Nishikawa; Michinori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nishikawa; Michinori.The latest application filed is for "method for producing liquid crystal display, liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal device".

Company Profile

0.21.20

Nishikawa; Michinori - Tokyo JP
Nishikawa; Michinori - Ibaraki JP
Nishikawa; Michinori - Mie JP
Nishikawa; Michinori - Ibaraki-ken JP
Nishikawa, Michinori - Tsukuba-shi JP
Nishikawa; Michinori - Suzuka JP
Nishikawa; Michinori - Yokkaichi JP
Nishikawa; Michinori - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for producing liquid crystal display Grant 9,447,323 - Nagao , et al. September 20, 2	2016-09-20
Method For Producing Liquid Crystal Display, Liquid Crystal Aligning Agent, Liquid Crystal Alignment Film, And Liquid Crystal Device App 20140173893 - NAGAO; Takashi ; et al.	2014-06-26
Composition For Forming Liquid Crystal Alignment Film And Liquid Crystal Display Device App 20120013837 - Terashita; Shinichi ; et al.	2012-01-19
Radiation sensitive refractive index changing composition, pattern forming method and optical material Grant 7,320,854 - Hanamura , et al. January 22, 2	2008-01-22
Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing Grant 7,153,767 - Nishikawa , et al. December 26, 2	2006-12-26
Composition for film formation, method of film formation, and silica-based film Grant 7,128,976 - Hayashi , et al. October 31, 2	2006-10-31
Method of film formation, insulating film, and substrate for semiconductor Grant 6,890,605 - Nishikawa , et al. May 10, 2	2005-05-10
Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film Grant 6,884,862 - Okada , et al. April 26, 2	2005-04-26
Composition for film formation and material for insulating film formation Grant 6,852,370 - Shinohara , et al. February 8, 2	2005-02-08
Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing App 20050003218 - Nishikawa, Michinori ; et al.	2005-01-06
Radiation sensitive refractive index changing composition, pattern forming method and optical material App 20040265737 - Hanamura, Masaaki ; et al.	2004-12-30
Stacked film, insulating film and substrate for semiconductor Grant 6,824,833 - Nishikawa , et al. November 30, 2	2004-11-30
Polymer, polymer for forming organic electroluminescence device, polymer composition for organic electroluminescence device and organic electroluminescence device App 20040202892 - Yasuda, Hiroyuki ; et al.	2004-10-14
Composition for film formation, method of film formation, and silica-based film Grant 6,800,330 - Hayashi , et al. October 5, 2	2004-10-05
Radiation sensitive composition for forming an insulating film, insulating film and display device Grant 6,797,453 - Shiraki , et al. September 28, 2	2004-09-28
Method for the formation of silica film, silica film, insulating film, and semiconductor device Grant 6,787,193 - Hayashi , et al. September 7, 2	2004-09-07
Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor Grant 6,749,944 - Nishikawa , et al. June 15, 2	2004-06-15
Radiation sensitive composition for forming an insulating film, insulating film and display device App 20030215737 - Shiraki, Shinji ; et al.	2003-11-20
Method of manufacturing material for forming insulating film Grant 6,642,352 - Suzuki , et al. November 4, 2	2003-11-04
Composition for resist underlayer film and method for producing the same Grant 6,576,393 - Sugita , et al. June 10, 2	2003-06-10
Composition for film formation, method of film formation, and silica-based film App 20030091838 - Hayashi, Eiji ; et al.	2003-05-15
Stacked film, insulating film and substrate for semiconductor App 20030077461 - Nishikawa, Michinori ; et al.	2003-04-24
Method of film formation, insulating film, and substrate for semiconductor App 20030059550 - Nishikawa, Michinori ; et al.	2003-03-27
Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor App 20030059628 - Nishikawa, Michinori ; et al.	2003-03-27
Method for the formation of silica film, silica film, insulating film, and semiconductor device App 20030008155 - Hayashi, Eiji ; et al.	2003-01-09
Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film Grant 6,503,633 - Nishikawa , et al. January 7, 2	2003-01-07
Composition for film formation, method of film formation, and silica-based film App 20020189495 - Hayashi, Eiji ; et al.	2002-12-19
Composition for film formation and material for insulating film formation App 20020172652 - Shinohara, Noriyasu ; et al.	2002-11-21
Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film App 20020161173 - Okada, Takashi ; et al.	2002-10-31
Composition for film formation and insulating film Grant 6,468,589 - Nishikawa , et al. October 22, 2	2002-10-22
Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing App 20020064953 - Nishikawa, Michinori ; et al.	2002-05-30
Composition for film formation and material for insulating film formation Grant 6,376,634 - Nishikawa , et al. April 23, 2	2002-04-23
Composition for film formation, method of film formation and silica-based film App 20020045693 - Hayashi, Eiji ; et al.	2002-04-18
Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film App 20010055892 - Nishikawa, Michinori ; et al.	2001-12-27
Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film App 20010051446 - Inoue, Yasutake ; et al.	2001-12-13
Composition for film formation and insulating film App 20010012870 - Nishikawa, Michinori ; et al.	2001-08-09
Method of manufacturing material for forming insulating film App 20010009936 - Suzuki, Hidenori ; et al.	2001-07-26
Liquid crystal alignment agent Grant 5,969,055 - Nishikawa , et al. October 19, 1	1999-10-19
Liquid crystal orienting agent Grant 5,700,860 - Nishikawa , et al. December 23, 1	1997-12-23
Method for domain-dividing liquid crystal alignment film and liquid crystal device using domain-divided alignment film Grant 5,478,682 - Nishikawa , et al. December 26, 1	1995-12-26
Liquid crystal aligning agent and aligning agent-applied liquid crystal display device Grant 5,276,132 - Nishikawa , et al. January 4, 1	1994-01-04

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