka , et al. August 12, 2	2014-08-12
Silicon-containing film, resin composition, and pattern formation method Grant 8,791,020 - Mori , et al. July 29, 2	2014-07-29
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20140162190 - NAKAGAWA; Hiroki ; et al.	2014-06-12
Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern Grant 8,697,344 - Kouno , et al. April 15, 2	2014-04-15
Compound, polymer, and radiation-sensitive composition Grant 8,697,331 - Sakakibara , et al. April 15, 2	2014-04-15
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 8,697,343 - Nakagawa , et al. April 15, 2	2014-04-15
Storage apparatus and control method for storage apparatus Grant 8,572,428 - Nishita , et al. October 29, 2	2013-10-29
Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound Grant 8,530,692 - Matsumura , et al. September 10, 2	2013-09-10
Composition For Forming Upper Layer Film For Immersion Exposure, Upper Layer Film For Immersion Exposure, And Method Of Forming Photoresist Pattern App 20130216961 - KOUNO; Daita ; et al.	2013-08-22
Upper layer film forming composition and method of forming photoresist pattern Grant 8,507,189 - Kouno , et al. August 13, 2	2013-08-13
Radiation-sensitive resin composition, polymer, and compound Grant 8,507,575 - Matsumura , et al. August 13, 2	2013-08-13
Method For Forming Pattern App 20130164695 - NISHIMURA; Yukio ; et al.	2013-06-27
Upper layer-forming composition and photoresist patterning method Grant 8,435,718 - Nakamura , et al. May 7, 2	2013-05-07
Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern Grant 8,431,332 - Kouno , et al. April 30, 2	2013-04-30
Radiation-sensitive Resin Composition, Polymer And Method For Forming A Resist Pattern App 20120295197 - KIRIDOSHI; Yuko ; et al.	2012-11-22
Immersion Upper Layer Film Forming Composition And Method Of Forming Photoresist Pattern App 20120282553 - KIMURA; Toru ; et al.	2012-11-08
Multi-core processor, control method thereof, and information processing apparatus Grant 8,307,141 - Nishita , et al. November 6, 2	2012-11-06
Upper layer film forming composition for liquid immersion and method of forming photoresist pattern Grant 8,247,165 - Kimura , et al. August 21, 2	2012-08-21
Patern Forming Method App 20120164586 - NISHIMURA; Yukio ; et al.	2012-06-28
Storage Apparatus And Control Method For Storage Apparatus App 20120159265 - NISHITA; Satoru ; et al.	2012-06-21
Silicon-containing Film, Resin Composition, And Pattern Formation Method App 20120129352 - MORI; Takashi ; et al.	2012-05-24
Compound, Fluorine-containing Polymer, Radiation-sensitive Resin Composition And Method For Producing Compound App 20120100480 - MATSUMURA; Nobuji ; et al.	2012-04-26
Radiation-sensitive Resin Composition, Polymer, And Compound App 20120065291 - Matsumura; Nobuji ; et al.	2012-03-15
Radiation-sensitive composition Grant 8,124,314 - Nishimura , et al. February 28, 2	2012-02-28
Upper Layer-forming Composition And Photoresist Patterning Method App 20120028198 - NAKAMURA; Atsushi ; et al.	2012-02-02
Upper Layer-forming Composition And Resist Patterning Method App 20120021359 - HAYAMA; Takahiro ; et al.	2012-01-26
Upper layer-forming composition and photoresist patterning method Grant 8,076,053 - Nakamura , et al. December 13, 2	2011-12-13
Radiation-sensitive Resin Composition And Polymer App 20110262865 - NISHIMURA; Yukio ; et al.	2011-10-27
Radiation-sensitive Resin Composition, And Resist Pattern Formation Method App 20110212401 - NISHIMURA; Yukio ; et al.	2011-09-01
Radiation-sensitive Resin Composition For Liquid Immersion Lithography, Polymer, And Resist Pattern-forming Method App 20110151378 - MATSUMURA; Nobuji ; et al.	2011-06-23
Self-topcoating photoresist for photolithography Grant 7,951,524 - Allen , et al. May 31, 2	2011-05-31
Novel Compound, Polymer, And Radiation-sensitive Composition App 20110104611 - Sakakibara; Hirokazu ; et al.	2011-05-05
Composition For Forming Upper Layer Film For Immersion Exposure, Upper Layer Film For Immersion Exposure, And Method Of Forming Photoresist Pattern App 20100255416 - Kouno; Daita ; et al.	2010-10-07
Radiation-sensitive Composition App 20100221664 - NISHIMURA; Yukio ; et al.	2010-09-02
Radiation-sensitive Composition App 20100203452 - Nishimura; Yukio ; et al.	2010-08-12
Radiation-sensitive Resin Composition App 20100203447 - Otsuka; Noboru ; et al.	2010-08-12
Multi-core Processor, Control Method Thereof, And Information Processing Apparatus App 20100095040 - NISHITA; Satoru ; et al.	2010-04-15
Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing Grant 7,691,275 - Willson , et al. April 6, 2	2010-04-06
Positive-working Radiation-sensitive Composition And Method For Resist Pattern Formation Using The Composition App 20100068650 - Nishimura; Yukio ; et al.	2010-03-18
Upper Layer Film Forming Composition And Method Of Forming Photoresist Pattern App 20100040974 - Kouno; Daita ; et al.	2010-02-18
Composition For Formation Of Upper Layer Film, And Method For Formation Of Photoresist Pattern App 20100021852 - Nishimura; Yukio ; et al.	2010-01-28
Upper Layer-forming Composition And Photoresist Patterning Method App 20100003615 - Nakamura; Atsushi ; et al.	2010-01-07
Radiation-sensitive resin composition Grant 7,638,261 - Nishimura , et al. December 29, 2	2009-12-29
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20090202945 - Nakagawa; Hiroki ; et al.	2009-08-13
Radiation-sensitive Resin Composition App 20090148790 - Nishimura; Yukio ; et al.	2009-06-11
Radiation-sensitive resin composition Grant 7,531,286 - Nishimura , et al. May 12, 2	2009-05-12
Radiation-sensitive resin composition Grant 7,521,169 - Nishimura , et al. April 21, 2	2009-04-21
Acrylic copolymer and radiation-sensitive resin composition Grant 7,452,655 - Ishii , et al. November 18, 2	2008-11-18
Self-topcoating Photoresist For Photolithography App 20080193879 - Allen; Robert ; et al.	2008-08-14
Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern App 20070269734 - Kimura; Toru ; et al.	2007-11-22
Onium salt compound and radiation-sensitive resin composition Grant 7,217,492 - Yoneda , et al. May 15, 2	2007-05-15
Dynamic determination of memory mapped input output range granularity for multi-node computer system Grant 7,213,081 - Narasimhamurthy , et al. May 1, 2	2007-05-01
Radiation-sensitive resin composition Grant 7,202,016 - Miyaji , et al. April 10, 2	2007-04-10
Radiation sensitive resin composition App 20070042292 - Yoneda; Eiji ; et al.	2007-02-22
Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing App 20060261518 - Willson; C. Grant ; et al.	2006-11-23
Radiation-sensitive resin composition App 20060234153 - Nishimura; Yukio ; et al.	2006-10-19
193nm resist with improved post-exposure properties Grant 7,087,356 - Khojasteh , et al. August 8, 2	2006-08-08
Data transfer in multi-node computer system Grant 7,076,576 - Nishimura , et al. July 11, 2	2006-07-11
Acrylic copolymer and radiation-sensitive resin composition App 20060074139 - Ishii; Hiroyuki ; et al.	2006-04-06
Radiation-sensitive resin composition Grant 6,964,840 - Nishimura , et al. November 15, 2	2005-11-15
System and method for partitioning a computer system into domains Grant 6,961,761 - Masuyama , et al. November 1, 2	2005-11-01
Radiation-sensitive resin composition App 20050214680 - Miyaji, Masaaki ; et al.	2005-09-29
Apparatus for debugging imaging devices and method of testing imaging devices Grant 6,943,826 - Tatekawa , et al. September 13, 2	2005-09-13
Radiation-sensitive resin composition Grant 6,933,094 - Miyaji , et al. August 23, 2	2005-08-23
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition Grant 6,908,722 - Ebata , et al. June 21, 2	2005-06-21
Onium salt compound and radiation-sensitive resin composition App 20050053861 - Yoneda, Eiji ; et al.	2005-03-10
Radiation-sensitive resin composition Grant 6,838,225 - Nishimura , et al. January 4, 2	2005-01-04
Radiation-sensitive resin composition App 20040241580 - Nishimura, Yukio ; et al.	2004-12-02
Radiation-sensitive resin composition Grant 6,800,414 - Nishimura , et al. October 5, 2	2004-10-05
Radiation-sensitive resin composition Grant 6,800,419 - Soyano , et al. October 5, 2	2004-10-05
Radiation-sensitive resin composition Grant 6,753,124 - Nishimura , et al. June 22, 2	2004-06-22
193NM resist with improved post-exposure properties App 20040063024 - Khojasteh, Mahmoud H. ; et al.	2004-04-01
Preparation of copolymers Grant 6,677,419 - Brock , et al. January 13, 2	2004-01-13
Radiation-sensitive resin composition App 20030219680 - Nishimura, Yukio ; et al.	2003-11-27
Radiation-sensitive resin composition App 20030203307 - Soyano, Akimasa ; et al.	2003-10-30
Radiation-sensitive resin composition App 20030203309 - Nishimura, Yukio ; et al.	2003-10-30
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition App 20030113658 - Ebata, Satoshi ; et al.	2003-06-19
Data transfer in multi-node computer system App 20030023906 - Nishimura, Yukio ; et al.	2003-01-30
Dynamic determination of memory mapped input output range granularity for multi-node computer system App 20030005070 - Narasimhamurthy, Prabhunandan B. ; et al.	2003-01-02
System and Method for partitioning a computer system into domains App 20020184345 - Masuyama, Kazunori ; et al.	2002-12-05
Radiation-sensitive resin composition App 20020132181 - Nishimura, Yukio ; et al.	2002-09-19
Radiation-sensitive resin composition App 20020058201 - Miyaji, Masaaki ; et al.	2002-05-16
Radiation-sensitive resin composition App 20020009667 - Nishimura, Yukio ; et al.	2002-01-24
Radiation-sensitive resin composition App 20020009668 - Nishimura, Yukio ; et al.	2002-01-24
Rotary head type recording/reproducing method and apparatus for recording and reproducing a digital audio signal Grant 4,928,185 - Kobayashi , et al. May 22, 1	1990-05-22

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