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Niejelow; Nicholas G Patent Filings

Niejelow; Nicholas G

Patent Applications and Registrations

Patent applications and USPTO patent grants for Niejelow; Nicholas G.The latest application filed is for "ultra low residual reflection, low stress lens coating".

Company Profile
0.3.5
  • Niejelow; Nicholas G - Stratford CT
  • Niejelow; Nicholas G. - Stratford CT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Ultra low residual reflection, low stress lens coating
Grant 7,311,938 - Koenig , et al. December 25, 2
2007-12-25
Ultra low residual reflection, low stress lens coating
App 20070259108 - Koenig; Glen A. ;   et al.
2007-11-08
Ultra low residual reflection, low stress lens coating
App 20070202251 - Koenig; Glen A. ;   et al.
2007-08-30
Ultra low residual reflection, low stress lens coating
App 20060079388 - Koenig; Glen A. ;   et al.
2006-04-13
Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
Grant 6,972,136 - Koenig , et al. December 6, 2
2005-12-06
Lens blocking system
Grant 6,942,746 - Niejelow , et al. September 13, 2
2005-09-13
Lens Blocking System
App 20050126687 - Niejelow, Nicholas G. ;   et al.
2005-06-16
Ultra low residual reflection, low stress lens coating
App 20040234780 - Koenig, Glen A. ;   et al.
2004-11-25

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