NISHIHARA; Eiji

Patent Applications and Registrations

Patent applications and USPTO patent grants for NISHIHARA; Eiji.The latest application filed is for "phosphor and a composition".

Company Profile

3.4.9

NISHIHARA; Eiji - Tottori JP
Nishihara; Eiji - Kyoto JP
Nishihara, Eiji - Kamikyo-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Phosphor And A Composition App 20200231872 - OKURA; Hiroshi ; et al.	2020-07-23
Composition App 20200205415 - OKURA; Hiroshi ; et al.	2020-07-02
Composition, Color Converting Sheet And Light-emitting Diode Device App 20190031954 - OKURA; Hiroshi ; et al.	2019-01-31
Surface region identification by image area segmentation Grant 7,480,407 - Imamura , et al. January 20, 2	2009-01-20
Apparatus, method, and program for assisting in selection of pattern element for pattern matching Grant 7,463,763 - Sano , et al. December 9, 2	2008-12-09
Apparatus and method for measuring spectral reflectance and apparatus for measuring film thickness Grant 7,206,074 - Fujimoto , et al. April 17, 2	2007-04-17
Detection of an end point of polishing a substrate Grant 7,003,148 - Shiomi , et al. February 21, 2	2006-02-21
Surface region identification by image area segmentation App 20060018540 - Imamura; Atsushi ; et al.	2006-01-26
Apparatus, method, and program for assisting in selection of pattern element for pattern matching App 20050259874 - Sano, Hiroshi ; et al.	2005-11-24
Apparatus and method for detecting defect and apparatus and method for extracting wire area App 20050254699 - Sano, Hiroshi ; et al.	2005-11-17
Apparatus and method for detecting hole area App 20050254700 - Nagata, Yasushi ; et al.	2005-11-17
Apparatus and method for measuring spectral reflectance and apparatus for measuring film thickness App 20050206907 - Fujimoto, Hiroki ; et al.	2005-09-22
Detection of an end point of polishing a substrate App 20020159626 - Shiomi, Junichi ; et al.	2002-10-31

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