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Patent applications and USPTO patent grants for Nippon Electric Varian, Ltd..The latest application filed is for "sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge".
Patent | Date |
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Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge Grant 3,984,301 - Matsuzaki , et al. October 5, 1 | 1976-10-05 |
Low temperature sputtering device Grant 3,897,325 - Aoshima , et al. July 29, 1 | 1975-07-29 |
Frequency To Voltage Converter With Means For Prescribing Pulse Width Against Fluctuations Grant 3,824,410 - Funaki , et al. July 16, 1 | 1974-07-16 |
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