Nishimatsu; Shigeru
Patent Applications and Registrations
Patent applications and USPTO patent grants for Nishimatsu; Shigeru.The latest application filed is for "surface analyzing method and apparatus".
- Nishimatsu; Shigeru - Kokubunji JP
- Nishimatsu; Shigeru - Tokyo JA
| Patent | Date |
|---|---|
| Surface analyzing method and apparatus Grant 5,220,169 - Ninomiya , et al. June 15, 1 | 1993-06-15 |
| Method of semiconductor surface measurment and an apparatus for realizing the same Grant 5,140,272 - Nishimatsu , et al. August 18, 1 | 1992-08-18 |
| Surface analysis method and apparatus Grant 5,138,158 - Ninomiya , et al. August 11, 1 | 1992-08-11 |
| Method of surface treatment Grant 5,108,543 - Suzuki , et al. April 28, 1 | 1992-04-28 |
| Surface treatment method Grant 5,108,778 - Suzuki , et al. April 28, 1 | 1992-04-28 |
| Surface treatment apparatus Grant 4,901,667 - Suzuki , et al. February 20, 1 | 1990-02-20 |
| Method for microwave plasma processing Grant 4,705,595 - Okudaira , et al. November 10, 1 | 1987-11-10 |
| Dry-processing apparatus Grant 4,624,214 - Suzuki , et al. November 25, 1 | 1986-11-25 |
| Method and apparatus for monitoring etching Grant 4,609,426 - Ogawa , et al. September 2, 1 | 1986-09-02 |
| Method and apparatus for surface treatment by plasma Grant 4,579,623 - Suzuki , et al. April 1, 1 | 1986-04-01 |
| Microwave plasma etching apparatus Grant 4,559,100 - Ninomiya , et al. December 17, 1 | 1985-12-17 |
| Surface treatment apparatus Grant 4,522,674 - Ninomiya , et al. June 11, 1 | 1985-06-11 |
| Method for growing silicon-including film by employing plasma deposition Grant 4,481,229 - Suzuki , et al. November 6, 1 | 1984-11-06 |
| Microwave plasma etching Grant 4,462,863 - Nishimatsu , et al. July 31, 1 | 1984-07-31 |
| Semiconductor device with multi-layered electrodes Grant 4,451,841 - Hori , et al. May 29, 1 | 1984-05-29 |
| Microwave plasma source Grant 4,433,228 - Nishimatsu , et al. February 21, 1 | 1984-02-21 |
| Microwave plasma etching apparatus having fan-shaped discharge Grant 4,430,138 - Suzuki , et al. February 7, 1 | 1984-02-07 |
| Process for plasma etching Grant 4,330,384 - Okudaira , et al. May 18, 1 | 1982-05-18 |
| Dry etching apparatus Grant 4,298,419 - Suzuki , et al. November 3, 1 | 1981-11-03 |
| Semiconductor device and process for making the same Grant 4,270,262 - Hori , et al. June 2, 1 | 1981-06-02 |
| Insulated gate field effect transistor having drain region containing low impurity concentration layer Grant 4,005,450 - Yoshida , et al. January 25, 1 | 1977-01-25 |
| Insulated Gate Field Effect Transistors And Method Of Producing The Same Grant 3,787,962 - Yoshida , et al. January 29, 1 | 1974-01-29 |
| Method Of Making Semiconductor Devices Grant 3,767,483 - Tokuyama , et al. October 23, 1 | 1973-10-23 |
| Method For Fabricating Semiconductor Devices By Ion Implantation Grant 3,615,875 - Morita , et al. October 26, 1 | 1971-10-26 |
| Method Of Forming A Junction By Ion Implantation Grant 3,607,449 - Tokuyama , et al. September 21, 1 | 1971-09-21 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 