| Patent | Date |
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Uniform pumping dual-station vacuum processor
Grant 11,387,084 - Gong , et al. July 12, 2 | 2022-07-12 |
Plasma process apparatus with low particle contamination and method of operating the same
Grant 11,371,141 - Ni , et al. June 28, 2 | 2022-06-28 |
Capacitively coupled plasma etching apparatus
Grant 11,373,843 - Huang , et al. June 28, 2 | 2022-06-28 |
Plasma reactor and heating apparatus therefor
Grant 11,363,680 - Zhao , et al. June 14, 2 | 2022-06-14 |
Corrosion-resistant structure for a gas delivery system in a plasma processing apparatus
Grant 11,348,763 - Lian , et al. May 31, 2 | 2022-05-31 |
Gas showerhead, manufacturing method, and plasma apparatus including the gas showerhead
Grant 11,309,165 - Ni , et al. April 19, 2 | 2022-04-19 |
Control Method For Multi-zone Active-matrix Temperature Control In Plasma Processing Apparatus
App 20220005677 - Ni; Tuqiang ; et al. | 2022-01-06 |
Plasma reactor for ultra-high aspect ratio etching and etching method thereof
Grant 11,189,496 - Yin , et al. November 30, 2 | 2021-11-30 |
Electrostatic Chuck, Method Of Manufacturing Electrostatic Chuck, And Plasma Processing Apparatus
App 20210118716 - YE; Rubin ; et al. | 2021-04-22 |
Plasma Processor And Processing Method
App 20210066043 - NI; Tuqiang ; et al. | 2021-03-04 |
Radio Frequency Power Supply System, Plasma Processor, And Frequency-tuning Matching
App 20210057188 - NI; Tuqiang ; et al. | 2021-02-25 |
Liner Assembly For Vacuum Treatment Apparatus, And Vacuum Treatment Apparatus
App 20200388467 - NI; Tuqiang ; et al. | 2020-12-10 |
Corrosion-resistant Structure For A Gas Delivery System In A Plasma Processing Apparatus
App 20200381213 - LIAN; Zengdi ; et al. | 2020-12-03 |
Gas Showerhead, Manufacturing Method, And Plasma Apparatus Including The Gas Showerhead
App 20200321193 - NI; Tuqiang ; et al. | 2020-10-08 |
Plasma Reactor For Ultra-high Aspect Ratio Etching And Etching Method Thereof
App 20200251345 - Kind Code | 2020-08-06 |
Plasma Reactor and Heating Apparatus Therefor
App 20200214087 - Zhao; Kui ; et al. | 2020-07-02 |
Temperature Control Apparatus for Semiconductor Processing Equipment, And Temperature Control Method for The Same
App 20200211873 - Zhao; Kui ; et al. | 2020-07-02 |
Capacitively Coupled Plasma Etching Apparatus
App 20200194230 - Huang; Yunwen ; et al. | 2020-06-18 |
Capacitively Coupled Plasma Etching Apparatus
App 20200194275 - Huang; Yunwen ; et al. | 2020-06-18 |
Capacitively Coupled Plasma Etching Apparatus
App 20200194276 - Huang; Yunwen ; et al. | 2020-06-18 |
Switchable matching network and an inductively coupled plasma processing apparatus having such network
Grant 10,685,811 - Zhao , et al. | 2020-06-16 |
Processing chamber, combination of processing chamber and loadlock, and system for processing substrates
Grant 10,685,814 - Tao , et al. | 2020-06-16 |
Multi-zone Temperature Control Plasma Reactor
App 20200161104 - Ni; Tuqiang ; et al. | 2020-05-21 |
Switchable Matching Network And An Inductively Coupled Plasma Processing Apparatus Having Such Network
App 20200090908 - Zhao; Kui ; et al. | 2020-03-19 |
Lift Pin Assembly, An Electrostatic Chuck And A Processing Apparatus Where The Electrostatic Chuck Is Located
App 20200083087 - Ni; Tuqiang ; et al. | 2020-03-12 |
Device of changing gas flow pattern and a wafer processing method and apparatus
Grant 10,529,577 - Ni , et al. J | 2020-01-07 |
Coating For Performance Enhancement Of Semiconductor Apparatus
App 20190338408 - HE; Xiaoming ; et al. | 2019-11-07 |
Plasma Process Apparatus With Low Particle Contamination And Method Of Operating The Same
App 20190194802 - NI; Tuqiang ; et al. | 2019-06-27 |
Uniform Pumping Dual-station Vacuum Processor
App 20190139745 - GONG; Yuejun ; et al. | 2019-05-09 |
Plasma confinement apparatus, and method for confining a plasma
Grant 10,187,965 - Ni , et al. Ja | 2019-01-22 |
Plasma Reactor Having A Function Of Tuning Low Frequency Rf Power Distribution
App 20190006155 - Zhao; Kui ; et al. | 2019-01-03 |
Multi-zone Active-matrix Temperature Control System And Temperature Control Method, And Electrostatic Chuck And Plasma Processing Apparatus Apply Thereof
App 20170186592 - Ni; Tuqiang ; et al. | 2017-06-29 |
Electrode Structure For Icp Etcher
App 20170186585 - Zuo; Rason ; et al. | 2017-06-29 |
Performance enhancement of coating packaged ESC for semiconductor apparatus
Grant 9,633,884 - He , et al. April 25, 2 | 2017-04-25 |
Processing Chamber, Combination Of Processing Chamber And Loadlock, And System For Processing Substrates
App 20160351429 - Tao; Heng ; et al. | 2016-12-01 |
Icp Source Design For Plasma Uniformity And Efficiency Enhancement
App 20160322205 - XU; Songlin ; et al. | 2016-11-03 |
ICP source design for plasma uniformity and efficiency enhancement
Grant 9,431,216 - Xu , et al. August 30, 2 | 2016-08-30 |
Device Of Changing Gas Flow Pattern And A Wafer Processing Method And Apparatus
App 20160172204 - NI; TuQiang ; et al. | 2016-06-16 |
Plasma processing method and plasma processing device
Grant 9,275,870 - Xu , et al. March 1, 2 | 2016-03-01 |
Multi-station decoupled reactive ion etch chamber
Grant 9,208,998 - Yin , et al. December 8, 2 | 2015-12-08 |
System and method for controlling plasma with an adjustable coupling to ground circuit
Grant 9,190,302 - Ni , et al. November 17, 2 | 2015-11-17 |
ICP source design for plasma uniformity and efficiency enhancement
Grant 9,095,038 - Gang , et al. July 28, 2 | 2015-07-28 |
Performance Enhancement Of Coating Packaged Esc For Semiconductor Apparatus
App 20140118880 - HE; Xiaoming ; et al. | 2014-05-01 |
Icp Source Design For Plasma Uniformity And Efficiency Enhancement
App 20140120731 - XU; Songlin ; et al. | 2014-05-01 |
Coating Packaged Showerhead Performance Enhancement For Semiconductor Apparatus
App 20140117120 - HE; Xiaoming ; et al. | 2014-05-01 |
Coating For Performance Enhancement Of Semiconductor Apparatus
App 20140116338 - HE; Xiaoming ; et al. | 2014-05-01 |
Plasma Processing Method And Plasma Processing Device
App 20140106572 - Xu; Lei ; et al. | 2014-04-17 |
Gas Supply Device For A Vacuum Processing Chamber, Method Of Gas Supplying And Switching
App 20140083613 - XU; Songlin ; et al. | 2014-03-27 |
System and Method for Controlling Plasma With an Adjustable Coupling to Ground Circuit
App 20130306240 - Ni; Tuqiang ; et al. | 2013-11-21 |
System and method for controlling plasma with an adjustable coupling to ground circuit
Grant 8,518,211 - Ni , et al. August 27, 2 | 2013-08-27 |
Plasma processing method and apparatus with control of plasma excitation power
Grant 8,480,913 - Ni , et al. July 9, 2 | 2013-07-09 |
Icp Source Design For Plasma Uniformity And Efficiency Enhancement
App 20130102155 - GANG; Shi ; et al. | 2013-04-25 |
Capacitive Cvd Reactor And Methods For Plasma Cvd Process
App 20130048216 - Yin; Gerald ; et al. | 2013-02-28 |
Multi-station decoupled reactive ion etch chamber
Grant 8,366,829 - Yin , et al. February 5, 2 | 2013-02-05 |
Multi-station Decoupled Reactive Ion Etch Chamber
App 20130008605 - Yin; Gerald ; et al. | 2013-01-10 |
Multi-station plasma reactor with multiple plasma regions
Grant 8,336,488 - Chen , et al. December 25, 2 | 2012-12-25 |
Capacitive CVD reactor and methods for plasma CVD process
Grant 8,297,225 - Yin , et al. October 30, 2 | 2012-10-30 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
Grant 8,114,246 - Ni , et al. February 14, 2 | 2012-02-14 |
System and method of sensing and removing residual charge from a processed wafer
Grant 8,111,499 - Ni , et al. February 7, 2 | 2012-02-07 |
Plasma Processing Method And Apparatus With Control Of Plasma Excitation Power
App 20110253673 - NI; Tuqiang ; et al. | 2011-10-20 |
Gas injection system for plasma processing
Grant 8,025,731 - Ni , et al. September 27, 2 | 2011-09-27 |
Silicon carbide gas distribution plate and RF electrode for plasma etch chamber
Grant 7,992,518 - Wu , et al. August 9, 2 | 2011-08-09 |
Gas injection system for plasma processing
App 20100327085 - NI; Tuqiang ; et al. | 2010-12-30 |
System And Method Of Sensing And Removing Residual Charge From A Processed Wafer
App 20100271744 - NI; Tuqiang ; et al. | 2010-10-28 |
Gas injection system for plasma processing
Grant 7,785,417 - Ni , et al. August 31, 2 | 2010-08-31 |
Capacitive Cvd Reactor And Methods For Plasma Cvd Process
App 20100126667 - Yin; Gerald ; et al. | 2010-05-27 |
Multi-station Plasma Reactor With Multiple Plasma Regions
App 20090139453 - CHEN; AIHUA ; et al. | 2009-06-04 |
Multiple frequency plasma chamber, switchable RF system, and processes using same
Grant 7,503,996 - Chen , et al. March 17, 2 | 2009-03-17 |
Multiple Frequency Plasma Chamber, Switchable Rf System, And Processes Using Same
App 20080251207 - Chen; Jinyuan ; et al. | 2008-10-16 |
Silicon Carbide Gas Distribution Plate and RF Electrode for Plasma Etch Chamber
App 20080202688 - Wu; Robert ; et al. | 2008-08-28 |
Multi-station Decoupled Reactive Ion Etch Chamber
App 20080011424 - YIN; Gerald ; et al. | 2008-01-17 |
Vacuum Plasma Processor Having A Chamber With Electrodes And A Coil For Plasma Excitation And Method Of Operating Same
App 20070044915 - Ni; Tuqiang ; et al. | 2007-03-01 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
Grant 7,105,102 - Ni , et al. September 12, 2 | 2006-09-12 |
Methods for detecting the endpoint of a photoresist stripping process
Grant 7,077,971 - Ni , et al. July 18, 2 | 2006-07-18 |
Window protector for sputter etching of metal layers
App 20060137821 - Howald; Arthur M. ; et al. | 2006-06-29 |
System and method for controlling plasma with an adjustable coupling to ground circuit
App 20060112878 - Ni; Tuqiang ; et al. | 2006-06-01 |
Small volume process chamber with hot inner surfaces
App 20060105575 - Bailey; Andrew D. III ; et al. | 2006-05-18 |
Small volume process chamber with hot inner surfaces
Grant 7,009,281 - Bailey, III , et al. March 7, 2 | 2006-03-07 |
Vacuum plasma processor method
Grant 6,897,156 - Ni , et al. May 24, 2 | 2005-05-24 |
Small volume process chamber with hot inner surfaces
App 20050070105 - Bailey, Andrew D. III ; et al. | 2005-03-31 |
Etch endpoint detection
Grant 6,855,567 - Ni , et al. February 15, 2 | 2005-02-15 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
App 20040154747 - Ni, Tuqiang ; et al. | 2004-08-12 |
Moveable barrier for multiple etch processes
App 20040144493 - Ni, Tuqiang ; et al. | 2004-07-29 |
System and method for controlling plasma with an adjustable coupling to ground circuit
App 20040118344 - Ni, Tuqiang ; et al. | 2004-06-24 |
Plasma etching of dielectric layer with etch profile control
Grant 6,746,961 - Ni , et al. June 8, 2 | 2004-06-08 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
Grant 6,716,303 - Ni , et al. April 6, 2 | 2004-04-06 |
Moveable barrier for multiple etch processes
Grant 6,709,547 - Ni , et al. March 23, 2 | 2004-03-23 |
Integrated electronic hardware for wafer processing control and diagnostic
Grant 6,622,286 - Ngo , et al. September 16, 2 | 2003-09-16 |
Method of plasma etching organic antireflective coating
Grant 6,617,257 - Ni , et al. September 9, 2 | 2003-09-09 |
Vacuum plasma processor apparatus and method
App 20030106645 - Ni, Tuqiang ; et al. | 2003-06-12 |
Vacuum plasma processor apparatus and method
Grant 6,531,029 - Ni , et al. March 11, 2 | 2003-03-11 |
Plasma etching of dielectric layer with etch profile control
App 20030045114 - Ni, Tuqiang ; et al. | 2003-03-06 |
Configurable plasma volume etch chamber
Grant 6,527,911 - Yen , et al. March 4, 2 | 2003-03-04 |
Integrated full wavelength spectrometer for wafer processing
Grant 6,526,355 - Ni , et al. February 25, 2 | 2003-02-25 |
Method for improving uniformity and reducing etch rate variation of etching polysilicon
Grant 6,514,378 - Ni , et al. February 4, 2 | 2003-02-04 |
Method and system for detecting an exposure of a material on a semiconductor wafer during chemical-mechanical polishing
Grant 6,503,766 - Ni January 7, 2 | 2003-01-07 |
Method of plasma etching organic antireflective coating
App 20020182881 - Ni, Tuqiang ; et al. | 2002-12-05 |
Methods for detecting the endpoint of a photoresist stripping process
App 20020148811 - Ni, Tuqiang ; et al. | 2002-10-17 |
High temperature tungsten etching process
Grant 6,461,974 - Ni , et al. October 8, 2 | 2002-10-08 |
Plasma processing method and apparatus with control of plasma excitation power
App 20020139477 - Ni, Tuqiang ; et al. | 2002-10-03 |
Gas injection system for plasma processing
App 20010010257 - Ni, Tuqiang ; et al. | 2001-08-02 |
Elevated stationary uniformity ring design
Grant 6,257,168 - Ni , et al. July 10, 2 | 2001-07-10 |
Gas injection system for plasma processing
Grant 6,230,651 - Ni , et al. May 15, 2 | 2001-05-15 |
Rapid IR transmission thermometry for wafer temperature sensing
Grant 6,062,729 - Ni , et al. May 16, 2 | 2000-05-16 |
Processing chamber with optical window cleaned using process gas
Grant 6,052,176 - Ni , et al. April 18, 2 | 2000-04-18 |
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