Niikura; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Niikura; Satoshi.The latest application filed is for "chemical amplification type positive photoresist composition and resist pattern forming method".

Company Profile

0.5.6

Niikura; Satoshi - Kawasaki JP
Niikura; Satoshi - Kawasaki-shi JP
Niikura; Satoshi - Kanagawa JP
Niikura; Satoshi - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Chemically amplified positive photo resist composition and method for forming resist pattern Grant 7,358,028 - Maruyama , et al. April 15, 2	2008-04-15
Chemical Amplification Type Positive Photoresist Composition And Resist Pattern Forming Method App 20070117045 - Maruyama; Kenji ; et al.	2007-05-24
Positive photoresist composition Grant 6,964,838 - Kurihara , et al. November 15, 2	2005-11-15
Chemically amplified positive photo resist composition and method for forming resist pattern App 20050244740 - Maruyama, Kenji ; et al.	2005-11-03
Positive photoresist composition Grant 6,869,742 - Mizuta , et al. March 22, 2	2005-03-22
Positive photoresist composition App 20040137359 - Kurihara, Masaki ; et al.	2004-07-15
Positive photoresist composition and process for synthesizing polyphenol compound Grant 6,620,978 - Shimatani , et al. September 16, 2	2003-09-16
Positive photoresist composition and process for synthesizing polyphenol compound App 20030054283 - Shimatani, Satoshi ; et al.	2003-03-20
Positive photoresist composition App 20020182531 - Mizuta, Jyunichi ; et al.	2002-12-05
Positive photoresist composition App 20020132178 - Kurihara, Masaki ; et al.	2002-09-19
Positive photoresist compositions and multilayer resist materials using the same Grant 5,728,504 - Hosoda , et al. March 17, 1	1998-03-17

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