Nishimura; Eiichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nishimura; Eiichi.The latest application filed is for "substrate processing apparatus and substrate processing method".

Company Profile

5.109.117

Nishimura; Eiichi - Miyagi JP
NISHIMURA; Eiichi - Kurokawa-gun Miyagi
Nishimura; Eiichi - Shizuoka JP
Nishimura; Eiichi - Nirasaki N/A JP
Nishimura; Eiichi - Nirasaki-shi JP
Nishimura; Eiichi - Yamanashi N/A JP
NISHIMURA; Eiichi - Kurogkawa-gun JP
Nishimura; Eiichi - Kurokawa JP
Nishimura; Eiichi - Nirasaki City JP
Nishimura; Eiichi - Narasaki JP
Nishimura; Eiichi - Malden MA
Nishimura; Eiichi - Narasaki-shi JP
Nishimura; Eiichi - Kanagawa JP
Nishimura; Eiichi - Tokyo JP
Nishimura; Eiichi - Suita JP
Nishimura; Eiichi - Hitachi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of cleaning plasma processing apparatus Grant 10,975,468 - Kishi , et al. April 13, 2	2021-04-13
Substrate processing apparatus and substrate processing method Grant 10,923,329 - Nishimura , et al. February 16, 2	2021-02-16
Method of processing target object to be processed Grant 10,626,498 - Tahara , et al.	2020-04-21
Substrate Processing Apparatus And Substrate Processing Method App 20200111646 - NISHIMURA; Eiichi ; et al.	2020-04-09
Method of etching porous film Grant 10,236,162 - Tahara , et al.	2019-03-19
Method for etching multilayer film Grant 10,217,933 - Nishimura , et al. Feb	2019-02-26
Method Of Cleaning Plasma Processing Apparatus App 20180327901 - KISHI; Hiroki ; et al.	2018-11-15
Method for etching magnetic layer including isopropyl alcohol and carbon dioxide Grant 10,074,800 - Tahara , et al. September 11, 2	2018-09-11
Method of cleaning plasma processing apparatus Grant 10,053,773 - Kishi , et al. August 21, 2	2018-08-21
Method Of Etching Porous Film App 20180082823 - TAHARA; Shigeru ; et al.	2018-03-22
Method For Etching Magnetic Layer App 20180033958 - TAHARA; Shigeru ; et al.	2018-02-01
Etching method and substrate processing apparatus Grant 9,882,124 - Nishimura , et al. January 30, 2	2018-01-30
Method of etching porous film Grant 9,859,102 - Tahara , et al. January 2, 2	2018-01-02
Method for etching copper layer Grant 9,803,286 - Nishimura , et al. October 31, 2	2017-10-31
Method for processing object to be processed Grant 9,793,130 - Sato , et al. October 17, 2	2017-10-17
Method For Etching Multilayer Film App 20170222139 - NISHIMURA; Eiichi ; et al.	2017-08-03
Plasma Processing Apparatus App 20170221682 - NISHIMURA; Eiichi ; et al.	2017-08-03
Etching apparatus Grant 9,691,643 - Nishimura , et al. June 27, 2	2017-06-27
Plasma processing method and plasma processing apparatus Grant 9,660,182 - Sone , et al. May 23, 2	2017-05-23
Method For Processing Object To Be Processed App 20170133233 - SATO; Jun ; et al.	2017-05-11
Method for etching layer to be etched Grant 9,647,206 - Hashimoto , et al. May 9, 2	2017-05-09
Method Of Processing Target Object To Be Processed App 20160307734 - TAHARA; Shigeru ; et al.	2016-10-20
Method Of Etching Porous Film App 20160307732 - TAHARA; Shigeru ; et al.	2016-10-20
Method For Etching Layer To Be Etched App 20160276582 - HASHIMOTO; Mitsuru ; et al.	2016-09-22
Etching method and substrate processing apparatus Grant 9,419,211 - Nishimura , et al. August 16, 2	2016-08-16
Pattern forming method Grant 9,412,618 - Morikita , et al. August 9, 2	2016-08-09
Outer mirror Grant 9,340,158 - Nishimura , et al. May 17, 2	2016-05-17
Pattern Forming Method App 20160042970 - Morikita; Shinya ; et al.	2016-02-11
Semiconductor device manufacturing method Grant 9,245,764 - Nishimura , et al. January 26, 2	2016-01-26
Method and apparatus for forming a periodic pattern using a self-assembled block copolymer Grant 9,234,083 - Nishimura , et al. January 12, 2	2016-01-12
Method of etching copper layer and mask Grant 9,208,997 - Nishimura , et al. December 8, 2	2015-12-08
Outer Mirror App 20150321608 - NISHIMURA; Eiichi ; et al.	2015-11-12
Deposit removal method Grant 9,177,816 - Tahara , et al. November 3, 2	2015-11-03
Plasma processing method and manufacturing method of semiconductor device Grant 9,177,781 - Tahara , et al. November 3, 2	2015-11-03
Substrate processing method and storage medium Grant 9,165,784 - Nishimura , et al. October 20, 2	2015-10-20
Method of etching metal layer Grant 9,150,969 - Nishimura , et al. October 6, 2	2015-10-06
Deposit removal method Grant 9,126,229 - Tahara , et al. September 8, 2	2015-09-08
Method Of Cleaning Plasma Processing Apparatus App 20150247235 - KISHI; Hiroki ; et al.	2015-09-03
Etching Method And Substrate Processing Apparatus App 20150214474 - NISHIMURA; Eiichi ; et al.	2015-07-30
Substrate Processing Apparatus And Substrate Processing Method App 20150179408 - Shimomura; Kouji ; et al.	2015-06-25
Door Mirror App 20150138658 - Nishimura; Eiichi ; et al.	2015-05-21
Substrate Processing Apparatus And Substrate Processing Method App 20150132960 - Nishimura; Eiichi ; et al.	2015-05-14
Substrate Processing Apparatus And Substrate Processing Method App 20150132970 - Nishimura; Eiichi ; et al.	2015-05-14
Method For Etching Copper Layer App 20150104951 - NISHIMURA; Eiichi ; et al.	2015-04-16
Plasma processing method and plasma processing apparatus Grant 8,993,352 - Nishimura , et al. March 31, 2	2015-03-31
Semiconductor Device Manufacturing Method App 20150079790 - Nishimura; Eiichi ; et al.	2015-03-19
Deposit Removing Method And Gas Processing Apparatus App 20150064925 - TAHARA; Shigeru ; et al.	2015-03-05
Method for etching film containing cobalt and palladium Grant 8,962,489 - Nishimura , et al. February 24, 2	2015-02-24
Plasma processing apparatus Grant 8,961,737 - Nishimura February 24, 2	2015-02-24
Dry etching method for metal film Grant 8,961,805 - Nishimura , et al. February 24, 2	2015-02-24
Method And Apparatus For Forming A Periodic Pattern Using A Self-assembled Block Copolymer App 20150048049 - Nishimura; Eiichi ; et al.	2015-02-19
Plasma Processing Method And Plasma Processing Apparatus App 20150050750 - Sone; Takashi ; et al.	2015-02-19
Etching Apparatus App 20150013908 - NISHIMURA; Eiichi ; et al.	2015-01-15
Etching method and etching apparatus Grant 8,877,081 - Nishimura , et al. November 4, 2	2014-11-04
Method For Etching Film Containing Cobalt And Palladium App 20140287591 - NISHIMURA; Eiichi ; et al.	2014-09-25
Method Of Etching Metal Layer App 20140251945 - NISHIMURA; Eiichi ; et al.	2014-09-11
Pattern forming method and manufacturing method of semiconductor device Grant 8,815,495 - Kushibiki , et al. August 26, 2	2014-08-26
Deposit Removal Method App 20140206198 - TAHARA; Shigeru ; et al.	2014-07-24
Substrate processing method and storage medium Grant 8,778,206 - Nishimura , et al. July 15, 2	2014-07-15
Semiconductor device manufacturing method and plasma etching apparatus Grant 8,772,172 - Kushibiki , et al. July 8, 2	2014-07-08
Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored Grant 8,741,396 - Ishikawa , et al. June 3, 2	2014-06-03
Plasma Processing Method And Plasma Processing Apparatus App 20140141532 - Nishimura; Eiichi ; et al.	2014-05-22
Substrate processing method and storage medium Grant 8,715,520 - Sone , et al. May 6, 2	2014-05-06
Etching Method And Substrate Processing Apparatus App 20140120635 - Nishimura; Eiichi ; et al.	2014-05-01
Method Of Etching Copper Layer And Mask App 20140110373 - Nishimura; Eiichi ; et al.	2014-04-24
Deposit Removal Method App 20140083979 - Tahara; Shigeru ; et al.	2014-03-27
Dry etching method for silicon nitride film Grant 8,679,985 - Nishimura , et al. March 25, 2	2014-03-25
Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process Grant 8,642,136 - Kushibiki , et al. February 4, 2	2014-02-04
Substrate processing method Grant 8,608,974 - Nishimura December 17, 2	2013-12-17
Substrate cleaning method Grant 8,585,831 - Matsui , et al. November 19, 2	2013-11-19
Semiconductor Device Manufacturing Method And Plasma Etching Apparatus App 20130302993 - KUSHIBIKI; Masato ; et al.	2013-11-14
Plasma processing apparatus Grant 8,551,289 - Nishimura , et al. October 8, 2	2013-10-08
Method For Producing Filtration Filter App 20130240479 - MORIYA; Tsuyoshi ; et al.	2013-09-19
Substrate processing method Grant 8,530,354 - Kushibiki , et al. September 10, 2	2013-09-10
Semiconductor device fabrication method Grant 8,518,828 - Endoh , et al. August 27, 2	2013-08-27
Etching Method And Etching Apparatus App 20130196511 - NISHIMURA; Eiichi ; et al.	2013-08-01
Substrate processing method Grant 8,491,804 - Kushibiki , et al. July 23, 2	2013-07-23
Semiconductor device manufacturing method and plasma etching apparatus Grant 8,491,805 - Kushibiki , et al. July 23, 2	2013-07-23
Pattern Forming Method And Manufacturing Method Of Semiconductor Device App 20130122429 - KUSHIBIKI; Masato ; et al.	2013-05-16
Dry Etching Method For Metal Film App 20130098868 - NISHIMURA; Eiichi ; et al.	2013-04-25
Substrate processing method and substrate processing apparatus Grant 8,383,517 - Nishimura , et al. February 26, 2	2013-02-26
Substrate processing method Grant 8,383,521 - Nishimura , et al. February 26, 2	2013-02-26
Substrate processing system and method Grant 8,377,721 - Shibata , et al. February 19, 2	2013-02-19
Method of manufacturing semiconductor device Grant 8,357,615 - Chiba , et al. January 22, 2	2013-01-22
Substrate processing apparatus Grant 8,353,986 - Sasaski , et al. January 15, 2	2013-01-15
Substrate processing method Grant 8,329,050 - Sone , et al. December 11, 2	2012-12-11
Cleaning Method Of Plasma Processing Apparatus And Plasma Processing Method App 20120270406 - Tahara; Shigeru ; et al.	2012-10-25
Substrate Processing Method And Storage Medium App 20120244718 - NISHIMURA; Eiichi ; et al.	2012-09-27
Substrate Processing Method And Storage Medium App 20120244716 - Sone; Takashi ; et al.	2012-09-27
Fine pattern forming method Grant 8,273,258 - Sone , et al. September 25, 2	2012-09-25
Substrate processing method, substrate processing apparatus and recording medium Grant 8,262,921 - Nishimura September 11, 2	2012-09-11
Substrate processing method Grant 8,252,698 - Kushibiki , et al. August 28, 2	2012-08-28
Substrate Processing Method And Storage Medium App 20120214315 - Nishimura; Eiichi ; et al.	2012-08-23
Substrate processing method Grant 8,241,511 - Kushibiki , et al. August 14, 2	2012-08-14
Substrate Processing Method App 20120196387 - KUSHIBIKI; Masato ; et al.	2012-08-02
Plasma Processing Apparatus And Plasma Processing Method App 20120190207 - NISHIMURA; Eiichi ; et al.	2012-07-26
Semiconductor Device Manufacturing Method App 20120190206 - YATSUDA; Koichi ; et al.	2012-07-26
Actuator And Sheet-shaped Actuator App 20120180475 - Shimizu; Masahiro ; et al.	2012-07-19
Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium Grant 8,210,742 - Moriya , et al. July 3, 2	2012-07-03
Substrate Processing Method App 20120164839 - Nishimura; Eiichi	2012-06-28
Substrate processing method Grant 8,202,805 - Kushibiki , et al. June 19, 2	2012-06-19
Forming method of etching mask, control program and program storage medium Grant 8,198,183 - Yatsuda , et al. June 12, 2	2012-06-12
Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method Grant 8,173,357 - Nishimura May 8, 2	2012-05-08
Substrate processing system and substrate cleaning apparatus including a jetting apparatus Grant 8,132,580 - Moriya , et al. March 13, 2	2012-03-13
Substrate processing system Grant 8,129,285 - Nishimura March 6, 2	2012-03-06
Manufacturing method of capacitor electrode, manufacturing system of capacitor electrode, and storage medium Grant 8,124,536 - Nishimura February 28, 2	2012-02-28
Substrate processing method and substrate processing apparatus Grant 8,114,781 - Nishimura , et al. February 14, 2	2012-02-14
Substrate Cleaning Method App 20120031434 - Matsui; Hidefumi ; et al.	2012-02-09
Plasma Processing Device App 20120031563 - Setsuhara; Yuichi ; et al.	2012-02-09
Plasma Processing Method And Manufacturing Method Of Semiconductor Device App 20120009786 - TAHARA; Shigeru ; et al.	2012-01-12
Substrate Processing System, Substrate Processing Method, And Storage Medium App 20110303642 - NISHIMURA; Eiichi	2011-12-15
Substrate processing apparatus and focus ring Grant 8,043,472 - Miyagawa , et al. October 25, 2	2011-10-25
Substrate processing method and substrate processing apparatus Grant 8,034,720 - Nishimura , et al. October 11, 2	2011-10-11
Method For Forming Amorphous Carbon Nitride Film, Amorphous Carbon Nitride Film, Multilayer Resist Film, Method For Manufacturing Semiconductor Device, And Storage Medium In Which Control Program Is Stored App 20110201206 - Ishikawa; Hiraku ; et al.	2011-08-18
Semiconductor Device Manufacturing Method And Plasma Etching Apparatus App 20110195577 - KUSHIBIKI; Masato ; et al.	2011-08-11
Substrate processing method and substrate processing apparatus Grant 7,993,540 - Nishimura August 9, 2	2011-08-09
Substrate processing method and storage medium Grant 7,985,699 - Nishimura July 26, 2	2011-07-26
Method And Apparatus For Recovering Pattern On Silicon Substrate App 20110174337 - NISHIMURA; Eiichi ; et al.	2011-07-21
Substrate Cleaning Method And Substrate Cleaning Apparatus App 20110168205 - TAHARA; Shigeru ; et al.	2011-07-14
Semiconductor Device Manufacturing Method App 20110104901 - Yatsuda; Koichi ; et al.	2011-05-05
Mask Pattern Forming Method And Semiconductor Device Manufacturing Method App 20110065280 - Nakajima; Shigeru ; et al.	2011-03-17
Pattern Forming Method And Manufacturing Method Of Semiconductor Device App 20110065049 - KUSHIBIKI; Masato ; et al.	2011-03-17
Ashing method and apparatus therefor Grant 7,892,986 - Tahara , et al. February 22, 2	2011-02-22
Substrate Processing Apparatus, Substrate Processing Method, And Storage Medium Storing Program For Implementing The Method App 20110033636 - Nishimura; Eiichi ; et al.	2011-02-10
Method of manufacturing semiconductor device Grant 7,871,908 - Yatsuda , et al. January 18, 2	2011-01-18
Plasma Processing Apparatus App 20100269980 - NISHIMURA; Eiichi ; et al.	2010-10-28
Substrate Processing Method App 20100240217 - KUSHIBIKI; Masato ; et al.	2010-09-23
Substrate Processing Method App 20100233885 - KUSHIBIKI; Masato ; et al.	2010-09-16
Substrate Processing Method App 20100233883 - Nishimura; Eiichi ; et al.	2010-09-16
Substrate Processing Apparatus And Substrate Processing Method App 20100206846 - Nishimura; Eiichi ; et al.	2010-08-19
Dry Etching Method For Silicon Nitride Film App 20100197143 - Nishimura; Eiichi ; et al.	2010-08-05
Substrate Processing Method App 20100173493 - Kushibiki; Masato ; et al.	2010-07-08
Fine Pattern Forming Method App 20100170871 - SONE; TAKASHI ; et al.	2010-07-08
Substrate processing apparatus, substrate processing method and storage medium Grant 7,736,942 - Nishimura , et al. June 15, 2	2010-06-15
Method Of Manufacturing Semiconductor Device App 20100144155 - YATSUDA; Koichi ; et al.	2010-06-10
Semiconductor Device Fabrication Method App 20100130011 - ENDOH; TETSUO ; et al.	2010-05-27
Low-pressure removal of photoresist and etch residue Grant 7,700,494 - Balasubramaniam , et al. April 20, 2	2010-04-20
Substrate Processing Method, Substrate Processing Apparatus, And Storage Medium App 20100086670 - Kushibiki; Masato ; et al.	2010-04-08
Method of processing substrate, and method of and program for manufacturing electronic device Grant 7,682,517 - Nishimura , et al. March 23, 2	2010-03-23
Substrate Processing Method App 20100068892 - KUSHIBIKI; Masato ; et al.	2010-03-18
Method And Apparatus For Reforming Film And Controlling Slimming Amount Thereof App 20100040980 - Nishimura; Eiichi ; et al.	2010-02-18
Method For Manufacturing Semiconductor Device And Storage Medium App 20100029086 - Miyoshi; Hidenori ; et al.	2010-02-04
Method And Apparatus For Detecting Foreign Matter Attached To Peripheral Edge Of Substrate, And Storage Medium App 20100018332 - MORIYA; Tsuyoshi ; et al.	2010-01-28
Forming Method Of Etching Mask, Control Program And Program Storage Medium App 20090291560 - Yatsuda; Koichi ; et al.	2009-11-26
Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods Grant 7,622,392 - Nishimura , et al. November 24, 2	2009-11-24
Substrate Processing System App 20090275201 - NISHIMURA; Eiichi	2009-11-05
Method Of Forming Etching Mask, Etching Method Using The Etching Mask, And Method Of Fabricating Semiconductor Device Including The Etching Method App 20090269682 - NISHIMURA; Eiichi	2009-10-29
Plasma Processing Apparatus App 20090229522 - NISHIMURA; Eiichi	2009-09-17
Substrate Processing Method App 20090209108 - MORIYA; Tsuyoshi ; et al.	2009-08-20
Substrate Processing Apparatus App 20090188428 - SAKURAGI; Isamu ; et al.	2009-07-30
Substrate Processing Method, Substrate Processing Apparatus And Recording Medium App 20090179003 - NISHIMURA; Eiichi	2009-07-16
Echo canceler with automatic gain control of echo cancellation signal Grant 7,532,717 - Nishimura May 12, 2	2009-05-12
Manufacturing method, manufacturing apparatus, control program and program recording medium of semiconductor device App 20090087990 - Yatsuda; Koichi ; et al.	2009-04-02
Manufacturing method, manufacturing apparatus, control program and program recording medium of semicontructor device App 20090087991 - Yatsuda; Koichi ; et al.	2009-04-02
Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device Grant 7,510,972 - Nishimura , et al. March 31, 2	2009-03-31
Method For Forming Etching Mask, Control Program And Program Storage Medium App 20090081565 - Yatsuda; Koichi ; et al.	2009-03-26
Substrate Processing System And Method App 20090014125 - SHIBATA; Tsuyoshi ; et al.	2009-01-15
Plasma Processing Apparatus App 20090008034 - TAHARA; Shigeru ; et al.	2009-01-08
Method of manufacturing semiconductor device App 20090011605 - Chiba; Yuki ; et al.	2009-01-08
Method and apparatus for bilayer photoresist dry development Grant 7,465,673 - Igarashi , et al. December 16, 2	2008-12-16
Substrate Processing Apparatus, Substrate Processing Method And Storage Medium App 20080305632 - NISHIMURA; Eiichi ; et al.	2008-12-11
Substrate Processing System And Substrate Cleaning Apparatus App 20080236634 - MORIYA; Tsuyoshi ; et al.	2008-10-02
Ashing Method And Apparatus Therefor App 20080233766 - Tahara; Shigeru ; et al.	2008-09-25
Substrate Peripheral Film-removing Apparatus And Substrate Peripheral Film-removing Method App 20080233754 - NISHIMURA; Eiichi ; et al.	2008-09-25
Substrate Processing Apparatus And Focus Ring App 20080210379 - MIYAGAWA; Masaaki ; et al.	2008-09-04
Substrate Processing Method And Substrate Processing Apparatus App 20080179292 - Nishimura; Eiichi ; et al.	2008-07-31
Substrate Processing Method And Substrate Processing Apparatus App 20080182421 - NISHIMURA; Eiichi ; et al.	2008-07-31
Etching method Grant 7,402,523 - Nishimura , et al. July 22, 2	2008-07-22
Substrate Processing System, Substrate Processing Method, And Storage Medium App 20080141509 - NISHIMURA; Eiichi	2008-06-19
Manufacturing Method Of Capacitor Electrode, Manufacturing System Of Capacitor Electrode, And Storage Medium App 20080124936 - Nishimura; Eiichi	2008-05-29
Low-pressure removal of photoresist and etch residue Grant 7,344,993 - Balasubramaniam , et al. March 18, 2	2008-03-18
Substrate Processing Method And Substrate Processing Apparatus App 20080003365 - NISHIMURA; Eiichi	2008-01-03
Substrate Processing Method And Substrate Processing Apparatus App 20080003836 - NISHIMURA; Eiichi ; et al.	2008-01-03
Method of manufacturing semiconductor device App 20070275560 - Nishimura; Eiichi ; et al.	2007-11-29
Substrate Processing Method And Storage Medium App 20070224818 - NISHIMURA; Eiichi	2007-09-27
Substrate Processing Apparatus, Substrate Attracting Method, And Storage Medium App 20070211402 - Sawataishi; Masayuki ; et al.	2007-09-13
Substrate Processing System App 20070212816 - Nishimura; Eiichi	2007-09-13
Substrate Processing Apparatus, Substrate Processing Method, And Storage Medium Storing Program For Implementing The Method App 20070175393 - NISHIMURA; Eiichi ; et al.	2007-08-02
Substrate Peripheral Film-removing Apparatus And Substrate Peripheral Film-removing Method App 20070141843 - Nishimura; Eiichi ; et al.	2007-06-21
Method for removing photoresist and etch residues Grant 7,169,440 - Balasubramaniam , et al. January 30, 2	2007-01-30
Etching method App 20060219660 - Nishimura; Eiichi ; et al.	2006-10-05
Substrate processing apparatus App 20060219171 - Sasaki; Yoshiaki ; et al.	2006-10-05
Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods App 20060196527 - Nishimura; Eiichi ; et al.	2006-09-07
Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods App 20060191865 - Nishimura; Eiichi ; et al.	2006-08-31
Method of processing substrate, and method of and program for manufacturing electronic device App 20060194435 - Nishimura; Eiichi ; et al.	2006-08-31
Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device App 20060189138 - Nishimura; Eiichi ; et al.	2006-08-24
Low-pressure removal of photoresist and etch residue App 20060154486 - Balasubramaniam; Vaidyanathan ; et al.	2006-07-13
Low-pressure removal of photoresist and etch residue App 20060144817 - Balasubramaniam; Vaidyanathan ; et al.	2006-07-06
Method and apparatus for reforming film and controlling slimming amount thereof App 20050214683 - Nishimura, Eiichi ; et al.	2005-09-29
Echo canceler compensating for amplifier saturation and echo amplification Grant 6,925,177 - Nishimura August 2, 2	2005-08-02
Method for removing photoresist and etch residues Grant 6,849,559 - Balasubramaniam , et al. February 1, 2	2005-02-01
Method and apparatus for bilayer photoresist dry development App 20040185380 - Igarashi, Yoshiki ; et al.	2004-09-23
Method for removing photoresist and etch residues App 20030194876 - Balasubramaniam, Vaidyanathan ; et al.	2003-10-16
Method for removing photoresist and etch residues App 20030192856 - Balasubramaniam, Vaidyanathan ; et al.	2003-10-16
Echo canceler compensating for amplifier saturation and echo amplification App 20030076948 - Nishimura, Eiichi	2003-04-24
Echo canceler with automatic gain control of echo cancellation signal App 20020076037 - Nishimura, Eiichi	2002-06-20
Coating composition and method for forming multi-layer coating Grant 5,741,552 - Takayama , et al. April 21, 1	1998-04-21
Barrel shifter Grant 5,465,223 - Nishimura November 7, 1	1995-11-07
Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber Grant 5,314,603 - Sugiyama , et al. May 24, 1	1994-05-24
Plasma generating apparatus Grant 5,147,493 - Nishimura , et al. September 15, 1	1992-09-15
Optical repeated transmission method and system Grant 5,060,301 - Nishimura October 22, 1	1991-10-22
Multiplying unit circuit Grant 5,010,510 - Nishimura , et al. April 23, 1	1991-04-23
Method and apparatus for analyzing positron extinction and electron microscope having said apparatus Grant 4,740,694 - Nishimura , et al. April 26, 1	1988-04-26