loadpatents
Patent applications and USPTO patent grants for Niejelow; Nicholas G.The latest application filed is for "ultra low residual reflection, low stress lens coating".
Patent | Date |
---|---|
Ultra low residual reflection, low stress lens coating Grant 7,311,938 - Koenig , et al. December 25, 2 | 2007-12-25 |
Ultra low residual reflection, low stress lens coating App 20070259108 - Koenig; Glen A. ;   et al. | 2007-11-08 |
Ultra low residual reflection, low stress lens coating App 20070202251 - Koenig; Glen A. ;   et al. | 2007-08-30 |
Ultra low residual reflection, low stress lens coating App 20060079388 - Koenig; Glen A. ;   et al. | 2006-04-13 |
Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same Grant 6,972,136 - Koenig , et al. December 6, 2 | 2005-12-06 |
Lens blocking system Grant 6,942,746 - Niejelow , et al. September 13, 2 | 2005-09-13 |
Lens Blocking System App 20050126687 - Niejelow, Nicholas G. ;   et al. | 2005-06-16 |
Ultra low residual reflection, low stress lens coating App 20040234780 - Koenig, Glen A. ;   et al. | 2004-11-25 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.