loadpatents
name:-0.010492086410522
name:-0.012667894363403
name:-0.00041007995605469
Nihira; Takayasu Patent Filings

Nihira; Takayasu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nihira; Takayasu.The latest application filed is for "positively photosensitive resin composition and method of pattern formation".

Company Profile
0.11.8
  • Nihira; Takayasu - Chiba JP
  • Nihira; Takayasu - Funabashi JP
  • Nihira, Takayasu - Funabashi-shi JP
  • Nihira, Takayasu - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Positive photosensitive polyimide resin composition
Grant 7,026,080 - Nakayama , et al. April 11, 2
2006-04-11
Positively photosensitive resin composition and method of pattern formation
Grant 7,001,705 - Hatanaka , et al. February 21, 2
2006-02-21
Polyamic acid resin composition
Grant 6,927,012 - Hatanaka , et al. August 9, 2
2005-08-09
Positively photosensitive resin composition and method of pattern formation
App 20050147914 - Hatanaka, Tadashi ;   et al.
2005-07-07
Positive photosensitive polyimide resin composition
Grant 6,875,554 - Hatanaka , et al. April 5, 2
2005-04-05
Liquid crystal alignment agent and liquid crystal device using the liquid crystal alignment and method for alignment of liquid crystal molecules
Grant 6,808,766 - Miyama , et al. October 26, 2
2004-10-26
Positive photosensitive polyimide resin composition
App 20040197699 - Nakayama, Tomonari ;   et al.
2004-10-07
Polyamic acid resin composition
App 20040175646 - Hatanaka, Tadashi ;   et al.
2004-09-09
Diaminobenzene derivative, polyimide obtained therefrom, and liquid-crystal alignment film
Grant 6,740,371 - Hosaka , et al. May 25, 2
2004-05-25
Positive photosensitive polyimide resin composition
App 20040048188 - Hatanaka, Tadashi ;   et al.
2004-03-11
Photosensitive black matrix
App 20040048197 - Sabnis, Ram W. ;   et al.
2004-03-11
Diaminobenzene derivative, polyimide precursor and polyimide employing it and treating agent for liquid crystal alignment
App 20040048004 - Hosaka, Kazuyoshi ;   et al.
2004-03-11
Positive type photosensitive polyimide resin composition
Grant 6,677,099 - Ishii , et al. January 13, 2
2004-01-13
Photosensitive black matrix
App 20030113640 - Sabnis, Ram W. ;   et al.
2003-06-19
Photosensitive black matrix
App 20020182522 - Sabnis, Ram W. ;   et al.
2002-12-05
Polyimide precursors and polyimides
Grant 6,489,431 - Ishii , et al. December 3, 2
2002-12-03
Liquid crystal aligning agent
Grant 6,294,639 - Sawahata , et al. September 25, 2
2001-09-25
Diaminobenzene derivatives and polyimides prepared therefrom
Grant 5,665,856 - Nihira , et al. September 9, 1
1997-09-09
Liquid crystal alignment film
Grant 5,608,033 - Nihira , et al. March 4, 1
1997-03-04

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