Niehoff; Martin
Patent Applications and Registrations
Patent applications and USPTO patent grants for Niehoff; Martin.The latest application filed is for "immersion lithography method and device for illuminating a substrate".
- Niehoff; Martin - Munich DE
- Niehoff; Martin - Munchen DE
| Patent | Date |
|---|---|
| Immersion lithography method and device for illuminating a substrate Grant 7,420,652 - Niehoff September 2, 2 | 2008-09-02 |
| Lithography arrangement and procedure that produces a lithography Grant 7,355,679 - Niehoff April 8, 2 | 2008-04-08 |
| Immersion lithography method and device for illuminating a substrate App 20060221317 - Niehoff; Martin | 2006-10-05 |
| Lithography arrangement and procedure that produces a lithography App 20060170900 - Niehoff; Martin | 2006-08-03 |
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