Nishimura; Rieko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nishimura; Rieko.The latest application filed is for "multi charged particle beam evaluation method and multi charged particle beam writing device".

Company Profile

7.22.26

Nishimura; Rieko - Yokohama JP
NISHIMURA; Rieko - Yokohama-shi JP
Nishimura; Rieko - Kanagawa-ken JP
Nishimura; Rieko - Kanagawa JP
Nishimura; Rieko - Kawasaki N/A JP
Nishimura; Rieko - Kawasaki-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi charged particle beam evaluation method and multi charged particle beam writing device Grant 11,211,227 - Nishimura December 28, 2	2021-12-28
Multi Charged Particle Beam Evaluation Method And Multi Charged Particle Beam Writing Device App 20210074510 - NISHIMURA; Rieko	2021-03-11
Charged particle beam writing method and charged particle beam writing apparatus Grant 10,755,893 - Nishimura , et al. A	2020-08-25
Charged particle beam writing apparatus and charged particle beam writing method Grant 10,622,186 - Uemura , et al.	2020-04-14
Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate Grant 10,586,682 - Isaji , et al.	2020-03-10
Method Of Obtaining Dose Correction Amount, Charged Particle Beam Writing Method, And Charged Particle Beam Writing Apparatus App 20200013584 - HIROSE; Satoru ; et al.	2020-01-09
Evaluation method, correction method, recording medium and electron beam lithography system Grant 10,483,082 - Nishimura Nov	2019-11-19
Charged particle beam writing apparatus and charged particle beam writing method Grant 10,468,232 - Hirose , et al. No	2019-11-05
Charged Particle Beam Writing Method And Charged Particle Beam Writing Apparatus App 20190237297 - NISHIMURA; Rieko ; et al.	2019-08-01
Position correction method of stage mechanism and charged particle beam lithography apparatus Grant 10,345,724 - Nishimura , et al. July 9, 2	2019-07-09
Charged Particle Beam Writing Apparatus And Charged Particle Beam Writing Method App 20190189389 - UEMURA; Takuya ; et al.	2019-06-20
Method Of Obtaining Beam Deflection Shape And Method Of Obtaining Arrangement Angle Of Blanking Aperture Array Plate App 20190172678 - ISAJI; Shunsuke ; et al.	2019-06-06
Charged particle beam writing apparatus, and charged particle beam writing method Grant 10,283,314 - Nishimura	2019-05-07
Charged Particle Beam Writing Apparatus and Charged Particle Beam Writing Method App 20190027340 - Hirose; Satoru ; et al.	2019-01-24
Evaluation Method, Correction Method, Recording Medium And Electron Beam Lithography System App 20180269028 - NISHIMURA; Rieko	2018-09-20
Position Correction Method of Stage Mechanism and Charged Particle Beam Lithography Apparatus App 20180210353 - Nishimura; Rieko ; et al.	2018-07-26
Evaluation method, correction method, recording medium and electron beam lithography system Grant 9,997,329 - Nishimura June 12, 2	2018-06-12
Charged Particle Beam Writing Apparatus, and Charged Particle Beam Writing Method App 20180122616 - Nishimura; Rieko	2018-05-03
Evaluation Method, Correction Method, Recording Medium And Electron Beam Lithography System App 20170154755 - NISHIMURA; Rieko	2017-06-01
Adjustment method for charged particle beam drawing apparatus and charged particle beam drawing method Grant 9,659,746 - Nakamura , et al. May 23, 2	2017-05-23
Adjustment Method For Charged Particle Beam Drawing Apparatus And Charged Particle Beam Drawing Method App 20170011884 - NAKAMURA; Takashi ; et al.	2017-01-12
Method for acquiring settling time Grant 9,147,553 - Nishimura September 29, 2	2015-09-29
Method For Acquiring Settling Time App 20150228453 - NISHIMURA; Rieko	2015-08-13
Settling time acquisition method Grant 8,872,139 - Nishimura , et al. October 28, 2	2014-10-28
Settling Time Acquisition Method App 20140284500 - NISHIMURA; Rieko ; et al.	2014-09-25
Method for acquiring settling time Grant 8,803,108 - Nishimura August 12, 2	2014-08-12
Acquisition method of charged particle beam deflection shape error and charged particle beam writing method Grant 8,779,379 - Nishimura July 15, 2	2014-07-15
Charged particle beam drawing method and charged particle beam drawing apparatus Grant 8,748,064 - Nishimura , et al. June 10, 2	2014-06-10
Method For Acquiring Settling Time App 20140054469 - Nishimura; Rieko	2014-02-27
Acquisition Method Of Charged Particle Beam Deflection Shape Error And Charged Particle Beam Writing Method App 20130264499 - NISHIMURA; Rieko	2013-10-10
Charged Particle Beam Drawing Method And Charged Particle Beam Drawing Apparatus App 20130065184 - Nishimura; Rieko ; et al.	2013-03-14
Correcting substrate for charged particle beam lithography apparatus Grant 8,183,544 - Tsuruta , et al. May 22, 2	2012-05-22
Charged-particle beam writing apparatus and charged-particle beam writing method Grant 7,893,411 - Nishimura , et al. February 22, 2	2011-02-22
Method Of Determining Main Deflection Settling Time For Charged Particle Beam Writing, Method Of Writing With Charged Particle Beam, And Apparatus For Writing With Charged Particle Beam App 20100288939 - NISHIMURA; Rieko	2010-11-18
Charged particle beam lithography system and method for evaluating the same Grant 7,834,333 - Nishimura , et al. November 16, 2	2010-11-16
Electron beam lithography system Grant 7,777,205 - Nishimura August 17, 2	2010-08-17
Lithography method of electron beam App 20100178611 - Anze; Hirohito ; et al.	2010-07-15
Charged-particle beam writing method Grant 7,705,322 - Nishimura , et al. April 27, 2	2010-04-27
Method of calculating deflection aberration correcting voltage and charged particle beam writing method Grant 7,679,068 - Kamikubo , et al. March 16, 2	2010-03-16
Correcting Substrate For Charged Particle Beam Lithography Apparatus App 20090242807 - TSURUTA; Kaoru ; et al.	2009-10-01
Charged-particle Beam Writing Apparatus And Charged-particle Beam Writing Method App 20090084990 - NISHIMURA; Rieko ; et al.	2009-04-02
Charged-particle Beam Writing Method App 20090014663 - NISHIMURA; Rieko ; et al.	2009-01-15
Electron Beam Lithography System App 20080237493 - NISHIMURA; Rieko	2008-10-02
Charged Particle Beam Lithography System And Method For Evaluating The Same App 20080067338 - Nishimura; Rieko ; et al.	2008-03-20
Forming Method Of Resist Pattern And Writing Method Of Charged Particle Beam App 20070243487 - Anze; Hirohito ; et al.	2007-10-18
Method Of Calculating Deflection Aberration Correcting Voltage And Charged Particle Beam Writing Method App 20070158576 - Kamikubo; Takashi ; et al.	2007-07-12

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