Nishimura; Matsuomi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nishimura; Matsuomi.The latest application filed is for "polishing apparatus, cleaning apparatus to be used for such a polishing apparatus and polishing/cleaning method as well as method of making a wiring section".

Company Profile

0.18.3

Nishimura; Matsuomi - Saitama-ken JP
Nishimura; Matsuomi - Omiya JP
Nishimura; Matsuomi - Ohmiya JP
Nishimura, Matsuomi - Omiya-shi JP
Nishimura; Matsuomi - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polishing/cleaning method as well as method of making a wiring section using a polishing apparatus Grant 6,776,691 - Nishimura , et al. August 17, 2	2004-08-17
Precise polishing apparatus and method Grant 6,629,882 - Takahashi , et al. October 7, 2	2003-10-07
Polishing apparatus, cleaning apparatus to be used for such a polishing apparatus and polishing/cleaning method as well as method of making a wiring section App 20020052174 - Nishimura, Matsuomi ; et al.	2002-05-02
Polishing apparatus with slurry screening Grant 6,352,469 - Miyazaki , et al. March 5, 2	2002-03-05
Precise polishing apparatus and method App 20020019204 - Takahashi, Kazuo ; et al.	2002-02-14
Polishing apparatus including holder and polishing head with rotational axis of polishing head offset from rotational axis of holder and method of using Grant 6,299,506 - Nishimura , et al. October 9, 2	2001-10-09
Polishing Apparatus Including Holder And Polishing Head With Rotational Axis Of Polishing Head Offset From Rotational Axis Of Holder And Method Of Using App 20010019934 - NISHIMURA, MATSUOMI ; et al.	2001-09-06
Polishing apparatus and method Grant 6,183,345 - Kamono , et al. February 6, 2	2001-02-06
Chemical mechanical polishing apparatus and method Grant 6,179,695 - Takahashi , et al. January 30, 2	2001-01-30
Method of manufacturing semiconductor device using precision polishing apparatus with detecting means Grant 6,165,050 - Ban , et al. December 26, 2	2000-12-26
Chemical-mechanical polishing apparatus and method Grant 6,162,112 - Miyazaki , et al. December 19, 2	2000-12-19
Precision polishing apparatus with detecting means Grant 6,012,966 - Ban , et al. January 11, 2	2000-01-11
Precision polishing apparatus Grant 5,904,611 - Takahashi , et al. May 18, 1	1999-05-18
Method for driving liquid, and method and apparatus for mixing and agitation employing the method Grant 5,788,819 - Onishi , et al. August 4, 1	1998-08-04
Method for specimen measurement Grant 5,601,983 - Takayama , et al. February 11, 1	1997-02-11
Liquid moving apparatus and measuring apparatus utilizing the same Grant 5,599,502 - Miyazaki , et al. February 4, 1	1997-02-04
Method and apparatus for particle manipulation, and measuring apparatus utilizing the same Grant 5,495,105 - Nishimura , et al. February 27, 1	1996-02-27
Apparatus and method for measuring specimen Grant 5,427,959 - Nishimura , et al. June 27, 1	1995-06-27
Sample measuring device and sample measuring system Grant 5,370,842 - Miyazaki , et al. December 6, 1	1994-12-06
Movable film fixing device with heater control responsive to selected sheet size Grant 5,171,969 - Nishimura , et al. December 15, 1	1992-12-15
Electrophotographic copying apparatus utilizing liquid developer Grant 4,168,119 - Nishimura , et al. September 18, 1	1979-09-18

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