Nishimura; Toshiharu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nishimura; Toshiharu.The latest application filed is for "method for forming poly-silicon film".

Company Profile

0.12.7

Nishimura; Toshiharu - Nirasaki JP
Nishimura; Toshiharu - Kofu JP
Nishimura; Toshiharu - Nirasaki-shi JP
Nishimura; Toshiharu - Tokyo JP
NISHIMURA; Toshiharu - Kofu-shi JP
Nishimura; Toshiharu - Tokyo-To JP
Nishimura; Toshiharu - Koufu JP
Nishimura; Toshiharu - Hachioji JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor processing apparatus and method for using same Grant 8,183,158 - Tomita , et al. May 22, 2	2012-05-22
Film formation apparatus and method for using the same Grant 8,080,109 - Okada , et al. December 20, 2	2011-12-20
Film formation apparatus and method for using the same Grant 7,959,737 - Okada , et al. June 14, 2	2011-06-14
Method for forming poly-silicon film Grant 7,923,357 - Okada , et al. April 12, 2	2011-04-12
Film formation apparatus and method of using the same Grant 7,691,445 - Okada , et al. April 6, 2	2010-04-06
Method for forming poly-silicon film App 20090124077 - Okada; Mitsuhiro ; et al.	2009-05-14
Film formation apparatus and method of using the same Grant 7,470,637 - Okada , et al. December 30, 2	2008-12-30
Film formation apparatus and method for using the same App 20080282976 - Okada; Mitsuhiro ; et al.	2008-11-20
Film formation apparatus and method for using the same App 20080132079 - Okada; Mitsuhiro ; et al.	2008-06-05
Semiconductor processing apparatus and method for using same App 20080093023 - Tomita; Masahiko ; et al.	2008-04-24
Film Formation Apparatus And Method Of Using The Same App 20070117398 - OKADA; Mitsuhiro ; et al.	2007-05-24
Method of cleaning thin film deposition system, thin film deposition system and program App 20060081182 - Okada; Mitsuhiro ; et al.	2006-04-20
Film formation apparatus and method of using the same App 20060068598 - Okada; Mitsuhiro ; et al.	2006-03-30
Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus Grant 5,637,153 - Niino , et al. June 10, 1	1997-06-10
Film-forming apparatus Grant 5,622,566 - Hosaka , et al. April 22, 1	1997-04-22
Film forming method wherein a partial pressure of a reaction byproduct in a processing container is reduced temporarily Grant 5,503,875 - Imai , et al. April 2, 1	1996-04-02
Method of cleaning reaction tube Grant 5,380,370 - Niino , et al. * January 10, 1	1995-01-10
Method of cleaning a process tube with ClF.sub.3 gas and controlling the temperature of process Grant 5,294,262 - Nishimura March 15, 1	1994-03-15
Image forming apparatus capable of processing various kinds of photosensitive material Grant 4,872,033 - Watanabe , et al. October 3, 1	1989-10-03

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