Patent | Date |
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Bond pad for low K dielectric materials and method for manufacture for semiconductor devices Grant 8,395,240 - Ning March 12, 2 | 2013-03-12 |
Method for circuit layout and rapid thermal annealing method for semiconductor apparatus Grant 8,392,863 - Ju , et al. March 5, 2 | 2013-03-05 |
Method of forming a via structure dual damascene structure for the manufacture of semiconductor integrated circuit devices Grant 8,158,520 - Ning April 17, 2 | 2012-04-17 |
Bond Pad For Low K Dielectric Materials And Method For Manufacture For Semiconductor Devices App 20120034771 - NING; XIAN J. | 2012-02-09 |
Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors Grant 8,106,423 - Wu , et al. January 31, 2 | 2012-01-31 |
Bond pad for low K dielectric materials and method for manufacture for semiconductor devices Grant 8,049,308 - Ning November 1, 2 | 2011-11-01 |
Design Method for Circuit Layout and Rapid Thermal Annealing Method for Semiconductor Apparatus App 20110078647 - Ju; Jianhua ;   et al. | 2011-03-31 |
Single mask scheme method and structure for integrating PMOS and NMOS transistors using strained silicon Grant 7,820,500 - Ning October 26, 2 | 2010-10-26 |
Metal hard mask method and structure for strained silicon MOS transistors Grant 7,709,336 - Ning , et al. May 4, 2 | 2010-05-04 |
Seal ring corner design Grant 7,663,159 - Ning February 16, 2 | 2010-02-16 |
Dummy patterns and method of manufacture for mechanical strength of low K dielectric materials in copper interconnect structures for semiconductor devices Grant 7,605,470 - Ning October 20, 2 | 2009-10-20 |
Method and structure for second spacer formation for strained silicon MOS transistors Grant 7,591,659 - Chen , et al. September 22, 2 | 2009-09-22 |
Integration scheme method and structure for transistors using strained silicon Grant 7,547,595 - Ning June 16, 2 | 2009-06-16 |
Method and structure using a pure silicon dioxide hardmask for gate pattering for strained silicon MOS transistors App 20090065805 - Wu; Hanming ;   et al. | 2009-03-12 |
Seal ring structures with unlanded via stacks Grant 7,479,699 - Ning January 20, 2 | 2009-01-20 |
Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors Grant 7,425,488 - Wu , et al. September 16, 2 | 2008-09-16 |
Dummy Patterns And Method Of Manufacture For Mechanical Strength Of Low K Dielectric Materials In Copper Interconnect Structures For Semiconductor Devices App 20080142975 - Ning; Xian J. | 2008-06-19 |
Polysilicon gate doping method and structure for strained silicon MOS transistors Grant 7,335,566 - Ning , et al. February 26, 2 | 2008-02-26 |
Poly Silicon Gate Doping Method and Structure for Strained Silicon MOS Transistors App 20070184668 - Ning; Xian J. ;   et al. | 2007-08-09 |
Seal Ring Structures With Unlanded Via Stacks App 20070145567 - NING; XIAN J. | 2007-06-28 |
Bond pad for low K dielectric materials and method for manufacture for semiconductor devices App 20070122597 - Ning; Xian J. | 2007-05-31 |
Integration scheme method and structure for transistors using strained silicon App 20070099369 - Ning; Xian J. | 2007-05-03 |
Single mask scheme method and structure for integrating PMOS and NMOS transistors using strained silicon App 20070096201 - Ning; Xian J. | 2007-05-03 |
Method and structure for second spacer formation for strained silicon MOS transistors App 20070077716 - Chen; John ;   et al. | 2007-04-05 |
Seal ring corner design App 20070069336 - Ning; Xian J. | 2007-03-29 |
Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors App 20070063221 - Wu; Hanming ;   et al. | 2007-03-22 |
Metal hard mask method and structure for strained silicon MOS transistors App 20060194395 - Ning; Xian J. ;   et al. | 2006-08-31 |
Method and structure for reducing contact resistance in dual damascene structure for the manufacture of semiconductor devices App 20060060971 - Ning; Xian J. | 2006-03-23 |
Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs Grant 6,979,526 - Ning December 27, 2 | 2005-12-27 |
Vertical MIMCap manufacturing method Grant 6,960,365 - Ning November 1, 2 | 2005-11-01 |
MRAM MTJ stack to conductive line alignment method Grant 6,858,441 - Nuetzel , et al. February 22, 2 | 2005-02-22 |
Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing Grant 6,815,248 - Leuschner , et al. November 9, 2 | 2004-11-09 |
MIM capacitor structures and fabrication methods in dual-damascene structures Grant 6,794,262 - Ning , et al. September 21, 2 | 2004-09-21 |
Design of lithography alignment and overlay measurement marks on CMP finished damascene surface Grant 6,780,775 - Ning August 24, 2 | 2004-08-24 |
Method for generating alignment marks for manufacturing MIM capacitors Grant 6,750,115 - Ning , et al. June 15, 2 | 2004-06-15 |
Method For Generating Alignment Marks For Manufacturing Mim Capacitors App 20040102014 - Ning, Xian J. ;   et al. | 2004-05-27 |
Method for making a metal-insulator-metal capacitor using plate-through mask techniques Grant 6,723,600 - Wong , et al. April 20, 2 | 2004-04-20 |
Single RIE process for MIMcap top and bottom plates Grant 6,713,395 - Ning March 30, 2 | 2004-03-30 |
MIM capacitor structures and fabrication methods in dual-damascene structures App 20040056324 - Ning, Xian J. ;   et al. | 2004-03-25 |
Method of manufacturing a metal cap layer for preventing damascene conductive lines from oxidation Grant 6,709,874 - Ning March 23, 2 | 2004-03-23 |
Method of fabricating an integrated circuit having embedded vertical capacitor Grant 6,706,588 - Ning March 16, 2 | 2004-03-16 |
MRAM MTJ stack to conductive line alignment method App 20040043579 - Nuetzel, Joachim ;   et al. | 2004-03-04 |
Self-aligned conductive line for cross-point magnetic memory integrated circuits Grant 6,692,898 - Ning February 17, 2 | 2004-02-17 |
Stacked MIMCap between Cu dual damascene levels Grant 6,677,635 - Ning , et al. January 13, 2 | 2004-01-13 |
Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs App 20030224260 - Ning, Xian J. | 2003-12-04 |
Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing App 20030199104 - Leuschner, Rainer ;   et al. | 2003-10-23 |
Plate-through hard mask for MRAM devices Grant 6,635,496 - Ning October 21, 2 | 2003-10-21 |
Method of fabricating a metal-insulator-metal (MIM) capacitor Grant 6,620,701 - Ning September 16, 2 | 2003-09-16 |
Self-aligned cross-point MRAM device with aluminum metallization layers Grant 6,611,453 - Ning August 26, 2 | 2003-08-26 |
Vertical MIMCap manufacturing method App 20030143322 - Ning, Xian J. | 2003-07-31 |
Stacked metal-insulator-metal capacitor structures in between interconnection layers App 20030113974 - Ning, Xian J. ;   et al. | 2003-06-19 |
Vertical/horizontal MIMCap method App 20030073282 - Ning, Xian J. | 2003-04-17 |
Plate-through hard mask for MRAM devices App 20030073251 - Ning, Xian J. | 2003-04-17 |
MIMCap with high dielectric constant insulator App 20030006480 - Lian, Jenny ;   et al. | 2003-01-09 |
Method of making stacked MIMCap between Cu dual-damascene levels App 20020182794 - Ning, Xian J. ;   et al. | 2002-12-05 |
Single rie process for mimcap top and bottom plates App 20020173159 - Ning, Xian J. | 2002-11-21 |
Method for making a metal-insulator-metal capacitor using plate-through mask techniques App 20020153551 - Wong, Kwong H. ;   et al. | 2002-10-24 |
Self-aligned double-sided vertical MIMcap Grant 6,451,667 - Ning September 17, 2 | 2002-09-17 |
Self-aligned conductive line for cross-point magnetic memory integrated circuits App 20020098281 - Ning, Xian J. | 2002-07-25 |
Design of lithography alignment and overlay measurement marks on CMP finished damascene surface App 20020098707 - Ning, Xian J. | 2002-07-25 |
Self-aligned cross-point MRAM device with aluminum metallization layers App 20020097600 - Ning, Xian J. | 2002-07-25 |
Metal Hard Mask For Ild Rie Processing Of Semiconductor Memory Devices To Prevent Oxidation Of Conductive Lines App 20020098676 - Ning, Xian J. ;   et al. | 2002-07-25 |
A method of manufacturing a metal cap layer for preventing damascene conductive lines from oxidation App 20020096775 - Ning, Xian J. | 2002-07-25 |
Self-aligned double-sided vertical MIMcap App 20020081814 - Ning, Xian J. | 2002-06-27 |
Dry process for cleaning residues/polymers after metal etch Grant 6,184,134 - Chaudhary , et al. February 6, 2 | 2001-02-06 |
Method for detecting under-etched vias Grant 5,903,343 - Ning , et al. May 11, 1 | 1999-05-11 |
Wafer surface cleaning apparatus and method Grant 5,865,901 - Yin , et al. February 2, 1 | 1999-02-02 |