NISHIMURA; Eiichiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for NISHIMURA; Eiichiro.The latest application filed is for "oxide semiconductor thin film, manufacturing method for oxide semiconductor thin film, and thin film transistor using oxide semiconductor thin film".

Company Profile

2.12.16

NISHIMURA; Eiichiro - Ome-shi JP
Nishimura; Eiichiro - Ome JP
Nishimura; Eiichiro - Tokyo JP
Nishimura; Eiichiro - Matsusaka JP
Nishimura, Eiichiro - Matsusaka-shi JP
Nishimura; Eiichiro - Kitakatsuragi JP
Nishimura; Eiichiro - Nara JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Oxide Semiconductor Thin Film, Manufacturing Method For Oxide Semiconductor Thin Film, And Thin Film Transistor Using Oxide Semiconductor Thin Film App 20190081182 - NAKAYAMA; Tokuyuki ; et al.	2019-03-14
Oxide Sintered Body And Sputtering Target App 20190062900 - NAKAYAMA; Tokuyuki ; et al.	2019-02-28
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 10,128,108 - Nishimura , et al. November 13, 2	2018-11-13
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 10,000,842 - Nakayama , et al. June 19, 2	2018-06-19
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 9,941,415 - Nakayama , et al. April 10, 2	2018-04-10
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170345653 - NISHIMURA; Eiichiro ; et al.	2017-11-30
Oxide semiconductor thin film and thin film transistor Grant 9,768,316 - Nakayama , et al. September 19, 2	2017-09-19
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 9,732,004 - Nakayama , et al. August 15, 2	2017-08-15
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 9,688,580 - Nakayama , et al. June 27, 2	2017-06-27
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 9,670,578 - Nakayama , et al. June 6, 2	2017-06-06
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target Grant 9,670,577 - Nakayama , et al. June 6, 2	2017-06-06
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170137324 - NAKAYAMA; Tokuyuki ; et al.	2017-05-18
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170130329 - NAKAYAMA; Tokuyuki ; et al.	2017-05-11
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170092780 - NAKAYAMA; Tokuyuki ; et al.	2017-03-30
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170076943 - NAKAYAMA; Tokuyuki ; et al.	2017-03-16
Sintered Oxide, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170077243 - NAKAYAMA; Tokuyuki ; et al.	2017-03-16
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170047206 - NAKAYAMA; Tokuyuki ; et al.	2017-02-16
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170029335 - NAKAYAMA; Tokuyuki ; et al.	2017-02-02
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20170029336 - NAKAYAMA; Tokuyuki ; et al.	2017-02-02
Oxynitride semiconductor thin film Grant 9,543,447 - Nishimura , et al. January 10, 2	2017-01-10
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20160348229 - NAKAYAMA; Tokuyuki ; et al.	2016-12-01
Oxide Sintered Body, Sputtering Target, And Oxide Semiconductor Thin Film Obtained Using Sputtering Target App 20160348230 - NAKAYAMA; Tokuyuki ; et al.	2016-12-01
Oxide Semiconductor Thin Film And Thin Film Transistor App 20160163865 - NAKAYAMA; Tokuyuki ; et al.	2016-06-09
Oxynitride Semiconductor Thin Film App 20160020328 - NISHIMURA; Eiichiro ; et al.	2016-01-21
Liquid crystal display apparatus and method for manufacturing same Grant 6,738,125 - Yamada , et al. May 18, 2	2004-05-18
Liquid crystal display apparatus and method for manufacturing same App 20010005257 - Yamada, Naoshi ; et al.	2001-06-28
Driving circuit for a liquid crystal display apparatus Grant 5,191,455 - Hashimoto , et al. March 2, 1	1993-03-02
Liquid crystal display apparatus Grant 5,066,110 - Mizushima , et al. November 19, 1	1991-11-19

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