NISHIKORI; Katsuaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for NISHIKORI; Katsuaki.The latest application filed is for "radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound".

Company Profile

5.3.19

NISHIKORI; Katsuaki - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation-sensitive Resin Composition, Method Of Forming Resist Pattern, Polymer, And Compound App 20220299873 - NEMOTO; Ryuichi ; et al.	2022-09-22
Radiation-sensitive Resin Composition And Method For Forming Resist Pattern App 20220283498 - NISHIKORI; Katsuaki ; et al.	2022-09-08
Radiation-sensitive Resin Composition, Method Of Forming Resist Pattern, And Polymer App 20220269172 - NISHIKORI; Katsuaki ; et al.	2022-08-25
Radiation-sensitive Resin Composition And Method For Forming Resist Pattern App 20220177424 - NEMOTO; Ryuichi ; et al.	2022-06-09
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid Grant 11,320,735 - Nishikori , et al. May 3, 2	2022-05-03
Radiation-sensitive Resin Composition, Method Of Forming Resist Pattern, And Compound App 20220091508 - NISHIKORI; Katsuaki	2022-03-24
Radiation-sensitive Resin Composition And Method Of Forming Resist Pattern App 20220091507 - NISHIKORI; Katsuaki	2022-03-24
Radiation-sensitive resin composition, onium salt compound and method for forming resist pattern Grant 11,281,100 - Nishikori March 22, 2	2022-03-22
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern And Compound App 20220043350 - Kiriyama; Kazuya ; et al.	2022-02-10
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20210389667 - NISHIKORI; Katsuaki ; et al.	2021-12-16
Radiation-sensitive Resin Composition And Method For Forming Resist Pattern App 20210364918 - Nishikori; Katsuaki ; et al.	2021-11-25
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20210318613 - NISHIKORI; Katsuaki ; et al.	2021-10-14
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound And Method Of Generating Acid App 20210263413 - KIRIYAMA; Kazuya ; et al.	2021-08-26
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20210124263 - NISHIKORI; Katsuaki ; et al.	2021-04-29
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20200393761 - NISHIKORI; Katsuaki ; et al.	2020-12-17
Radiation-sensitive resin composition and resist pattern-forming method Grant 10,824,073 - Nishikori , et al. November 3, 2	2020-11-03
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound And Method Of Generating Acid App 20200341376 - KIRIYAMA; Kazuya ; et al.	2020-10-29
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, And Compound App 20200102270 - KINOSHITA; Natsuko ; et al.	2020-04-02
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Acid Diffusion Control Agent, Carboxylic Acid Salt And Car App 20190391488 - NISHIKORI; Katsuaki ; et al.	2019-12-26
Radiation-sensitive Resin Composition, Onium Salt Compound And Method For Forming Resist Pattern App 20190285983 - NISHIKORI; Katsuaki	2019-09-19
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20180329298 - NISHIKORI; Katsuaki ; et al.	2018-11-15
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, And Compound App 20180319740 - KINOSHITA; Natsuko ; et al.	2018-11-08

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